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The Impact of Dennard's Scaling Theory - IEEE

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Message from the President<br />

In 2007, look for an unadvertised bonus<br />

with your SSCS membership: A free<br />

subscription to the brand new quarterly<br />

Nanotechnology Magazine. We believe<br />

that circuit experts need to be in touch<br />

with this rapidly progressing technology.<br />

Some day it will be a fruitful area<br />

for circuits development, and opportunities to contribute<br />

will arise.<br />

<strong>The</strong> minimal subscription cost to the Society for the<br />

launch year <strong>of</strong> the new magazine prompted the AdCom<br />

to join the Nanotechnology Council. We hope the<br />

Council’s magazine effort will be <strong>of</strong> comparable interest<br />

to its Transactions on Nanotechnology, which is just<br />

beginning its sixth year and has among the highest rates<br />

<strong>of</strong> citation as measured by the Thompson ISI. I would<br />

like to receive feedback from you on how useful a tool<br />

the new magazine is. Look for the first issue in the<br />

spring <strong>of</strong> 2007.<br />

2007 is the Society’s 10th anniversary, having<br />

evolved from the Solid-State Circuits Council that originated<br />

in 1970. We’ve updated the SSCS logo for this<br />

year to draw attention to our progress. Since 1997, the<br />

Journal <strong>of</strong> Solid-State Circuits has increased coverage <strong>of</strong><br />

technical articles by 40%, and the SSCS Newsletter by 2<br />

1/2 times. <strong>The</strong> JSSC continues to be the most read in<br />

<strong>IEEE</strong> Xplore and the most cited in patents. Your SSCS<br />

membership provides online access not only to the<br />

Journal but also to the digests <strong>of</strong> our five major solidstate<br />

circuits conferences and most <strong>of</strong> their historic<br />

record. Local chapters have grown from 2 to 59, with<br />

Corrections<br />

In the article entitled “Overview <strong>of</strong><br />

CMOS Technology Development in<br />

the MIRAI Project,” by Toshiaki<br />

Masuhara and Masataka Hirose in<br />

the September 2006 issue, the last<br />

sentence in the Section entitled<br />

“New Circuits and System Technology<br />

- Post-fabrication Adaptive<br />

Adjustment” contains an incorrect<br />

expression, which is corrected as in<br />

the underlined expression in the following<br />

sentence:<br />

“As shown in Fig. 3, the developed<br />

tool successfully extracted the<br />

34 model parameters in 23 hours<br />

with a PC and resulted in a mean<br />

RMS error <strong>of</strong> 1.83% for benchmark<br />

MOSFETs.”<br />

In the Section, “New Gate Stack<br />

Technology with High-k Materials”,<br />

the caption for Figure 4 should read:<br />

Fig. 4 Gate leakage current in<br />

MIRAI HfAlON formed by Layer-by-<br />

Layer Deposition and Annealing<br />

(LL-D&A) 4 ).<br />

(a) Comparison <strong>of</strong> gate leakage current<br />

in MOSFETs with HfAlON<br />

gate insulator and HfSiON 5 ).<br />

(b) Cross sectional TEM micrograph<br />

<strong>of</strong> HfAlON/SiO 2 /Si gate stack<br />

formed by Layer-by-Layer Deposition<br />

and Annealing.<br />

<strong>The</strong> following corrections pertain<br />

to the reprint <strong>of</strong> “Lithography and<br />

the Future <strong>of</strong> Moore’s Law” (Moore,<br />

1995) in the September 2006 issue:<br />

I have reproduced photomicrographs<br />

<strong>of</strong> the first planar transistor<br />

the recent addition <strong>of</strong> Tainan (Taiwan) and South<br />

Brazil. Celebrate our anniversary by browsing your<br />

technical articles online.<br />

I’ve been active in the last quarter attending many <strong>of</strong><br />

the conferences that SSCS cosponsors to sample their<br />

quality, focus, and differences, as well as to increase the<br />

Society’s visibility and support for these important gatherings<br />

<strong>of</strong> technical experts. ESSCIRC in Montreux,<br />

Switzerland last fall was fully overlapped with the ESS-<br />

DERC device conference. One was able to move freely<br />

between the co-located meetings. <strong>The</strong> wide variety <strong>of</strong><br />

plenary topics covered by the two meetings was <strong>of</strong> particular<br />

interest. Welcoming the Asian-Solid-State Circuits<br />

Conference in Hangzhou, China two months later, I was<br />

able to talk with circuit experts from around the world,<br />

and by the time this issue reaches you, I will have celebrated<br />

the opening <strong>of</strong> the 20th International Conference<br />

on VLSI Design in Bangalore.<br />

Thanks to all <strong>of</strong> our members who voted in our fall<br />

election. Welcome to our new additions to AdCom,<br />

Kevin Kornegay from Georgia Tech and Harry Lee from<br />

MIT. And welcome back to returning AdCom members<br />

John Corcoran from Agilent Laboratories, Tom Lee from<br />

Stanford, and Jan Van der Spiegel from the University <strong>of</strong><br />

Pennsylvania. <strong>The</strong> Society is beginning a review <strong>of</strong> its<br />

priorities for 2007 and beyond. As Society members,<br />

please make your interests known to your AdCom representatives.<br />

Start a conversation and help the Society<br />

point to the future that you feel is coming.<br />

Richard C. Jaeger<br />

and the first commercially-available<br />

integrated circuit in Figs 3 & 4. I am<br />

particularly fond <strong>of</strong> the transistor,<br />

since it is one <strong>of</strong> the very few products<br />

that I designed myself that<br />

actually went into production.<br />

Fig. 3. Photomicrograph <strong>of</strong> the first<br />

commercial planar transistor.<br />

continued on page 10<br />

4 <strong>IEEE</strong> SSCS NEWSLETTER Winter 2007

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