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PCT/2001/45 - World Intellectual Property Organization

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<strong>45</strong>/<strong>2001</strong><br />

8 Nov/nov <strong>2001</strong> <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 20339<br />

LAMPE A INCANDESCENCE A BASSE<br />

TENSION A DOUBLE ENVELOPPE<br />

(71) ILLUMINATION TECHNOLOGY, INC.<br />

[US/US]; 5440 Cerritos Avenue, Cypress, CA<br />

90630-4600 (US).<br />

(72) HARTLEY, John, B.; 1334 Goucher<br />

Street, Pacific Palisades, CA 90272 (US).<br />

THEEGALA, Muralidhar; 1<strong>45</strong>32 Village<br />

View Lane, Chino Hills, CA 91709 (US).<br />

ANGHELUS, Alexandrina; 5598 Cajon<br />

Avenue, Buena Park, CA 90621 (US).<br />

(74) KLEIN, Howard, J. et al. / etc.; Klein &<br />

Szekeres, LLP, 4199 Campus Drive, Suite<br />

700, Irvine, CA 92612 (US).<br />

(81) AE AG AL AM AT AT (Utility model /<br />

modèle d’utilité) AUAZBABBBGBRBY<br />

BZ CA CH CN CO CR CU CZ CZ (Utility<br />

model / modèle d’utilité) DE DE (Utility<br />

model / modèle d’utilité) DK DK (Utility<br />

model / modèle d’utilité) DM DZ EE EE<br />

(Utility model / modèle d’utilité) ESFIFI<br />

(Utility model / modèle d’utilité)GBGDGE<br />

GH GM HR HU ID IL IN IS JP KE KG KP<br />

KR KZ LC LK LR LS LT LU LV MA MD<br />

MG MK MN MW MX MZ NO NZ PL PT<br />

RO RU SD SE SG SI SK SK (Utility model<br />

/ modèle d’utilité) SLTJTMTRTTTZUA<br />

UG UZ VN YU ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

Published / Publiée :(c)<br />

(51) 7 H01L 21/00<br />

(11) WO 01/8<strong>45</strong>98<br />

(21) <strong>PCT</strong>/EP01/04692<br />

(13) A1<br />

(22) 26 Apr/avr <strong>2001</strong> (26.04.<strong>2001</strong>)<br />

(25) de (26) de<br />

(30) 100 21 329.4 2 May/mai 2000<br />

(02.05.2000)<br />

DE<br />

(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />

(54) METHOD AND DEVICE FOR TREAT-<br />

ING SLICE-TYPE SUBSTRATES<br />

PROCEDE ET DISPOSITIF POUR LE<br />

TRAITEMENT DE SUBSTRATS DE<br />

TYPE TRANCHES<br />

(71) MATTSON WET PRODUCTS GMBH<br />

[DE/DE]; Carl-Benz-Strasse 10, 72124<br />

Pliezhausen (DE).<br />

(for all designated States except / pour tous<br />

les États désignés sauf US)<br />

(72, 75) LOHMÜLLER, Jürgen [DE/DE]; Unterer<br />

Mühlweg 7, 72762 Reutlingen (DE).<br />

(81) CN IL JP KR SG US.<br />

(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />

IE IT LU MC NL PT SE TR).<br />

Published / Publiée :(c)<br />

(51) 7 H01L 21/00<br />

(11) WO 01/8<strong>45</strong>99 (13) A2<br />

(21) <strong>PCT</strong>/US01/12897<br />

(22) 19 Apr/avr <strong>2001</strong> (19.04.<strong>2001</strong>)<br />

(25) en (26) en<br />

(30) 09/565,691 1 May/mai 2000 US<br />

(01.05.2000)<br />

(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />

(54) UV-ENHANCED SILYLATION<br />

PROCESS TO INCREASE ETCH RE-<br />

SISTANCE OF ULTRA THIN RESISTS<br />

PROCEDE DE SILYLATION AME-<br />

LIORE PAR L’APPLICATION D’UL-<br />

TRAVIOLETS POUR AUGMENTER<br />

LA RESISTANCE A L’ATTAQUE DE<br />

RESISTS ULTRAMINCES<br />

(71) ADVANCED MICRO DEVICES, INC.<br />

[US/US]; One AMD Place, Mail Stop 68;<br />

P.O. Box 3<strong>45</strong>3, Sunnyvale, CA 94088-3<strong>45</strong>3<br />

(US).<br />

(72) RANGARAJAN, Bharath; 2295 Dolores<br />

Avenue, Santa Clara, CA 95050 (US). SUB-<br />

RAMANIAN, Ramkumar; 4271 Norwalk<br />

Drive #X-105, San Jose, CA 95129 (US).<br />

PHAN, Khoi, A.; 3841 Thousand Oaks<br />

Drive, San Jose, CA 95136 (US). SINGH,<br />

Bhanwar; 17122 Heatherwood Way, Morgan<br />

Hill, CA 95037 (US). TEMPLETON,<br />

Michael, K.; 80 Fifteenth Avenue, Atherton,<br />

CA 94027 (US). YEDUR, Sanjay, K.; 444<br />

Saratoga Avenue #27A, Santa Clara, CA<br />

95050 (US). CHOO, Bryan, K.; 234 Escuela<br />

