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Local polarization dynamics in ferroelectric materials

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Rep. Prog. Phys. 73 (2010) 056502<br />

S V Kal<strong>in</strong><strong>in</strong> et al<br />

Response, a.u.<br />

1.0<br />

0.5<br />

0.0<br />

-0.5<br />

-1.0<br />

(a)<br />

-10 -5 0 5 10<br />

Bias, V dc<br />

Work of switch<strong>in</strong>g, a.u. V<br />

(b)<br />

15<br />

10<br />

5<br />

0<br />

0 2 4 6 8 10<br />

Modulation voltage, V ac<br />

1.5<br />

1.0<br />

0.5<br />

0.0<br />

Switchable response, a.u.<br />

Figure 38. The driv<strong>in</strong>g bias effect on the hysteresis loop shape. (a) Hysteresis loops for PZT th<strong>in</strong> film for ( ) 1.5 V pp ,() 4V pp ,()6V pp<br />

and (•) 8V pp driv<strong>in</strong>g amplitudes. (b) Driv<strong>in</strong>g bias dependence of effective work of switch<strong>in</strong>g and saturation response. Repr<strong>in</strong>ted<br />

from [329]. Copyright 2006, American Institute of Physics.<br />

These parameters provide a measure of the switch<strong>in</strong>g<br />

properties of the material.<br />

4.1.1. Effect of imag<strong>in</strong>g conditions on hysteresis loops. As<br />

<strong>in</strong> any spectroscopic method, PFS and SS-PFM are highly<br />

susceptible to a large number of external and <strong>in</strong>ternal factors<br />

that affect the veracity of spectroscopic data acquisition. The<br />

detailed analysis of <strong>in</strong>strumental factors is reported <strong>in</strong> [329].<br />

Below, we discuss the effect of measurement parameters<br />

on PFS.<br />

4.1.2.1. Prob<strong>in</strong>g bias and the bias w<strong>in</strong>dow. One important<br />

consideration <strong>in</strong> PFM and SS-PFM is the choice of driv<strong>in</strong>g<br />

voltage, V ac , and bias w<strong>in</strong>dow of measurements, V dc ∈<br />

(V m<strong>in</strong> ,V max ). Ideally the measurements are performed <strong>in</strong> the<br />

low signal limit, V ac ≪ (V + + V − ). However, practical<br />

considerations such as maximiz<strong>in</strong>g the signal strength often<br />

necessitate the use of high driv<strong>in</strong>g voltages, <strong>in</strong> particular for<br />

<strong>materials</strong> with relatively low piezoelectric coupl<strong>in</strong>g. The effect<br />

of a f<strong>in</strong>ite prob<strong>in</strong>g bias on the loop shape strongly depends<br />

on the fundamental hysteresis loop formation mechanism and<br />

bias frequency, and cannot be expla<strong>in</strong>ed by a simple model.<br />

Here, we summarize the experimental studies of the driv<strong>in</strong>g<br />

bias effect.<br />

Shown <strong>in</strong> figure 37(a) are experimentally observed<br />

hysteresis loops obta<strong>in</strong>ed on a pulsed-laser deposition grown<br />

PZT th<strong>in</strong> film (70 nm) for different prob<strong>in</strong>g biases. The loops<br />

are normalized by bias amplitude to ensure similar units. Note<br />

that for V ac below the coercive bias, the loop shape rema<strong>in</strong>s<br />

largely unchanged—the loops slightly narrow <strong>in</strong>dicat<strong>in</strong>g the<br />

onset of switch<strong>in</strong>g, but the variation <strong>in</strong> relevant parameters<br />

is relatively small (figure 37(b)). Conversely, modulation<br />

amplitudes greater than the coercive bias effectively result<br />

<strong>in</strong> a collapse of the loop to a straight l<strong>in</strong>e. The changes <strong>in</strong><br />

the effective work of switch<strong>in</strong>g and switchable response as a<br />

function of V ac are shown <strong>in</strong> figure 38(b). The small variation<br />

