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CVD Diamond 321 if high-angle boundaries are dominant. A polycrystalline material such as CVD diamond has many such boundaries and various crystallite orientations and grain sizes. As a result, its properties (particularly thermal, optical, and electrical) do not quite match those of single-crystal diamond, as shown in Table 13.6. The ability to deposit single-crystal diamond, or at least a material with a high degree of crystalline orientation and with properties equal to the highpurity single crystal material, would be an important factor in the development of CVD diamond in electronic, semiconductor, optical, and other applications. The epitaxial growth of single-crystal diamond by CVD could be accomplished by selecting a substrate with a crystal lattice parameters that closely matches that of diamond and that would have the same atomic bonding characteristic^ 281 Single-crystal diamond is the only substrate found suitable so far but it is limited by its small size and high cost. The development of other suitable substrates for epitaxial growth would allow the production of diamond semiconductor wafers. I ndications are that some nickel alloys such as nickel-copper have a crystal structure that is sufficiently close to that of diamond to allow the deposition of epitaxial films.! 41 ' 3.11 Morphology The as-deposited surface of CVD diamond is rough as shown in Fig. 13.8 and a polishing step is required for many applications. Polishing to less than 5 nm radius without chipping or grain pulling is normally a difficult task. A smooth surface is now possible with the development of an ion-implantation technique with an energy range of up to 5000 keV, which softens the surface. This step is followed by a mechanical polishing with diamond pasteJ 42 ! 4.0 PROPERTIES OF CVD DIAMOND 4.1 Summary of Properties CVD diamond is a recent material and, like single-crystal diamond, it is expensive and available only in small quantities and mostly in the form of coatings. As a result, the evaluation of its properties is still limited. The
322 Carbon, Graphite, Diamond, and Fullerenes Figure 13.8. Scanning electron micrographofCVD-diamond coating. (Photograph courtesy Norton Diamond Film, Northboro, MA.) difficulty in testing, the effect of impurities and structural defects, and the differences between the various deposition processes may contribute to the uncertainty and spread found in the reported property values. These properties are summarized and compared to single-crystal diamond in Table 13.6.[30]-[33][43] 4.2 Thermal Properties The mechanism of thermal conductivity in CVD diamond was reviewed in Secs. 3.6 and 3.9. In spite of crystal boundaries and resulting phonon scattering, the thermal conductivity is remarkably high which makes CVD diamond particularly suitable for heat-sink applications Sec.5.4). (see
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HANDBOOK OF CARBON, GRAPHITE, DIAMO
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Contents 1 Introduction and General
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xii Contents 5.0 ELECTRICAL PROPERT
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xiv Contents 2.0 THE CVD OF PYROLYT
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xvi Contents 6.0 CERAMIC-MATRIX, CA
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xviii Contents 4.0 NATURAL AND HIGH
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xx Contents 2.0 STRUCTURE OF THE FU
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Preface ix technology, processes, e
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2 Carbon, Graphite, Diamond, and Fu
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10 Carbon, Graphite, Diamond, and F
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Synthetic Carbon and Graphite: Carb
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100 Carbon, Graphite, Diamond, and
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Vitreous Carbon 1.0 GENERAL CONSIDE
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8 Carbon Fibers 1.0 GENERAL CONSIDE
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Applications of Carbon Fibers 1.0 C
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10 Natural Graphite, Graphite Powde
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11 Structure and Properties of Diam
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Page 371 and 372: 15 The Fullerene Molecules 1.0 GENE
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Glossary Ablation: The removal of m
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Index Ablation 38 Absorption bands
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Copyright © 1993 by Noyes Publicat
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vi Series HANDBOOK OF CHEMICAL VAPO
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