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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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pressure distribution. Then this pressure must be numerically <strong>in</strong>tegrated to obta<strong>in</strong>the force and torque.7.2.2 Distributed parameter model of the mechanical systemThe mechanical system has been modeled as a lumped parameter massspr<strong>in</strong>g-dampermodel lead<strong>in</strong>g to a two degree of freedom mechanical system.Structural <strong>in</strong>teraction leads to an <strong>in</strong>crease <strong>in</strong> the number of degrees of freedom.For example, the revolute jo<strong>in</strong>t adds another rotational degree of freedom that hasnot been modeled <strong>in</strong> this research. Screw systems theory could be used to modelsuch mechanical systems with a large number of degrees of freedom.7.2.3 Measurements with Patterned TemplatesThe current gap-sens<strong>in</strong>g scheme can be used to measure the gap betweenthe template and substrate for base layers down to 350 nm without us<strong>in</strong>g theIMMA algorithm. This algorithm has not been successfully applied to thecomputation of th<strong>in</strong> base layers. A workaround to this problem is to have a step<strong>in</strong> the template. For the area that is not used for impr<strong>in</strong>t<strong>in</strong>g, there can be a 300 nmrecess <strong>in</strong> the template, for example. This is illustrated <strong>in</strong> Figure 7.4.Measurements us<strong>in</strong>g patterned templates can then be performed withoutexceed<strong>in</strong>g the limits of the gap sens<strong>in</strong>g tool.Recess DepthFigure 7.1 Recessed depth to aide <strong>in</strong> gap sens<strong>in</strong>g with pattern templates101

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