Avenue #74, Mountain View, CA 94040<br />

(US).<br />

(74) RODDY, Richard, J.; Advanced Micro Devices,<br />

Inc., One AMD Place, Mail Stop 68,<br />

Sunnyvale, CA 94088-3<strong>45</strong>3 (US).<br />

(81) AE AG AL AM AT AU AZ BA BB BG BR<br />

BY BZ CA CH CN CO CR CU CZ DE DK<br />

DM DZ EE ES FI GB GD GE GH GM HR<br />

HU ID IL IN IS JP KE KG KP KR KZ LC<br />

LK LR LS LT LU LV MA MD MG MK MN<br />

MW MX MZ NO NZ PL PT RO RU SD SE<br />

SG SI SK SL TJ TM TR TT TZ UA UG UZ<br />

VN YU ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

(51) 7 H01L 21/00, 21/66, G01R 31/26<br />

(11) WO 01/84600<br />

(21) <strong>PCT</strong>/US01/13346<br />

(13) A1<br />

(22) 25 Apr/avr <strong>2001</strong> (25.04.<strong>2001</strong>)<br />

(25) en (26) en<br />

(30) 60/200,302 28 Apr/avr 2000<br />

(28.04.2000)<br />

US<br />

(30) Not furnished / 23 Apr/avr <strong>2001</strong> US<br />

non communiqué (23.04.<strong>2001</strong>)<br />

(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />

(54) PROCESS PERTURBATION TO MEA-<br />

SURED-MODELED METHOD FOR<br />

SEMICONDUCTOR DEVICE TECH-<br />

NOLOGY MODELING<br />

PERTURBATION DE PROCESSUS<br />

DESTINEE A UN PROCEDE ME-<br />

SURE-MODELISATION POUR MO-<br />

DELISATION DE TECHNOLOGIE DE<br />

DISPOSITIF A SEMI-CONDUCTEUR<br />

(71) TRW, INC. [US/US]; One Space Park, Redondo<br />

Beach, CA 90278 (US).<br />

(72) TSAI, Roger, S.; 22499 Kent Avenue, Torrance,<br />

CA 90505 (US).<br />

(74) PANIAGUAS, John, S.; Katten Muchin<br />

Zavis, 525 West Monroe Street, Suite 1600,<br />

Chicago, IL 60661 (US) et al. / etc.<br />

(81) AE AG AL AM AT AU AZ BA BB BG BR<br />

BY BZ CA CH CN CR CU CZ DE DK DM<br />

DZ EE ES FI GB GD GE GH GM HR HU<br />

ID IL IN IS JP KE KG KP KR KZ LC LK<br />

LR LS LT LU LV MA MD MG MK MN MW<br />

MX MZ NO NZ PL PT RO RU SD SE SG SI<br />

SK SL TJ TM TR TT TZ UA UG UZ VN YU<br />

ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

(51) 7 H01L 21/00<br />

(11) WO 01/84601 (13) A2<br />

(21) <strong>PCT</strong>/US01/14097<br />

(22) 2 May/mai <strong>2001</strong> (02.05.<strong>2001</strong>)<br />

(25) en (26) en<br />

(30) 60/201,8<strong>45</strong> 3 May/mai 2000 US<br />

(03.05.2000)<br />

(30) 09/748,526 21 Dec/déc 2000 US<br />

(21.12.2000)<br />

(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />

(54) IMPLANTATION PROCESS USING<br />

SUB-STOICHIOMETRIC, OXYGEN<br />

DOSES AT DIFFERENT ENERGIES<br />

PROCEDE D’IMPLANTATION UTI-<br />

LISANT DES DOSES D’OXYGENE<br />

INFERIEURES A LA STOECHIOME-<br />

TRIE A DES ENERGIES DIFFERENTES<br />

(71) IBIS TECHNOLOGY, INC. [US/US]; 32A<br />

Cherry Hill Drive, Danvers, MA 01923 (US).<br />

(72) DOLAN, Robert, P.; 2 Hazelwood Road,<br />

Hudson, NH 03051 (US). CORDTS, Bernhardt,<br />

F.; 5 Lilliam Drive, Ipswich, MA<br />

01938 (US). ANC, Maria, J.; 55 Foley<br />

Drive, Marlborough, MA 01752 (US).<br />

ALLES, Michael, L.; 43 Cole Street, Beverly,<br />

MA 01915 (US).<br />

(74) ENGELLENNER, Thomas, J. et al. / etc.;<br />

Nutter, McClennen & Fish, LLP, One International<br />

Place, Boston, MA 02110-2699 (US).<br />

(81) AE AG AL AM AT AU AZ BA BB BG BR<br />

BY BZ CA CH CN CO CR CU CZ DE DK<br />

DM DZ EE ES FI GB GD GE GH GM HR<br />

HU ID IL IN IS JP KE KG KP KR KZ LC<br />

LK LR LS LT LU LV MA MD MG MK MN<br />

MW MX MZ NO NZ PL PT RO RU SD SE<br />

SG SI SK SL TJ TM TR TT TZ UA UG UZ<br />

VN YU ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

Declaration / Déclaration :<br />

(s) for all designations / pour toutes les<br />

désignations<br />

(51) 7 H01L 21/00<br />

(11) WO 01/84602 (13) A2<br />

(21) <strong>PCT</strong>/US01/40620<br />

(22) 27 Apr/avr <strong>2001</strong> (27.04.<strong>2001</strong>)

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