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Complete Report - University of New South Wales

Complete Report - University of New South Wales

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ARCPHOTOVOLTAICSCENTRE OFEXCELLENCE2010/11ANNUAL REPORTIncreasing order <strong>of</strong> wavelengthDecreasing order <strong>of</strong> bandgap energy<strong>of</strong> the semiconductorIncreasing order <strong>of</strong> particle sizeSchematic representation showingan example <strong>of</strong> surface plasmonresonance tunability by varying the<strong>of</strong> size <strong>of</strong> the metal nanoparticlesfor wavelength dependent lighttrapping in a tandem solar cell.Figure 4.5.70can be optimised independently <strong>of</strong> each other. Ourrecent work has also made use <strong>of</strong> an additionalreflecting layer (paint) along with the nanoparticlelayer on the rear side <strong>of</strong> the cell to maximise therandomisation <strong>of</strong> light and to ensure no light islost [4.5.80].In this study we focus our interest on the use <strong>of</strong>plasmonics for low-dimensional structures likequantum dot structures for possible applicationsin tandem solar cells. PL measurements wereused to characterise the samples. The analysisis based on the reciprocity <strong>of</strong> light that a goodabsorber can be a good emitter and the pro<strong>of</strong><strong>of</strong>concept established with EL measurementsin an earlier study [4.5.82]. Hence the PLenhancement would be synonymous to anincrease in photocurrent for an optimised QD cell.The tunability <strong>of</strong> plasmon resonance allows thepossibility <strong>of</strong> increasing the photocurrent <strong>of</strong> eachcell in a tandem cell configuration. Optimisingthe nanoparticle parameters can help achievewavelength dependent light trapping which willbe an encouraging step towards increasing theperformance <strong>of</strong> a tandem solar cell. Figure 4.5.70shows one way <strong>of</strong> achieving the SPR tunability byvarying the size <strong>of</strong> the nanoparticles in a tandemcell configuration.The sample under study is a 4nm single layer siliconQD structure in an oxide matrix with a 6nm cappingoxide layer with an emission wavelength <strong>of</strong> 930nm(~1.3eV). Mass thicknesses <strong>of</strong> 10, 14, 18 and 22 nmsilver were deposited and the particles annealedat 200°C in nitrogen for an hour. A 532nm, 10mWNd:YAG laser was used to illuminate the samplesfor both the front (incident on QD layer) and rearside (incident on the quartz slide) locations <strong>of</strong> thesilver nanoparticles and the PL plots studied. PLmeasurements were carried out on these samplesand the effect <strong>of</strong> different size particles wereinvestigated both before and after the deposition <strong>of</strong>the nanoparticles.The self assembly techniques <strong>of</strong> nanoparticlefabrication give a varied size and shape distributionvery suitable for a broadband response. This isparticularly noted for particles corresponding tothicker Ag layers as can be seen from the PL plots inFig. 4.5.71. The red-shift <strong>of</strong> the enhancement peakswith larger particles are also clearly evident. Moredetails <strong>of</strong> this work has been reported in [4.5.83].Rear located nanoparticles perform better thanfront located nanoparticles, consistent with theresults from thin-film cells. We believe this isbecause <strong>of</strong> the change in scattering cross-section <strong>of</strong>the nanoparticles due to the changes in the drivingfield and also due to the change in the mode <strong>of</strong>excitation (from air for front located nanoparticlesand from Si for rear located nanoparticles) forthe two different locations on the samples. Morework need to be done to better understand themechanism. Further work will also concentrateon using alternate approaches for tuning theresonance position close to the band-edge(emission wavelength for PL) to increase thescattering properties and hence absorption in theweakly absorbing range.4.5.6 Concluding remarks for the ThirdGeneration sectionIn 2010 work has proceeded significantly in all theareas <strong>of</strong> Third Generation research, with improvedfabrication and characterisation <strong>of</strong> materials andcomplexity <strong>of</strong> modelling which together give anoverall better understanding and optimisation<strong>of</strong> devices.Group IV based nanostructure materials have seensignificant improvement in device design. Withinterlayers, in both SiN xand SiC matrices, used toeffectively control both the uniformity <strong>of</strong> size <strong>of</strong> SiQDs and carrier transport in the growth direction.Modelling now allows the confined energy levels<strong>of</strong> complex QD shapes to be calculated and theiroverlap to form mini-bands estimated in moredetail. At the same tiome improved characterisationis giving a much clearer idea on the shape anddistributions <strong>of</strong> Si QDs and is now allowing choice<strong>of</strong> growth parameters to give uniform size sphericalQDs to be grown. Ge nanostructure materials haveseen improved control <strong>of</strong> p-type conductivity in96

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