04.09.2013 Views

tesi R. Miscioscia.pdf - EleA@UniSA

tesi R. Miscioscia.pdf - EleA@UniSA

tesi R. Miscioscia.pdf - EleA@UniSA

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

146 Conclusions<br />

gate leakages in case of thin dielectrics, the security mechanism had to<br />

be hardwired into the process flowchart without relying on the effects<br />

of annealing.<br />

For these reasons, the optimized layout designed and adopted to<br />

build OTFTs had patterned gates and reduced the overlap area<br />

between contacts and OSC.<br />

The utilization of gate leakage model also enabled us to estimate<br />

mobility-pentacene grain size trend relationship. In the case of PMMA<br />

devices and other thin dielectrics, the dependence of field-effect<br />

mobility from gate field made the performance analysis not affordable<br />

if faced with a simple circuital model. In these cases a model used in<br />

inorganic electronics for leaky dielectrics has been adopted after<br />

Palestri, Esseni et Al. Such distributed-parameter model proved to be<br />

effective also with OTFTs and was employed to investigate grain sizemobility<br />

trend for an extended class of devices.<br />

The utilization of PMMA as thin gate dielectric evidenced a low<br />

mobility value, thus we worked on this parameter by changing the<br />

nature and surface state of the insulator. From this point of view, we<br />

developed a novel gate insulator material PFTEOS:TEOS which is<br />

and organic-inorganic material processable by sol-gel technique from<br />

a solution. Devices based on this kind of material exhibited improved<br />

performances respect to the plain dielectrics but break the relationship<br />

between grain dimensions and mobility.<br />

Anomalies which have been noticed for PFTEOS:TEOS and its<br />

optimized version PFTEOS:TEOS/PMMA obtained from buffer layer<br />

deposition have been investigated and compared to other polymeric<br />

dielectrics with their varying nature and thickness. In order to do this,<br />

thermal analyses have been performed. A Meyer-Neldel rule general<br />

observation was found to be obeyed in every analyzed case, thus<br />

activation energy and Meyer Neldel temperature were exploited to<br />

characterize energetic disorder at OSC/insulator interface by Gaussian<br />

disorder model for Density of Band states.<br />

In conclusion the behavior of a novel sol-gel gate insulator has<br />

been characterized and analyzed comparing it to plain cases and<br />

finding an original behavior of EMN/mobility/Activation energy which<br />

exhibits an inverse (decreasing) trend between energetic disorder and<br />

charge transport. This has been completely opposite to trends found<br />

for PMMA devices encouraging studying, exploiting and

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!