Asymmetric fluid-structure dynamics in nanoscale imprint lithography

which are selectively compliant. In the multi-imprint machine, these flexures arepassive compliant and allow α-β rotations, as shown in Figure 2.3, and ztranslation while minimizing γ rotations and x-y translations.The selective compliance of the distributed flexure allows the flexure toself-correct any orientation alignment within its range of motion to minimize thebase layer wedge profile when the etch barrier is squeezed towards the edges ofthe template. During the separation step excessive lateral displacements maydestroy transferred images, therefore an important design criterion for theorientation stages is to minimize the motions that would cause catastrophicdefects in the UV-exposed etch barrier. Thus, the modeled fluid pressures aregenerated from a pure squeeze action and the first two terms on the right handside of equation 2.18 disappear.initialtemplatesubstratez,γalignedtemplatey,βx,αFigure 2.3 Two flats showing orientation alignments 3The template is treated as infinite in the y direction and only the middle ofthe template along the x direction is considered. This is equivalent to neglectingside leakage so that all y derivatives are zero. The two-dimensional Reynoldsequation becomes3 Figure taken from Choi et al 2000.27