Electronic Material Properties - und Geowissenschaften ...
Electronic Material Properties - und Geowissenschaften ...
Electronic Material Properties - und Geowissenschaften ...
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Chemical Analytics<br />
The chemical analytics division deals with all kinds of topics concerned with qualitative,<br />
semiquantitative and quantitative analytics of elemental composition and characterisation<br />
of chemical binding in solid and liquid samples.<br />
For solids, measurements with high spatial resolution are carried out by Electron Probe<br />
Micro Analysis (EPMA) and Secondary Ion Mass Spectrometry (SIMS). The latter is also<br />
used for thin film analysis with high depth resolution.<br />
Average compositions of solids are analyzed by X-ray Fluorescence Analysis (XRF),<br />
solutions of materials are measured by Atomic Absorption Spectrometry (AAS), ICP<br />
Optical Emission Spectrometry (ICP-OES) and Gas Chromatography, coupled with high<br />
resolution Mass Spectrometry (GC-MS).<br />
Present research topics are:<br />
Thin film speciation<br />
In thin film technology, the identification of chemical compo<strong>und</strong>s, phases and binding<br />
conditions is of basic importance. In a collaboration with Physikalisch-Technische<br />
B<strong>und</strong>esanstalt in Berlin and institutes in Novosibirsk/Russia, thin films of boron<br />
carbonitride and silicon carbonitride are prepared and characterized. The preparation<br />
techniques are plasma enhanced chemical vapour deposition and sputtering (physical<br />
vapour deposition). The chemical composition of the films is measured by SIMS. The<br />
atomic binding states are investigated by Near Edge X-ray Absorption Fine Structure<br />
(NEXAFS) measurements, partially in Total reflection and Glancing Incidence X-ray<br />
Fluorescence (TXRF, GIXRF) geometry, by X-ray Photoelectron Spectrometry (XPS –<br />
collaboration with Dr. A. Klein, Surface Science), and by Transmission Electron<br />
Microscopy with Electron Energy Loss Spectrometry (TEM-EELS). The TXRF-NEXAFS<br />
experiments are carried out at BESSY II.<br />
In another project, thin films (nanofilms) of carbides of boron, silicon, titanium, and<br />
tantalum are formed by hydrocarbon plasma immersion ion implantation, in collaboration<br />
with Industrial Technology Center of Nagasaki. The chemical film composition is analyzed<br />
by SIMS, the phase composition by X-ray diffraction. Film morphology and microstructure<br />
are investigated by scanning electron microscopy and by atomic force microscopy.<br />
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