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handbook of carbon, graphite, diamond and fullerenes

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Structure <strong>and</strong> Properties <strong>of</strong> Diamond 275<br />

The by-product <strong>of</strong> the reaction is <strong>carbon</strong> dioxide which, being a gas,<br />

provides no surface passivation. A fresh <strong>diamond</strong> surface is always<br />

exposed <strong>and</strong> oxidation proceeds parabolically with temperature. Oxidation<br />

in air is less rapid with the onset <strong>of</strong> the reaction at approximately 500°C.<br />

Under normal conditions, oxygen is adsorbed on the surface <strong>of</strong><br />

<strong>diamond</strong> after exposure to air (or oxygen) for a period <strong>of</strong> time. However, no<br />

adsorption occurs if the temperature is below -78°C. From 0 -144°C, oxygen<br />

is chemisorbed. CO2 is formed from 244 to 370°C by the interaction <strong>of</strong> O2<br />

with the <strong>diamond</strong> surface. [24] Adsorbed oxygen <strong>and</strong> <strong>carbon</strong> oxides account<br />

for the hydrophillic characteristic <strong>of</strong> <strong>diamond</strong>. As mentioned in Sec. 10.4,<br />

the formation <strong>of</strong> surface oxides is also an important factor in the control <strong>of</strong><br />

frictional properties.<br />

At 600°C <strong>and</strong> low pressure, the presence <strong>of</strong> residual oxygen results in<br />

the formation <strong>of</strong> a dense film <strong>of</strong> <strong>graphite</strong>.<br />

11.2 Reaction with Hydrogen<br />

Like oxygen, hydrogen is chemisorbed on the surface <strong>of</strong> <strong>diamond</strong> but<br />

not until a temperature <strong>of</strong> 400°C is reached. This chemisorption is probably<br />

the result <strong>of</strong> the formation <strong>of</strong> surface hydrides. Diamond is generally<br />

considered inert to molecular hydrogen (as opposed to <strong>graphite</strong>). However<br />

attack by atomic hydrogen occurs above 1000°C. Yet <strong>diamond</strong> is far less<br />

reactive than <strong>graphite</strong>, a characteristic which is used to good advantage in<br />

the deposition <strong>of</strong> <strong>diamond</strong> films <strong>and</strong> the selective elimination <strong>of</strong> the codeposited<br />

<strong>graphite</strong> (see Ch. 13).<br />

11.3 General Chemical Reactions<br />

Diamond is resistant to all liquid organic <strong>and</strong> inorganic acids at room<br />

temperature. However it can be etched by several compounds including<br />

strong oxidizers such as sodium <strong>and</strong> potassium nitrates above 500°C, by<br />

fluxes <strong>of</strong> sodium <strong>and</strong> potassium chlorates, <strong>and</strong> by molten hydroxides such<br />

asNaOH. It is resistant to alkalis <strong>and</strong> solvents. At approximately 1000°C,<br />

it reacts readily with carbide-forming metals such as Fe, Co, Ni, Al, Ta, <strong>and</strong><br />

B. This characteristic provides the mechanism <strong>of</strong> high-pressure synthesis<br />

(see Ch. 12, Sec. 4.5). Generally speaking, <strong>diamond</strong> can be considered as<br />

one <strong>of</strong> the most-chemically resistant material.

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