PCT/2001/45 - World Intellectual Property Organization
PCT/2001/45 - World Intellectual Property Organization
PCT/2001/45 - World Intellectual Property Organization
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<strong>45</strong>/<strong>2001</strong><br />
8 Nov/nov <strong>2001</strong> <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 20339<br />
LAMPE A INCANDESCENCE A BASSE<br />
TENSION A DOUBLE ENVELOPPE<br />
(71) ILLUMINATION TECHNOLOGY, INC.<br />
[US/US]; 5440 Cerritos Avenue, Cypress, CA<br />
90630-4600 (US).<br />
(72) HARTLEY, John, B.; 1334 Goucher<br />
Street, Pacific Palisades, CA 90272 (US).<br />
THEEGALA, Muralidhar; 1<strong>45</strong>32 Village<br />
View Lane, Chino Hills, CA 91709 (US).<br />
ANGHELUS, Alexandrina; 5598 Cajon<br />
Avenue, Buena Park, CA 90621 (US).<br />
(74) KLEIN, Howard, J. et al. / etc.; Klein &<br />
Szekeres, LLP, 4199 Campus Drive, Suite<br />
700, Irvine, CA 92612 (US).<br />
(81) AE AG AL AM AT AT (Utility model /<br />
modèle d’utilité) AUAZBABBBGBRBY<br />
BZ CA CH CN CO CR CU CZ CZ (Utility<br />
model / modèle d’utilité) DE DE (Utility<br />
model / modèle d’utilité) DK DK (Utility<br />
model / modèle d’utilité) DM DZ EE EE<br />
(Utility model / modèle d’utilité) ESFIFI<br />
(Utility model / modèle d’utilité)GBGDGE<br />
GH GM HR HU ID IL IN IS JP KE KG KP<br />
KR KZ LC LK LR LS LT LU LV MA MD<br />
MG MK MN MW MX MZ NO NZ PL PT<br />
RO RU SD SE SG SI SK SK (Utility model<br />
/ modèle d’utilité) SLTJTMTRTTTZUA<br />
UG UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
Published / Publiée :(c)<br />
(51) 7 H01L 21/00<br />
(11) WO 01/8<strong>45</strong>98<br />
(21) <strong>PCT</strong>/EP01/04692<br />
(13) A1<br />
(22) 26 Apr/avr <strong>2001</strong> (26.04.<strong>2001</strong>)<br />
(25) de (26) de<br />
(30) 100 21 329.4 2 May/mai 2000<br />
(02.05.2000)<br />
DE<br />
(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />
(54) METHOD AND DEVICE FOR TREAT-<br />
ING SLICE-TYPE SUBSTRATES<br />
PROCEDE ET DISPOSITIF POUR LE<br />
TRAITEMENT DE SUBSTRATS DE<br />
TYPE TRANCHES<br />
(71) MATTSON WET PRODUCTS GMBH<br />
[DE/DE]; Carl-Benz-Strasse 10, 72124<br />
Pliezhausen (DE).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) LOHMÜLLER, Jürgen [DE/DE]; Unterer<br />
Mühlweg 7, 72762 Reutlingen (DE).<br />
(81) CN IL JP KR SG US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
Published / Publiée :(c)<br />
(51) 7 H01L 21/00<br />
(11) WO 01/8<strong>45</strong>99 (13) A2<br />
(21) <strong>PCT</strong>/US01/12897<br />
(22) 19 Apr/avr <strong>2001</strong> (19.04.<strong>2001</strong>)<br />
(25) en (26) en<br />
(30) 09/565,691 1 May/mai 2000 US<br />
(01.05.2000)<br />
(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />
(54) UV-ENHANCED SILYLATION<br />
PROCESS TO INCREASE ETCH RE-<br />
SISTANCE OF ULTRA THIN RESISTS<br />
PROCEDE DE SILYLATION AME-<br />
LIORE PAR L’APPLICATION D’UL-<br />
TRAVIOLETS POUR AUGMENTER<br />
LA RESISTANCE A L’ATTAQUE DE<br />
RESISTS ULTRAMINCES<br />
(71) ADVANCED MICRO DEVICES, INC.<br />
[US/US]; One AMD Place, Mail Stop 68;<br />
P.O. Box 3<strong>45</strong>3, Sunnyvale, CA 94088-3<strong>45</strong>3<br />
(US).<br />
(72) RANGARAJAN, Bharath; 2295 Dolores<br />
Avenue, Santa Clara, CA 95050 (US). SUB-<br />
RAMANIAN, Ramkumar; 4271 Norwalk<br />
Drive #X-105, San Jose, CA 95129 (US).<br />
PHAN, Khoi, A.; 3841 Thousand Oaks<br />
Drive, San Jose, CA 95136 (US). SINGH,<br />
Bhanwar; 17122 Heatherwood Way, Morgan<br />
Hill, CA 95037 (US). TEMPLETON,<br />
Michael, K.; 80 Fifteenth Avenue, Atherton,<br />
CA 94027 (US). YEDUR, Sanjay, K.; 444<br />
Saratoga Avenue #27A, Santa Clara, CA<br />
