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Pfeiffer <strong>Vacuum</strong><br />
Page 32<br />
Model<br />
Hena 25<br />
Hena 60<br />
Hena 100<br />
Hena 200<br />
Hena 300<br />
Hena 400<br />
Hena 630<br />
Hena 1000<br />
Model<br />
BA 251<br />
BA 501<br />
<strong>Vacuum</strong> <strong>Technology</strong><br />
HenaLine <br />
2.2.3.1 Single-stage rotary vane vacuum pumps<br />
HenaLine single-stage, oil-sealed votary vane vacuum pumps generate a vacuum having<br />
volume flow rates of 25 to 1,000 m3 / h at ultimate pressures of up to 0.1 mbar. They can be<br />
universally employed in many industrial and research environments. They can either be<br />
operated as a stand-alone pump or integrated into pumping stations.<br />
With appropriate accessories, these pumps are also suitable for use under the harshest<br />
operating conditions, i.e. at high inlet pressures as well as in cycle-mode operation. Oil mist<br />
filters, oil return systems and vacuum safety valves are all integrated as standard equipment.<br />
In addition to preventing pollution of the ambient air, they also protect the pump and the<br />
system. A gas ballast valve enables pump-down of water vapor and other process vapors.<br />
Table 2.1: HenaLine performance data<br />
UnoLine Plus<br />
Pumping Speed<br />
25 m 3 / h<br />
60 m 3 / h<br />
100 m 3 / h<br />
200 m 3 / h<br />
300 m 3 / h<br />
600 m 3 / h<br />
630 m 3 / h<br />
1,000 m 3 / h<br />
UnoLine Plus pumps can be optimally employed for industrial applications, first and foremost.<br />
These rotary vane vacuum pumps have proven track records as both stand-alone and backing<br />
pumps for Pfeiffer <strong>Vacuum</strong> Roots pumps. An ultimate pressure of approximately 6 . 10 -2 mbar<br />
can be attained. These pumps are water-cooled and extremely insensitive to dust and dirt.<br />
They are equipped with an oil regeneration system. Condensates, contaminants and dust<br />
particles can be separated from the operating medium, collected in the vapor separator and<br />
drained. The adjustable cooling water controller enables the UnoLine Plus pumps to maintain<br />
the required operating temperature. These pumps are equipped with gas ballast in order to<br />
pump down vapors.<br />
Table 2.2: UnoLine Plus performance data<br />
Pumping Speed<br />
250 m3 / h<br />
500 m3 / h<br />
Ultimate Pressure<br />
0.1 mbar<br />
0.1 mbar<br />
0.1 mbar<br />
0.1 mbar<br />
0.1 mbar<br />
0.1 mbar<br />
0.1 mbar<br />
0.4 mbar<br />
Ultimate pressure<br />
6 . 10 -2 mbar<br />
6 . 10 -2 mbar<br />
Applications<br />
Suitable for electron beam welding,<br />
incandescent light bulb manufacturing,<br />
surface coating, vacuum drying,<br />
leak detection, metallurgy,<br />
gas recovery, load lock applications,<br />
simulation chambers<br />
Applications<br />
Suitable for all industrial applications, e. g.<br />
metallurgy, transformer drying, coating,<br />
chemistry<br />
www.pfeiffer-vacuum.net
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