Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
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Aga<strong>in</strong>, Figure 5.12 shows that a base layer thickness of 200 nm can beobta<strong>in</strong>ed with<strong>in</strong> reasonable force limits of the actuators. The actuation scheme <strong>in</strong>this case resulted <strong>in</strong> an improved force-time profile similar to the double s-curveactuation <strong>in</strong> the previous section.force, lb504540353025201510500 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 0.45 0.5time, sFigure 5.13 Force correspond<strong>in</strong>g to the case of f<strong>in</strong>ite, parallel circular plates76