95050 (US). CHOO, Bryan, K.; 234 Escuela<br />
Avenue #74, Mountain View, CA 94040<br />
(US).<br />
(74) RODDY, Richard, J.; Advanced Micro Devices,<br />
Inc., One AMD Place, Mail Stop 68,<br />
Sunnyvale, CA 94088-3<strong>45</strong>3 (US).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EE ES FI GB GD GE GH GM HR<br />
HU ID IL IN IS JP KE KG KP KR KZ LC<br />
LK LR LS LT LU LV MA MD MG MK MN<br />
MW MX MZ NO NZ PL PT RO RU SD SE<br />
SG SI SK SL TJ TM TR TT TZ UA UG UZ<br />
VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
(51) 7 H01L 21/00, 21/66, G01R 31/26<br />
(11) WO 01/84600<br />
(21) <strong>PCT</strong>/US01/13346<br />
(13) A1<br />
(22) 25 Apr/avr <strong>2001</strong> (25.04.<strong>2001</strong>)<br />
(25) en (26) en<br />
(30) 60/200,302 28 Apr/avr 2000<br />
(28.04.2000)<br />
US<br />
(30) Not furnished / 23 Apr/avr <strong>2001</strong> US<br />
non communiqué (23.04.<strong>2001</strong>)<br />
(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />
(54) PROCESS PERTURBATION TO MEA-<br />
SURED-MODELED METHOD FOR<br />
SEMICONDUCTOR DEVICE TECH-<br />
NOLOGY MODELING<br />
PERTURBATION DE PROCESSUS<br />
DESTINEE A UN PROCEDE ME-<br />
SURE-MODELISATION POUR MO-<br />
DELISATION DE TECHNOLOGIE DE<br />
DISPOSITIF A SEMI-CONDUCTEUR<br />
(71) TRW, INC. [US/US]; One Space Park, Redondo<br />
Beach, CA 90278 (US).<br />
(72) TSAI, Roger, S.; 22499 Kent Avenue, Torrance,<br />
CA 90505 (US).<br />
(74) PANIAGUAS, John, S.; Katten Muchin<br />
Zavis, 525 West Monroe Street, Suite 1600,<br />
Chicago, IL 60661 (US) et al. / etc.<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CR CU CZ DE DK DM<br />
DZ EE ES FI GB GD GE GH GM HR HU<br />
ID IL IN IS JP KE KG KP KR KZ LC LK<br />
LR LS LT LU LV MA MD MG MK MN MW<br />
MX MZ NO NZ PL PT RO RU SD SE SG SI<br />
SK SL TJ TM TR TT TZ UA UG UZ VN YU<br />
ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
(51) 7 H01L 21/00<br />
(11) WO 01/84601 (13) A2<br />
(21) <strong>PCT</strong>/US01/14097<br />
(22) 2 May/mai <strong>2001</strong> (02.05.<strong>2001</strong>)<br />
(25) en (26) en<br />
(30) 60/201,8<strong>45</strong> 3 May/mai 2000 US<br />
(03.05.2000)<br />
(30) 09/748,526 21 Dec/déc 2000 US<br />
(21.12.2000)<br />
(43) 8 Nov/nov <strong>2001</strong> (08.11.<strong>2001</strong>)<br />
(54) IMPLANTATION PROCESS USING<br />
SUB-STOICHIOMETRIC, OXYGEN<br />
DOSES AT DIFFERENT ENERGIES<br />
PROCEDE D’IMPLANTATION UTI-<br />
LISANT DES DOSES D’OXYGENE<br />
INFERIEURES A LA STOECHIOME-<br />
TRIE A DES ENERGIES DIFFERENTES<br />
(71) IBIS TECHNOLOGY, INC. [US/US]; 32A<br />
Cherry Hill Drive, Danvers, MA 01923 (US).<br />
(72) DOLAN, Robert, P.; 2 Hazelwood Road,<br />
Hudson, NH 03051 (US). CORDTS, Bernhardt,<br />
F.; 5 Lilliam Drive, Ipswich, MA<br />
01938 (US). ANC, Maria, J.; 55 Foley<br />
Drive, Marlborough, MA 01752 (US).<br />
ALLES, Michael, L.; 43 Cole Street, Beverly,<br />
MA 01915 (US).<br />
(74) ENGELLENNER, Thomas, J. et al. / etc.;<br />
Nutter, McClennen & Fish, LLP, One International<br />
Place, Boston, MA 02110-2699 (US).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EE ES FI GB GD GE GH GM HR<br />
HU ID IL IN IS JP KE KG KP KR KZ LC<br />
LK LR LS LT LU LV MA MD MG MK MN<br />
MW MX MZ NO NZ PL PT RO RU SD SE<br />
SG SI SK SL TJ TM TR TT TZ UA UG UZ<br />
VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
Declaration / Déclaration :<br />
(s) for all designations / pour toutes les<br />
désignations<br />
(51) 7 H01L 21/00<br />
(11) WO 01/84602 (13) A2<br />
(21) <strong>PCT</strong>/US01/40620<br />
(22) 27 Apr/avr <strong>2001</strong> (27.04.<strong>2001</strong>)