Tutorials Manual
Tutorials Manual
Tutorials Manual
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List of Figures<br />
<strong>Tutorials</strong> <strong>Manual</strong><br />
4-18 Trichlorosilane CVD—Mole Fractions .........................................................................................................................134<br />
4-19 Time-dependent ALD Simulations—PSR, Total Flow Rates vs. Time........................................................................138<br />
4-20 Time-dependent ALD Simulations—TMA Contour Plot ..............................................................................................138<br />
4-21 Time-dependent ALD Simulations—O Mole Fraction .................................................................................................139<br />
4-22 Time-dependent ALD Simulations—Stagnation-flow Site Fractions ...........................................................................139<br />
4-23 Time-dependent ALD Simulations—O Mole Fractions Comparison ...........................................................................140<br />
4-24 Time-dependent ALD Simulations—Deposition Thickness Comparison ....................................................................140<br />
4-25 Steady-state Chlorine Plasma—Electron Temperatures vs. Power............................................................................143<br />
4-26 Steady-state Chlorine Plasma—Mole Fractions..........................................................................................................143<br />
4-27 Steady-state Chlorine Plasma—Cl and Cl 2 Mole Fractions ........................................................................................144<br />
4-28 Steady-state Chlorine Plasma—ROP Analysis...........................................................................................................144<br />
4-29 Spacial Chlorine Plasma—Plasma Power vs. Distance..............................................................................................146<br />
4-30 Spacial Chlorine Plasma—Electron Mole Fraction......................................................................................................147<br />
4-31 Spacial Chlorine Plasma—Cl Mole Fraction ...............................................................................................................147<br />
4-32 Spacial Chlorine Plasma—Cl + +<br />
and Cl 2 Mole Fractions .............................................................................................148<br />
4-33 Spacial Chlorine Plasma—Electron Temperature.......................................................................................................148<br />
4-34 Fluorocarbon Plasma Etching of Silicon Dioxide—SiO 2 Etch Rates Variations..........................................................151<br />
4-35 Fluorocarbon Plasma Etching of Silicon Dioxide—10 Highest Mole Fractions ...........................................................151<br />
4-36 Fluorocarbon Plasma Etching of Silicon Dioxide—Positive Ion Mole Fractions..........................................................152<br />
4-37 Fluorocarbon Plasma Etching of Silicon Dioxide—Surface Site Fractions .................................................................153<br />
4-38 Fluorocarbon Plasma Etching of Silicon Dioxide—Highest ROP................................................................................153<br />
RD0411-C01-006-001 11 © 2007 Reaction Design
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