8th Liquid Matter Conference September 6-10, 2011 Wien, Austria ...

Fri 911:10-14:00P6.37Self-similar regime of diffusion growth of droplet in thevapor-gas medium with allowance for the Stefan flowAlexander Shchekin 1 and Anatoly Kuchma 11 St Petersburg State University, 1, Ulyanovskaya ul/, Petrodvoretz, 198504, St Petersburg,Russian FederationAn analytic self-similar solution has been found for the problem of the unsteady diffusion growthof a droplet in a vapor-gas medium with allowance for the Stefan flow of the medium and themovement of the surface of the growing droplet. The expressions for the non-stationary diffusionprofile of the condensing vapor and the growth rate of the droplet have been derived and comparedwith known results for stationary diffusion growth [1, 2]. It is shown that the effect of the Stefanflow and the moving boundary of the growing droplet [3, 4] leads to a renormalization of thedroplet growth rate compared to the rate of stationary growth. This work was supported by theRFBR grant 10-03-00903- and St Petersburg State University grant 0. 37. 138. 2011.[1] N. A. Fuchs, Evaporation and Droplet Growth in Gaseous Media. Pergamon Press,London, 1959.[2] M. Kulmala, T. Vesala, P. E. Wagner, Proc. Royal Soc. London 441A, 589 (1993).[3] F. C. Frank, Proc. R. Soc. London 201, 586 (1950).[4] L. T. Adzhemyan, A. N. Vasil’ev, A. P. Grinin, A. K. Kazansky, Colloid J. 68, 381 (2006).37