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tesi R. Miscioscia.pdf - EleA@UniSA

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Chapter 3<br />

Gate-leakages in polymeric<br />

dielectrics and layout optimization<br />

The purpose of this chapter is to highlight the importance of the<br />

analysis of non-idealities in the static electrical characteristics of<br />

organic p-type thin film transistors (OTFTs). Such studies can<br />

improve the interpretations of the performance parameters as carrier<br />

mobility and device threshold voltage. Our investigation includes the<br />

characterization of Pentacene-OTFTs fabricated with different gate<br />

dielectrics to study the impact of gate leakage currents in the modeling<br />

of static characteristics of the device, and the effects of thermal<br />

annealing on such device non-idealities.<br />

3.1 Introduction<br />

Pentacene (C22H14) thin films for organic electronic applications<br />

have been widely exploited for research purposes, because of their<br />

good field-effect mobility enhanced by past advances in vacuumbased<br />

deposition techniques[1]. For these reasons such organic<br />

semiconductor is considered a benchmark material in OTFT studies<br />

and surface’s optimization. Therefore, our analysis will take<br />

advantage of the literature knowledge about this material to<br />

investigate gate-dielectric static dissipations.<br />

The gate leakage current is one of the most important nonidealities<br />

in field-effect transistors operation, in particular for<br />

applications in digital logic circuits and in pixel-drivers of active<br />

matrix organic displays backplanes. The presence of such leakage is<br />

evident in ID/VDS output characteristics, which fail zero-crossing at<br />

VDS = 0 V in the linear region. Thus, the operation in this regime<br />

becomes difficult and performances decrease, also in terms of on-off<br />

currents ratio [3]. In some works, a thermal annealing has been proved

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