<strong>in</strong> relevant characteristics for small biases is presumably due<br />

to a relatively larger noise level. Note that the behavior <strong>in</strong><br />

figure 38 is reproducible and the shape is rega<strong>in</strong>ed when small<br />

biases are used demonstrat<strong>in</strong>g that the collapse <strong>in</strong> the loop<br />

shape cannot be attributed to the damage to the conductive tip<br />

coat<strong>in</strong>g or the surface. Thus, for certa<strong>in</strong> <strong>materials</strong>, voltages at<br />

∼2/3 of the coercive bias level can be used to yield high-quality<br />

loops. At the same time, for <strong>materials</strong> with small coercive bias,<br />

e.g. <strong>ferroelectric</strong> nanodots, ultrath<strong>in</strong> films, etc, imaged at large<br />

modulation voltages, the absence of hysteresis loops can be<br />

erroneously <strong>in</strong>terpreted as evidence for non-<strong>ferroelectric</strong> state.<br />

The dependence of the loop parameters on the bias w<strong>in</strong>dow<br />

is illustrated <strong>in</strong> figure 39. The hysteresis loops become<br />

saturated when the bias w<strong>in</strong>dows exceed 20 V (figure 49(a)).<br />

The orig<strong>in</strong>s of the slight downward trend are unclear but can<br />

possibly be attributed to reverse switch<strong>in</strong>g <strong>in</strong>duced by charge<br />

<strong>in</strong>jection at the surface [304]. The bias w<strong>in</strong>dow dependence of<br />

switchable <strong>polarization</strong> is illustrated <strong>in</strong> figure 39(b). Note the<br />

good agreement between the values obta<strong>in</strong>ed from fitt<strong>in</strong>g and<br />

those measured directly from the loop. Figure 39(c) illustrates<br />

the dependence of the positive and negative nucleation biases<br />

on the bias w<strong>in</strong>dow. Despite the relatively large error <strong>in</strong> the<br />

determ<strong>in</strong>ation of nucleation bias, the values are nearly biasw<strong>in</strong>dow<br />

<strong>in</strong>dependent, suggest<strong>in</strong>g that the loop formation is<br />

controlled by the nucleation process. F<strong>in</strong>ally, figure 39(d)<br />

illustrates the bias w<strong>in</strong>dow dependence of the effective work of<br />

switch<strong>in</strong>g as determ<strong>in</strong>ed from functional fitt<strong>in</strong>g and the direct<br />

<strong>in</strong>tegration of the area below the curve. The values obta<strong>in</strong>ed<br />

are <strong>in</strong> good agreement and also illustrate that the level<strong>in</strong>g-off<br />

of hysteresis parameters at large voltages are <strong>in</strong>dicative of loop<br />

saturation.<br />

4.1.2.2. Ambient effects. One of the well-known factors<br />

affect<strong>in</strong>g SPM measurements under ambient conditions is the<br />

presence of wett<strong>in</strong>g water layers and associated capillary tip–<br />

surface forces as described <strong>in</strong> section 3.2.5. Here, we present<br />

experimental evidence illustrat<strong>in</strong>g the possible role of ambient<br />

conditions on hysteresis measurements by PFM.<br />

Shown <strong>in</strong> figure 40(a) is the PFM hysteresis loop obta<strong>in</strong>ed<br />

on a freshly prepared (buffered HF etch followed by O 2<br />

anneal<strong>in</strong>g) atomically flat STO (1 0 0) surface. Shown are<br />

the average values and error bars correspond<strong>in</strong>g to standard<br />

deviations determ<strong>in</strong>ed from 64 hysteresis loops acquired on<br />

an 8×8 mesh of po<strong>in</strong>ts separated by 100 nm. Note that<br />

clear hysteretic behavior can be seen despite the fact that<br />

the surface is (nom<strong>in</strong>ally) non-<strong>ferroelectric</strong>. We attribute<br />

39

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