Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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180160theta, microradian14012010080600 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1time, sFigure 6.8 Angle of inclination from simulation results (solid line) andexperimental results (circles). Correlation set.654force, lb32100 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1time, sFigure 6.9 Force due to fluid pressure from simulation results (solid line) andexperimental results (circles). Correlation set.Figures 6.7 through 6.9 show a set of experimental results that isindependent from the calibration set. Again, the trends in the dynamics are very89
similar. In Figures 6.7 and 6.8, the simulation results follow the experimentaldata for small values of time. For large t, there seems to be a DC offset in thedata. This discrepancy could be due to the factors previously discussed.Despite the differences in the actual values, these results indicate that theassumption of a lubrication flow governed by Reynolds equation can be used tomodel the squeezing process in SFIL. Further refinements can be made in boththe simulations and the experimental setup to obtain improved data, especially forsmaller film thickness measurements. An automated system that allows actualimprinting of the template onto a wafer substrate would probably yieldrepeatability in the data and be less prone to particle contamination.6.4.2 Experiments with Unfiltered WaterThe following data presented here are for two conditions. Initially, thewater used was unfiltered distilled water. It was believed that this water wassufficiently clean. However, it was decided that filtering this water with 0.02-micron filters could not adversely the results. Therefore, the first set of data isfrom unfiltered distilled water and the second set is from filtered distilled water.In this section results from the experiments with unfiltered water are presented.Figure 6.10 shows that the gap decreases very little for six microns ofdownward actuation. Further, the change in the angle of inclination relative to thesubstrate seems to be negligible. This suggests that particles between thetemplate and substrate have been squeezed very hard. Visual inspection throughthe quartz template shows that there are isolated particles distributed across thesurface of the substrate. However, only an automated active stage system canpotentially eliminate particles.90
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
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6.2.3 Control Software ............
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List of FiguresFigure 1.1 Optical m
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Figure 6.9 Force due to fluid press
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The exponential escalation in the c
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1.2.1 Optical Lithography Process O
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patterns to the desired specificati
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1.3 STEP AND FLASH IMPRINT LITHOGRA
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transferlayerwaferStep 1: Spin-coat
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the etch barrier fluid has an infin
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Researchers at the University of Te
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stage development. Design requireme
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minimum and maximum base layer thic
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square plate with fluid completely
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7. The fluid is assumed incompressi
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⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
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where V 1 and V 2 correspond to U 1
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ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
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dhdtLzhθh αh βxx αx = 0 x βFig
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C2hhtanθ2 21= αxαxβxαxβ( ) (
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⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
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at the plate edges. Freeland obtain
Page 51 and 52: For the case of 10 psi of pressure,
Page 53 and 54: are the same as the width of the tr
Page 55 and 56: orientation stages relative to the
Page 57 and 58: Wafer ChuckAir SolenoidMounting Pla
Page 59 and 60: The one degree-of-freedom template
Page 61 and 62: Figure 3.7 Initial and final desire
Page 63 and 64: 7645321Figure 3.8 Active stage prot
Page 65 and 66: Chapter 4: Real-Time Gap Sensing Vi
Page 67 and 68: R( λ)( 4πnd/ λ)2 2 −2αd−αd
Page 69 and 70: Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81 and 82: time marching is required to minimi
Page 83 and 84: 5.4 SQUEEZE FILM DYNAMICS OF INCLIN
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99 and 100: film thickness, nm40003800360034003
Page 101: Figure 6.6 shows that the force due
Page 105 and 106: 500045004000film thickness, nm35003
Page 107 and 108: Figure 6.13 shows the force-time pl
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
Page 113 and 114: is a major milestone. The next step
Page 115 and 116: 7.2.4 Control schemeThe ultimate go
Page 117 and 118: Assuming the liquid perfectly wets
Page 119 and 120: ase h (for a semi-circular notch,h
Page 121 and 122: Chou, S. Y., P .R. Krauss, and P. J
Page 123 and 124: Tripp, J. H. 1983. Surface roughnes
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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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