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Tutorials Manual

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<strong>Tutorials</strong> <strong>Manual</strong> 4.1.1<br />

List of Figures<br />

3-7 Two Stage Catalytic Combustor—Temperature Comparison .......................................................................................98<br />

3-8 Two Stage Catalytic Combustor—Pressure Comparison .............................................................................................99<br />

3-9 Two Stage Catalytic Combustor—CH 4 Comparison.....................................................................................................99<br />

3-10 Two Stage Catalytic Combustor—CO Comparison ....................................................................................................100<br />

3-11 Two Stage Catalytic Combustor—NO Comparison ....................................................................................................100<br />

3-12 Sample USRINLET Subroutine for User-Defined Transient Inlet Conditions..............................................................104<br />

3-13 Engine Exhaust Aftertreatment—Molar Conversion Rates .........................................................................................107<br />

3-14 Engine Exhaust Aftertreatment—Mole Fractions ........................................................................................................107<br />

3-15 Engine Exhaust Aftertreatment—Gas Temperatures..................................................................................................108<br />

3-16 Setting Up a Parameter Study for Sticking Coefficients vs. Predicted Temperature Profiles ....................................110<br />

3-17 Varying Rate Constants of Reactions 1 and 6. ..........................................................................................................111<br />

4-1 Chlorosilane CVD—Equilibrium Calculations..............................................................................................................117<br />

4-2 Chlorosilane CVD—Mole Fractions.............................................................................................................................118<br />

4-3 Steady-state Thermal CVD—Deposition Rate vs. SiF 4 Mole Fraction........................................................................120<br />

4-4 Steady-state Thermal CVD—ROP Comparison..........................................................................................................121<br />

4-5 Steady-state Thermal CVD—Growth Rates................................................................................................................121<br />

4-6 Steady-state Thermal CVD—Site Fractions................................................................................................................122<br />

4-7 Cylindrical Channel Flow—Shear-flow Simulation of SiF 4 Mole Fractions .................................................................124<br />

4-8 Cylindrical Channel Flow—SiF 4 Mole Fractions Comparison .....................................................................................125<br />

4-9 Cylindrical Channel Flow—Deposition Rates Comparison .........................................................................................126<br />

4-10 Cylindrical Channel Flow—Axial Gas Velocities Comparison.....................................................................................126<br />

4-11 Deposition in a Rotating Disk—Gas Velocity Components.........................................................................................128<br />

4-12 Deposition in a Rotating Disk—Mole Fractions...........................................................................................................129<br />

4-13 Deposition in a Rotating Disk—Si Atom Concentrations.............................................................................................130<br />

4-14 Deposition in a Rotating Disk—Experimental Data.....................................................................................................130<br />

4-15 Trichlorosilane CVD—Gas Temperatures vs. Axial and Radial Distance ...................................................................132<br />

4-16 Trichlorosilane CVD—Trichlorosilane Mole Fraction .................................................................................................133<br />

4-17 Trichlorosilane CVD—Silicon Deposition Rate............................................................................................................133<br />

© 2007 Reaction Design 10 RD0411-C01-006-001

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