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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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tf0.4217µL2F⎛⎜1 1−2⎝ hfhi=24⎞⎟ . [2.37]⎠This gives a relationship between the time and force required to squeeze afilm from an <strong>in</strong>itial to a f<strong>in</strong>al thickness. Equations 2.36 and 2.37 break down forh less than ~10 nm.height, nmmnh ,100090080070060050040030010009008007006005004003002001000 10 20 30 40 50 60 70 80 90 100f = 10200100f = 500f = 100f = 500 1 2 3 4 5 6 7 8 9 10time, sFigure 2.7 Gap height as a function of time for a flat, square templateIn Figure 2.7 the different cases are for an applied constant force of 10(dotted l<strong>in</strong>e), 50 (dashed l<strong>in</strong>e), 100 (dashed-dotted l<strong>in</strong>e), and 500 lbs (solid l<strong>in</strong>e),respectively. Initial height h i = 2µm, viscosity µ = 1 cp and template size L = 2cm. For the <strong>in</strong>sert, the forces are 10, 20, 30 and 40 lbs, respectively.37

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