Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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The feature sizes are typically on the order of 100-200 nm. Precalibrationof the template orientation stages can align the template and wafer towithin two interference fringes across a one-inch template, which is equivalent toa wedge height of approximately 340 - 440 nm. The wedge can be computed asW = L tanθ[5.5]where W is the wedge height (m), L is the length of the template (0.025 m), and θis the angle between the template and the wafer (rad). Thus through careful precalibration,the initial angle between the template and wafer is about 2 × 10 -5 rad.Being slightly less conservative, a wedge of 2.5 × 10 -5 rad was used. Table 5.2summarizes the initials conditions and the system parameters used in thenumerical simulation.Parameter Description Symbol ValueMass M 1.5 kgStiffness constant in the axial direction K Z 1.3 × 10 8 N/mDamping constant in axial direction C Z 1400 N⋅s/mInertia I 5 × 10 -6 kg⋅m 2Stiffness constant in the torsional direction K θ 64 N⋅m/radDamping constant in the torsional direction C θ 2 × 10 -3 N⋅m⋅s/radTemplate width L 2 cmViscosity of the etch barrier µ 1 cpSurface tension of the etch barrier γ 28 dynes/cmInitial base layer thickness h i 2 micronInitial angular misalignment θ 0 2.5 × 10 -5 radInitial boundary x α,β ± 1 mmTable 5.2 Simulation Parameters Reflecting Experimental Setup69
5.4 SQUEEZE FILM DYNAMICS OF INCLINED SURFACE OF INFINITEWIDTH5.4.1 Single S-Curve Motion ProfileThe parameters in table 5.2 were used to simulate equations of motion forthe imprinting system. The results of these simulations using a single s-curveactuator motion profile are shown below in Figures 5.6 through 5.8. The single s-curve actuator motion profile is shown in Figure 5.6. The total downward motionof the actuator was 4 microns (this value is consistent with the value chosen forthe double s-curve motion profile presented in the following section where theactuation forces and final base layer thickness were reasonable).200015001000actuator height, nm5000-500-1000-1500-20000 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 0.45 0.5time, sFigure 5.6 Simulated single s-curve actuator motion profile70
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
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6.2.3 Control Software ............
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List of FiguresFigure 1.1 Optical m
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Figure 6.9 Force due to fluid press
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The exponential escalation in the c
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1.2.1 Optical Lithography Process O
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patterns to the desired specificati
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1.3 STEP AND FLASH IMPRINT LITHOGRA
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transferlayerwaferStep 1: Spin-coat
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the etch barrier fluid has an infin
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Researchers at the University of Te
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stage development. Design requireme
Page 31 and 32: minimum and maximum base layer thic
Page 33 and 34: square plate with fluid completely
Page 35 and 36: 7. The fluid is assumed incompressi
Page 37 and 38: ⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
Page 39 and 40: where V 1 and V 2 correspond to U 1
Page 41 and 42: ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
Page 43 and 44: dhdtLzhθh αh βxx αx = 0 x βFig
Page 45 and 46: C2hhtanθ2 21= αxαxβxαxβ( ) (
Page 47 and 48: ⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
Page 49 and 50: at the plate edges. Freeland obtain
Page 51 and 52: For the case of 10 psi of pressure,
Page 53 and 54: are the same as the width of the tr
Page 55 and 56: orientation stages relative to the
Page 57 and 58: Wafer ChuckAir SolenoidMounting Pla
Page 59 and 60: The one degree-of-freedom template
Page 61 and 62: Figure 3.7 Initial and final desire
Page 63 and 64: 7645321Figure 3.8 Active stage prot
Page 65 and 66: Chapter 4: Real-Time Gap Sensing Vi
Page 67 and 68: R( λ)( 4πnd/ λ)2 2 −2αd−αd
Page 69 and 70: Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81: time marching is required to minimi
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99 and 100: film thickness, nm40003800360034003
Page 101 and 102: Figure 6.6 shows that the force due
Page 103 and 104: similar. In Figures 6.7 and 6.8, th
Page 105 and 106: 500045004000film thickness, nm35003
Page 107 and 108: Figure 6.13 shows the force-time pl
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
Page 113 and 114: is a major milestone. The next step
Page 115 and 116: 7.2.4 Control schemeThe ultimate go
Page 117 and 118: Assuming the liquid perfectly wets
Page 119 and 120: ase h (for a semi-circular notch,h
Page 121 and 122: Chou, S. Y., P .R. Krauss, and P. J
Page 123 and 124: Tripp, J. H. 1983. Surface roughnes
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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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