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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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(ODE). With any numerical simulation both accuracy and stability of the method<strong>in</strong> comput<strong>in</strong>g the solutions to the <strong>dynamics</strong> equations are importantconsiderations. The fourth order Runge-Kutta scheme has an <strong>in</strong>creased region ofstability as compared with other explicit schemes such as second order Runge-Kutta and explicit Euler. The stability diagram for the fourth order Runge-Kuttascheme <strong>in</strong>cludes eigenvalues on the imag<strong>in</strong>ary axis with a small portion <strong>in</strong>volv<strong>in</strong>gboth positive real eigenvalues when the imag<strong>in</strong>ary component is nonzero, i.e.λ = λ + iλ where when λ ≠ 0 , λ > 0 [Collis 2000].criirThe problem is conditionally stable. S<strong>in</strong>ce the <strong>in</strong>itial gap is small, thetime step must be chosen carefully to ma<strong>in</strong>ta<strong>in</strong> numerical stability. Numerical<strong>in</strong>stability exists <strong>in</strong> the analytical solution to the <strong>fluid</strong> damp<strong>in</strong>g force and damp<strong>in</strong>gtorque. Firstly, the film thickness cannot be less than zero. This would result <strong>in</strong>the breakdown of the Reynolds equation. The pressure becomes <strong>in</strong>f<strong>in</strong>ite at zerofilm thickness. Furthermore, hard contact between the template and wafer cannotbe modeled by the Reynolds equation. Secondly, the damp<strong>in</strong>g force and torqueare dependent on the state variables, f ( z, z, D θ , θ D ) and τ ( z , z, D θ , θD). Thus thesolution could become unstable s<strong>in</strong>ce the eigenvalues of the system change dur<strong>in</strong>gthe simulation. This phenomenon is observed dur<strong>in</strong>g the simulations. Forexample, an <strong>in</strong>itial time step of 1 × 10 -7 seconds or 0.1 microseconds will result <strong>in</strong>a stable solution for the first part of the simulation when the base layer thicknessis large. Then this time step must be decreased for the solution to rema<strong>in</strong> stable.When the base layer thickness is below 500 nm, a time step of 1 nanosecond isrequired to ma<strong>in</strong>ta<strong>in</strong> numerical stability. With a very small time step such as 1nanosecond, a 1 second simulation could easily extend over 24 hours <strong>in</strong> a C++implementation on an 850 MHz computer with 128 MB of RAM and 256KB oflevel 2 cache memory (L2 cache operations are faster than RAM). An adaptive67

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