European Journal of Scientific Research - EuroJournals
European Journal of Scientific Research - EuroJournals
European Journal of Scientific Research - EuroJournals
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Effect <strong>of</strong> Scaling on the Performance <strong>of</strong> the 4-Bit CPL Subtractor Circuit 246<br />
scaled down feature sizes. The maximum IDD is used to find out the transistor operation points.<br />
According to Donald A. Neaman et.al [13], when temperature increased, the current will be decreased.<br />
Any motion <strong>of</strong> free carriers in a semiconductor leads to a current. This motion can be caused by an<br />
electric field due to an externally applied voltage, since the carriers are charged particles. This carrier<br />
transport mechanism is due to the thermal energy and the associated random motion <strong>of</strong> the carriers. We<br />
will refer to this transport mechanism as carrier diffusion. The total drain current in a semiconductor<br />
equals the sum <strong>of</strong> the drift and the diffusion current. As one applies an electric field to a<br />
semiconductor, the electrostatic force causes the carriers to first accelerate and then reach a constant<br />
average velocity (v), due to collisions with impurities and lattice vibrations. The ratio <strong>of</strong> the velocity to<br />
the applied field is called the mobility. The velocity saturates at high electric fields reaching the<br />
saturation velocity. Additional scattering occurs when carriers flow at the surface <strong>of</strong> a semiconductor,<br />
resulting in a lower mobility due to surface or interface scattering mechanisms. Diffusion <strong>of</strong> carriers is<br />
obtained by creating a carrier density gradient. Such gradient can be obtained by varying the doping<br />
density in a semiconductor or by applying a thermal gradient. Both carrier transport mechanisms are<br />
related since the same particles and scattering mechanisms are involved. This leads to a relationship<br />
between the mobility and the diffusion constant called the Einstein relation. According to Fig. 4, our 4<br />
bit Multiplexing control input technique adder based subtractor circuit is giving low current compared<br />
other existing circuits. So, our designed 4 bit subtractor circuits are used in low power and high speed<br />
mobile circuits, which will give withstand long hour’s battery life.<br />
We have compared the gate capacitance value and power dissipation <strong>of</strong> our scaled 4 bit<br />
subtractor circuit with David Duarte et.al [14] reported results for microprocessor system. Fig 5 shows<br />
the comparison result for gate capacitance and it s observed that the gate capacitance value decrease in<br />
our circuit than David Duarte et.al [14]. The maximum percentage improvement <strong>of</strong> 98.30 is observed<br />
when the circuit is scaled to 50nm. The average improvement is around 50%.<br />
Table 2: The 4 bit subtractor circuit<br />
Feature<br />
size<br />
Simulation result (Before)<br />
Power (µW) delay Area µm<br />
Scaling result (after applying scaling<br />
technique)<br />
% improvement<br />
2 Power (µW) delay (ps) Area µm 2 Power delay Area<br />
120nm 0.608 0.41ns 2664 0.29 28 2414 52.3 93.17 9.3<br />
90nm 0.276 71ps 1845 0.10 25 1680 63.76 64.78 8.94<br />
70nm 4.56 71ps 1770 4.32 18 1568 5.263 74.64 11.412<br />
50nm 0.121 52ps 924 0.077 15 869 36.36 71.15 5.95<br />
Figure 5: Comparison graph