Asymmetric fluid-structure dynamics in nanoscale imprint lithography

optically flat quartz plate coated with a layer of chromium. This chromiumplatedquartz plate acted as the wafer and is shown in Figure 6.1. The chromiumhas a high reflectivity and acts as a first surface mirror, which has similar opticalproperties to a wafer with a transfer layer. Setscrews were used to hold quartzsubstrate in place. To minimize bending in the quartz, aluminum plates wereused at the interface between the setscrews and the quartz to distribute the forcefrom the setscrews evenly across the sides of the quartz and provide a flat,uniform clamping surface. This minimizes high contact stresses and distortion ofthe quartz.Aluminum Plates1 × 1 inchChromium-PlatedQuartz SubstrateFigure 6.1 Chromium-Plated Quartz Substrate FixtureSecond, a fluid dispensing system that could accurately dispense about0.1 µL of fluid in the gap between the quartz substrate and the template surfacewas not available. The simulations model the fluid as a line with boundaries thatgrow outward from the center. The dispensing system in the actual SFIL processwrites a fluid pattern that leaves no air bubbles trapped in the etch barrier andreduces the amount of force required to squeeze the fluid to ultra-thin film78