Tutorials Manual
Tutorials Manual
Tutorials Manual
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Chemkin 4.1.1<br />
Chapter 4: Materials Problems<br />
Figure 4-23<br />
Time-dependent ALD Simulations—O Mole Fractions Comparison<br />
The O atom mole fractions in Figure 4-23 from the stagnation flow simulations agree<br />
well with those from the PSR simulations. Within the limits of this simple deposition<br />
chemistry, this directly leads to the good agreement for deposition thickness shown in<br />
Figure 4-24. The agreement between the two models, in this case, results from the<br />
fitting of the gas-phase temperature in the PSR simulation to reproduce the O atom<br />
mole fractions in the higher-dimensional simulation. This kind of a calibration allows<br />
the faster-running PSR simulation to be used to quickly explore a wide range of pulse<br />
sequences and other experimental conditions of interest, before returning to higherdimensional<br />
simulations for more careful study.<br />
Figure 4-24<br />
Time-dependent ALD Simulations—Deposition Thickness Comparison<br />
© 2007 Reaction Design 140 RD0411-C20-000-001