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RRFM 2009 Transactions - European Nuclear Society

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are mainly bi-layered, with an U(Al,Si) 3 + U 3 Si 5 sub-layer, close to U-Mo, and an U(Al,Si) 3 +<br />

UMo 2 Al 20 sub-layer, close to Al-Si.<br />

The occurrence of two types of ILs in U-Mo/Al-Si diffusion couples seem to be directly linked<br />

to (i) the Si precipitates distribution in the Al alloy, (ii) the diffusion conditions (temperature<br />

and time). That's the reason why the formation of one type of IL or the other cannot be simply<br />

associated to a Si threshold value.<br />

Acknowledgments :<br />

C. Jarousse and M. Grasse, from AREVA-CERCA (Romans, France) are gratefully<br />

acknowledged for supplying the U-Mo samples used in this study. J. Miragaya and L.<br />

Silvestre (CEA/Cadarache) are warmly thanked for diffusion couples preparation.<br />

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