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Nondestructive testing of defects in adhesive joints

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Acknowledgment:<br />

One <strong>of</strong> the authors (PP) thanks Department <strong>of</strong> Science and Technology, Government <strong>of</strong> India, for<br />

f<strong>in</strong>ancial assistance.<br />

References<br />

[1] Kovacs G J and V<strong>in</strong>centt P S 1982 J. Colloid. Interface. Sci. 90 335<br />

[2] Kovacs G J and V<strong>in</strong>centt P S 1983 Th<strong>in</strong> Solid Films 100 341<br />

[3] Kovacs G J, V<strong>in</strong>centt P S, Trumblay C and Pundsak A L 1983 Th<strong>in</strong> Solid<br />

Films 101 21<br />

[4] Kovacs G J and V<strong>in</strong>centt P S 1984 Th<strong>in</strong> Solid Films 111 65<br />

[5] Kunz M S, Shull K R and Kellock A J 1992 J. Appl. Phys. 72 4458<br />

[6] Mohan Rao K and Pattabi M 2001 J. New Mat. Electrochem. Systems 4 11<br />

[7] Mohan Rao K, Pattabi M, Mayya K S, Sa<strong>in</strong>kar S R and Murali Sastry M S<br />

1997 Th<strong>in</strong> Solid Films 310 97<br />

[8] Mohan Rao K, Manjunatha Pattabi, Sa<strong>in</strong>kar S R, Arun Lobo, Kulkarni S K,<br />

Jayasheela Uchil and Murali Sastry M S 1999 J. Phys. D: Appl.Phys. 32 2327<br />

Table 1: Resistances at substrate temperature (Rst), after one hour <strong>of</strong> ag<strong>in</strong>g ( R1hr), at Room<br />

temperature (Rrt) and particle size for silver films deposited on PS/P4VP blends held at 457 K.<br />

Polymer<br />

PS:P4VP<br />

Silver film<br />

thickness<br />

Resistances (MΩ/ ) Particle size<br />

XRD (nm)<br />

Rst R1 hra Rrt<br />

0:100 50 nm 1.9 26.8 27.1 30<br />

25:75 50 nm 6.2 42.2 47.1 46.6<br />

25:75 85 nm 3.2 14.7 14.2 53<br />

50:50 50 nm 15.9 119.5 159.4 49.1<br />

50:50 95 nm 2.9 29.9 30.1 47.5<br />

75:25 50 nm 214 325 - 51.8<br />

75:25 150 nm 14.8 98.2 248.9 46.4<br />

100:0 50 nm 302 491 - 53.3

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