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tesi R. Miscioscia.pdf - EleA@UniSA

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Chapter 1 19<br />

The formula in eq. 18 gives the static characteristics of the device in<br />

the accumulation mode when VGS+V0≤VDS. Differently from the<br />

standard MOSFET equation [3] in the active region, there’s an<br />

injection-dependant contribution (see eq. 18 and eq. 19).<br />

1 W<br />

I DSinj = μ nε<br />

cht<br />

ch ΔE<br />

2 L<br />

eq. 19 ( ) 2<br />

Such contribution (see eq. 19) takes into account the space-charge<br />

limited current near the drain electrode becomes relevant at high drain<br />

fields, for short channels and for relatively thick semiconductor layers<br />

and can explain some deviations from the standard model such as the<br />

lack of a saturation behavior for higher source-drain voltages.<br />

The lack of saturation in the channel current can be observed<br />

after Koehler-Biaggio works [1] by adopting the same formalism<br />

utilized to model charge injection in insulators in the Gurney-Mott<br />

approach. Non-saturation effects are more pronounced at low gate<br />

voltages and ad it has been shown in figure 3.<br />

figure 3: non-saturating behaviour of channel current due to the contribution of the injection at<br />

S/D electrodes as shown by Koehler-Biaggio in [1].<br />

x

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