04.09.2013 Views

tesi R. Miscioscia.pdf - EleA@UniSA

tesi R. Miscioscia.pdf - EleA@UniSA

tesi R. Miscioscia.pdf - EleA@UniSA

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

Chapter 2 63<br />

materials, the higher is the current passing through the junction itself.<br />

Thus, for p-type transistor, the contact is much better as the WF of the<br />

contact approaches the semiconductor HOMO level (in which we<br />

would like to inject holes).<br />

Many p-type materials have HOMO levels that require, for the<br />

adequate holes injection, high work-function electrodes to minimize<br />

the interface barrier. For example, for p-type pentacene based<br />

transistors, it will be sufficient to use metals such as gold, nickel,<br />

platinum, etc. to realize the appropriate source and drain contacts (see<br />

table 1).<br />

Metal WF(eV)<br />

Au 5.10<br />

Pt 5.65<br />

Ni 5.15<br />

Co 5.00<br />

Cu 4.65<br />

table 1: some metals having high work-function<br />

The issues related to the energy bands alignment between<br />

Source/Drain and semiconductor were extensively investigated in the<br />

literature for many materials combinations.<br />

In figure 33, it is shown a diagram about the situation of the<br />

energy levels that exists between a gold contact and the HOMO level<br />

of a pentacene film, as described by Horowitz in an interesting paper<br />

[7].

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!