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Literaturverzeichnis 107<br />
[76] Lim, K.;Wi, J.S.;Nam, S.W.;Park, S.Y.;Lee, J.J.;Kim, K. B.: The<br />
fabrication scheme of a high resolution andhigh aspect ratio UV-nanoimprint mold.<br />
In: Nanotechnology 20 (2009), Nr. 49 20<br />
[77] Gilles, S.;Diez, M.;Offenhausser, A.;Lensen, M.C.;Mayer, D.: Deformation<br />
of nanostructures on polymer molds during soft UV nanoimprint lithography.<br />
In: Nanotechnology 21 (2010), Nr. 24 20<br />
[78] Song, Z.C.;You, B.H.;Lee, J.;Park, S.: Study on demolding temperature<br />
in thermal imprint lithography via nite element analysis. In: Microsystem<br />
Technologies-Micro-and Nanosystems-Information Storage and Processing Systems<br />
14 (2008), Nr. 9-11, S. 15931597 22<br />
[79] Song, Z.;Choi, J.;You, B.H.;Lee, J.;Park, S.: Simulation study on stress and<br />
deformation of polymeric patterns during the demolding process in thermal imprint<br />
lithography. In: Journal of Vacuum Science and Technology B 26 (2008), Nr. 2, S.<br />
598605 22<br />
[80] Schvartzman, M.;Mathur, A.;Hone, J.;Jahnes, C.;Wind, S. J.: Plasma<br />
uorination of carbon-basedmaterials for imprint andmolding lithographic applications.<br />
In: Applied Physics Letters 93 (2008), Nr. 15 22<br />
[81] Gilles, S.: Chemical Modication of Silicon Surfaces for the Application in SOft<br />
Lithography, TUBAF Freiberg, Thesis/Dissertation, 2007 23, 33<br />
[82] Okada, Makoto ; Iwasa, Masayuki ; Nakamatsu, Ken i. ; Kanda, Kazuhiro ;<br />
Haruyama, Yuichi ; Matsui, Shinji: Durability of antisticking layer against heat<br />
in nanoimprinting evaluatedusing scanning probe microscopy. In: Microelectronic<br />
Engineering 86 (2004), Jun, Nr. 4-6, S. 657660 23<br />
[83] Bailey, T.;Choi, B.J.;Colburn, M.;Meissl, M.;Shaya, S.;Ekerdt,<br />
J. G. ; Sreenivasan, S.V.;Willson, C. G.: Step andash imprint lithography:<br />
Template surface treatment anddefect analysis. In: Journal of Vacuum Science and<br />
Technology B 18 (2000), Nr. 6, S. 35723577 23<br />
[84] Xia, Y.N.;Whitesides, G. M.: Soft lithography. In: Annual Review of Materials<br />
Science 28 (1998), S. 153184 25<br />
[85] Rogers, John A. ; Nuzzo, Ralph G.: Recent progress in soft lithography. In:<br />
Materials Today 8 (2005), Nr. 2, S. 5056 25<br />
[86] Kumar, A.;Whitesides, G. M.: Features of GoldHaving Micrometer to Centimeter<br />
Dimensions Can be FormedThrough A Combination of Stamping with An<br />
Elastomeric Stamp andAn Alkanethiol Ink Followedby Chemical Etching. In: Applied<br />
Physics Letters 63 (1993), Nr. 14, S. 20022004 25<br />
[87] Hui, C.Y.;Jagota, A.;Lin, Y.Y.;Kramer, E. J.: Constraints on microcontact<br />
printing imposedby stamp deformation. In: Langmuir 18 (2002), Nr. 4, S. 13941407<br />
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