Noncontact Atomic Force Microscopy - Yale School of Engineering ...
Noncontact Atomic Force Microscopy - Yale School of Engineering ...
Noncontact Atomic Force Microscopy - Yale School of Engineering ...
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Contacting self-ordered molecular wires by<br />
nanostencil lithography<br />
L. Gross, R.R. Schlittler, and G. Meyer<br />
IBM Research, Zurich Research Laboratory, 8803 Rüschlikon, Switzerland<br />
Th. Glatzel, S. Kawai, S. Koch, and E. Meyer<br />
Department <strong>of</strong> Physics, University <strong>of</strong> Basel, 4056 Basel, Switzerland.<br />
P.I-36<br />
We grew self-ordered cyanoporphyrin molecular wires [1] on thin epitaxial NaCl(100)<br />
layers on top <strong>of</strong> GaAs substrates under UHV conditions. This molecular assemblies form<br />
one- and two-dimensional wires with a length <strong>of</strong> several 10nm depending on the substrate<br />
conditions. Using a shadow masking technique [2], a nanostencil combined with a room<br />
temperature nc-AFM in UHV, we additionally evaporate Au and Cr electrodes with a<br />
thickness <strong>of</strong> around 3nm in situ. The resulting combined molecular and metal structures<br />
are investigated by means <strong>of</strong> nc-AFM and KPFM (Kelvin probe force microscopy).<br />
While nc-AFM enabled us to control the tip sample distance on the very complex and<br />
partly insulating surface, KPFM has been used to determine and compensate changes <strong>of</strong><br />
the local contact potential difference (LCPD).<br />
Figure 1: (a) nc-AFM image (size 1.7um x 1.7um, LCPD compensated) <strong>of</strong> NaCl/GaAs covered<br />
with cyanoporphyrin molecular wires and clusters. A Cr electrode was evaporated through a<br />
stencil mask in order to contact molecular wires. b) Simultaneously measured LCPD <strong>of</strong> the<br />
structure.<br />
[1] Th. Glatzel, L. Zimmerli, S. Koch, S. Kawai, and E. Meyer, Appl. Phys. Lett. 94, 063303 (2009).<br />
[2] P. Zahl, M. Bammerlin, G. Meyer, and R. R. Schlittler, Rev. Sci. Instrum. 76, 023707 (2005).<br />
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