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tesi R. Miscioscia.pdf - EleA@UniSA

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6 Introduction<br />

Motivation and purpose of this thesis<br />

The theme of the present PhD thesis is the role played by the<br />

gate dielectric in the electrical performance of organic transistors and<br />

is based on the research activities described above. When talking<br />

about performances, not just charge mobility has to be considered but<br />

also it’s necessary to take into account gate capacitance, threshold<br />

voltages, gate leakages and static power dissipations, operating<br />

voltages, drain currents and so on in order to get a deeper insight of<br />

what kind of specifications an OTFT device should obey to be suitable<br />

for industrial/commercial purposes.<br />

In particular, in the present work the characteristics of the<br />

OTFTs have been analyzed in relation to manufacturing parameters<br />

and processes, focusing on non-ideal behaviors and aiming to<br />

optimize the characteristics of the transistor acting on morphologies,<br />

geometries and process conditions.<br />

Excluding this introduction and the conclusions, the thesis is<br />

divided into four chapters.<br />

The first chapter is a brief discussion about the working<br />

principles of OTFTs. The approach aims to reduce the complexity of<br />

the analysis in order to discuss the basic tools to study OFETs from<br />

the electrical point of view.<br />

In the second chapter, a broad overview of the state of the art<br />

of technology for innovative methods of manufacturing for OTFTs<br />

shows topologies, materials and processing technology and<br />

integration issues and compares strengths and weaknesses to guide the<br />

experimental work subsequently documented by means of process<br />

recipes and details.<br />

In the third chapter gate-leakage non-idealities are analyzed<br />

by changing the dielectric material in comparable structure topologies<br />

modeling the device by means of a circuital equivalent.<br />

The fourth chapter is devoted to gate field-mobility and<br />

thermal analyses performed to investigate the main parameters<br />

changes in OTFT devices. In detail, by acting on dielectric material<br />

and gate insulator surface, we analyzed the a relationship between the<br />

nature of gate dielectric-semiconductor interface and the insulator<br />

itself. In order to accomplish this, a common device reference

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