13.07.2015 Views

Assessment and Future Directions of Nonlinear Model Predictive ...

Assessment and Future Directions of Nonlinear Model Predictive ...

Assessment and Future Directions of Nonlinear Model Predictive ...

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

510 R. De Keyser <strong>and</strong> J. Donald IIIThis algorithm results after convergence to the optimal solution for the underlyingnonlinear predictive control problem. A convergence pro<strong>of</strong> is not available;however, simulation results <strong>and</strong> practical experience both look very promising.The number <strong>of</strong> required iterations depends on how far the optimal u ∗ (t + k|t)is away from the optimal u ∗ (t + k|t − 1). In quasi-steady-state situations, thenumber <strong>of</strong> iterations is low (1 ...2). On the other h<strong>and</strong>, during transients thenumber <strong>of</strong> iterations might raise to 10. As the NEPSAC algorithm consists <strong>of</strong> arepetitive use <strong>of</strong> the basic linear EPSAC algorithm <strong>and</strong> as EPSAC requires a lowcomputational effort, this is acceptable in practice. In the RTCVD application,10 iterations require about 100 ms, which is a small fraction <strong>of</strong> the controllersampling period (2 s).4 Experimental ResultsHundreds <strong>of</strong> test runs on different types <strong>of</strong> real-life RTCVD-reactors have shownthe excellent performance <strong>of</strong> the MPC strategy compared to the traditional(commercial) PID approach. During the comparison, the PID controllers wereconfigured <strong>and</strong> tuned by experienced staff <strong>of</strong> the company, according to theirexpert skill <strong>of</strong> many years. Figure 5 presents typical PID results during a recipe104010401020102010001000Temperatures (°C)980960940920Temperatures (°C)980960940920900900880880860100 150 200 250 300 350 400Samples (2 seconds)860100 150 200 250 300 350 400Samples (2 seconds)Fig. 5. PIDwithramprate6 o C/s (center/front/side/rear wafer surface temperatures)(left) <strong>and</strong> NEPSAC with ramp rate 15 o C/s (center/front/side/rear wafer surface temperatures)(right)with ramp rates <strong>of</strong> about 6 o C/s. This is the maximum ramp rate that is feasibleon this kind <strong>of</strong> equipment under PID control (note that there is a trendtowards higher ramp rates in order to reduce the process cycle time; however thehigher the ramp rate, the more difficult it is to keep control <strong>of</strong> the temperatureuniformityover the wafer surface). Figure 5 presents also typical NEPSAC-MPCresults during a recipe with ramp rates <strong>of</strong> about 15 o C/s. Although the ramprate is much higher, it is clear that tight control <strong>of</strong> the temperature uniformityis still possible.

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!