tesi R. Miscioscia.pdf - EleA@UniSA
tesi R. Miscioscia.pdf - EleA@UniSA
tesi R. Miscioscia.pdf - EleA@UniSA
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Chapter 3<br />
Gate-leakages in polymeric<br />
dielectrics and layout optimization<br />
The purpose of this chapter is to highlight the importance of the<br />
analysis of non-idealities in the static electrical characteristics of<br />
organic p-type thin film transistors (OTFTs). Such studies can<br />
improve the interpretations of the performance parameters as carrier<br />
mobility and device threshold voltage. Our investigation includes the<br />
characterization of Pentacene-OTFTs fabricated with different gate<br />
dielectrics to study the impact of gate leakage currents in the modeling<br />
of static characteristics of the device, and the effects of thermal<br />
annealing on such device non-idealities.<br />
3.1 Introduction<br />
Pentacene (C22H14) thin films for organic electronic applications<br />
have been widely exploited for research purposes, because of their<br />
good field-effect mobility enhanced by past advances in vacuumbased<br />
deposition techniques[1]. For these reasons such organic<br />
semiconductor is considered a benchmark material in OTFT studies<br />
and surface’s optimization. Therefore, our analysis will take<br />
advantage of the literature knowledge about this material to<br />
investigate gate-dielectric static dissipations.<br />
The gate leakage current is one of the most important nonidealities<br />
in field-effect transistors operation, in particular for<br />
applications in digital logic circuits and in pixel-drivers of active<br />
matrix organic displays backplanes. The presence of such leakage is<br />
evident in ID/VDS output characteristics, which fail zero-crossing at<br />
VDS = 0 V in the linear region. Thus, the operation in this regime<br />
becomes difficult and performances decrease, also in terms of on-off<br />
currents ratio [3]. In some works, a thermal annealing has been proved