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universidade de são paulo - Faculdade de Odontologia - Unesp

universidade de são paulo - Faculdade de Odontologia - Unesp

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43<br />

adherence observed in the present study could not be related to hydrophobic<br />

interactions. Although ArO 2 /70W plasma treatment resulted in a more hydrophilic<br />

surface (Table 1), after immersion of the specimens in water for 48 hours, the<br />

contact angles were similar to those of the control specimens. A possible<br />

explanation for this recovery could be that the <strong>de</strong>crease in the water contact angle<br />

obtained with ArO 2 /70 W enhanced the surface energy. Un<strong>de</strong>r such a situation, it<br />

has been observed the polymer surfaces submitted to plasmas ten<strong>de</strong>d to return to<br />

their original hydrophobicity 15 . This was attributed to movement of polar groups<br />

from the surface to the polymer bulk.<br />

The results also <strong>de</strong>monstrated that the adherence of C. albicans to<br />

ArSF 6 /70W plasma treated specimens was significantly reduced compared to<br />

control. To the author’s knowledge to date, the potential of fluorine plasma<br />

treatment to reduce adhesion of Candida albicans to <strong>de</strong>nture base material has yet<br />

not been addressed. Similarly to the ArO 2 /70W treatment, it was not possible to<br />

correlate the reduction in C. albicans adhesion promoted by ArSF 6 /70W treatment<br />

with surface hydrophobicity. After the ArSF 6 /70W plasma treatment, the sample<br />

surfaces became hydrophobic exhibiting the highest contact angle values.<br />

However, after water immersion for 48 hours, a <strong>de</strong>crease in the contact angle<br />

values was observed and the values were close to those obtained in the other<br />

groups, including control. Despite these changes, the fluorine was still present in<br />

the surface, as <strong>de</strong>monstrated by XPS analysis. Hence, the reduction of the<br />

adherence of C. albicans with ArSF 6 /70W plasma treatment could be attributed to<br />

repulsive electrostatic forces between the fungal cells and specimens in which

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