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Pharmaceutical Manufacturing Handbook: Production and

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eplicated on the substrate, with nanoscale features usually patterned by X - ray or<br />

electron beam exposure. The mask is then placed on the surface of the substrate<br />

<strong>and</strong> exposed to near - fi eld light, the intensity of which leads to replication of the<br />

pattern on the mask on to the substrate. Complex geometries, shapes, <strong>and</strong> features<br />

can be produced on the substrate which can subsequently be removed to give free -<br />

st<strong>and</strong>ing particles or objects [170, 171] .<br />

Molecular Imprinting Molecular Imprinting is a process used to imprint or copy<br />

recognition sites from desired molecules on to polymer structures [172, 173] . The<br />

recognition sites can be produced on organic or inorganic polymers <strong>and</strong> inorganic<br />

materials such as silica <strong>and</strong> biomaterials such as proteins. A template molecule is<br />

dissolved in solvent with polymerizable monomers which undergo bond formation<br />

with the template molecule forming either noncovalent bonds through electrostatic<br />

interactions, hydrogen bonds or hydrophobic interactions, or reversible covalent<br />

bonds. The monomers are then polymerized to form a cast or semirigid polymeric<br />

structure which maintains the steric conformation of the molecule template <strong>and</strong> its<br />

recognition site upon removal of the template molecule. As a result, the molecular<br />

template affi nity for molecules <strong>and</strong> analyte is mimicked by the “ imprinted ” polymer<br />

[174] . This has applications in chromatography <strong>and</strong> drug discovery <strong>and</strong> potential<br />

applications in targeted drug delivery.<br />

Layer -by -Layer Electrostatic Deposition Electrostatic deposition utilizes the<br />

electrostatic bonding affi nities of materials imparted by their surface charge to build<br />

highly ordered multilayered fi lms or structures on a substrate. The process involves<br />

the successive deposition of oppositely charged polyions, exploiting the Coulombic<br />

long - range electrostatic interactions between the oppositely charged molecules,<br />

allowing formation of multilayers over a large distance. This technique can be used<br />

to build multilayer composite fi lms on particles incorporating molecular fragments<br />

such as polymer – polymer, polymer – organic, polymer bimolecular, <strong>and</strong> polymer –<br />

mineral composition [175 – 177] .<br />

Chemical Vapor Deposition CVD is a crystal growth process whereby a solid<br />

material is deposited from the gas phase onto a controlled substrate using a suitable<br />

mixture of volatile precursor materials which react to produce the desired deposit<br />

on the substrate surface (Table 4 ). Types of fi lms <strong>and</strong> structures that can be produced<br />

include the following:<br />

Polycrystalline<br />

Amorphous<br />

Epitaxial silicon<br />

Carbon fi ber<br />

Filaments<br />

Carbon nanotubes<br />

Silicon dioxide<br />

Tungsten<br />

Silicon nitride<br />

Titanium nitride<br />

MANUFACTURING TECHNOLOGIES 1301

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