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Electronic Material Properties - und Geowissenschaften ...

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Relative density<br />

1.00<br />

0.95<br />

0.90<br />

0.85<br />

0.80<br />

0.75<br />

0.70<br />

1300°C<br />

1150°C<br />

Film exp. Film model<br />

Bulk<br />

0.65<br />

0 2000 4000 6000 8000 10000<br />

Isothermal time [s]<br />

Fig 1. Experiment and modelled densification curves for 2 sintering temperatures<br />

The effect of film thickness was also investigated. Thinner layers seem to be more<br />

constrained, as they densify more slowly than thicker ones. Particle rearrangement may be<br />

hindered close to the substrate, which leads to a lower local density than elsewhere in the<br />

film (Fig 2).<br />

Fig. 2 Polished cross-section of a sintered film<br />

Finally, an extension of the sintering model to anisotropic bodies has been proposed. In<br />

the case of transverse isotropy, 2 free sintering strain rates, 2 uniaxial viscosity as well as<br />

3 viscous Poisson’s ratios are introduced. In specific cases, such as constrained sintering,<br />

only 2 Poisson’s ratios are required. The experimental determination of these parameters<br />

is still challenging, as anisotropic specimens have to be obtained before being loaded in<br />

different directions and their strains measured.<br />

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