ARCPHOTOVOLTAICSCENTRE OFEXCELLENCE2010/11ANNUAL REPORTSimulated Voc <strong>of</strong> a poly-Si solarcell (2.2 µm thick n-type absorber,Jsc 27 mA/cm 2 ) in which bothshallow bands recombination anddeep level recombination at grainboundaries (with electrostaticfluctuations) occur.Figure 4.4.1.38The effect <strong>of</strong> recombination via deep levelsat charged defects is to place an upperlimit on the minority carrier lifetime (thusthe cell Voc). Figure 4.4.1.38 shows Vocsimulation results <strong>of</strong> poly-Si solar cellswhere two recombination processes inthe absorber, both via shallow bands andvia deep levels, taking place in parallel.Above 1x10 16 cm -3 doping, the Voc is fairlyconstant and approaches the 485 mVlimit corresponding to the case whereonly shallow band recombination occurs.Below 1x10 16 cm -3 doping, deep levelrecombination becomes influential to thedevice performance eroding the Voc by about 21mV when the doping reaches 1x10 15 cm -3 . Thus, inthe practically significant dopant concentrationrange <strong>of</strong> 5x10 15 ~5x10 16 cm -3 , an immediatechallenge to consistently raising the Voc above 500mV is to reduce the dislocation density to belowthe 1x10 9 cm -2 level. If and when this is achievedthe next step to even higher Voc is minimisation <strong>of</strong>charged defects likely associated with impurities.4.4.1.11 References4.4.1.1 M.A. Green, “Polycrystalline silicon on glassfor thin-film solar cells”, Applied Physics A: 96,p. 153, 2009.4.4.1.2 A. G. Aberle, “Fabrication and characterisation <strong>of</strong>crystalline silicon thin-film materials for solar cells”,Thin Solid Films, 26, p. 511, 2006.4.4.1.3 P. A. Basore, Proceedings <strong>of</strong> the 21st EUPVSEC, p.544, Dresden, Germany, 2006.4.4.1.4 M. Keevers, T.L. Young, U. Schubert, R. Evans,R.J. Egan and M.A. Green, “10% Efficient Csgminimodules:, Proceedings <strong>of</strong> the 22nd EUPVSEC,p. 1783, Milan, Italy, 2007.4.4.1.5 G. Jin, P. 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