tesi R. Miscioscia.pdf - EleA@UniSA
tesi R. Miscioscia.pdf - EleA@UniSA
tesi R. Miscioscia.pdf - EleA@UniSA
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Chapter 1 19<br />
The formula in eq. 18 gives the static characteristics of the device in<br />
the accumulation mode when VGS+V0≤VDS. Differently from the<br />
standard MOSFET equation [3] in the active region, there’s an<br />
injection-dependant contribution (see eq. 18 and eq. 19).<br />
1 W<br />
I DSinj = μ nε<br />
cht<br />
ch ΔE<br />
2 L<br />
eq. 19 ( ) 2<br />
Such contribution (see eq. 19) takes into account the space-charge<br />
limited current near the drain electrode becomes relevant at high drain<br />
fields, for short channels and for relatively thick semiconductor layers<br />
and can explain some deviations from the standard model such as the<br />
lack of a saturation behavior for higher source-drain voltages.<br />
The lack of saturation in the channel current can be observed<br />
after Koehler-Biaggio works [1] by adopting the same formalism<br />
utilized to model charge injection in insulators in the Gurney-Mott<br />
approach. Non-saturation effects are more pronounced at low gate<br />
voltages and ad it has been shown in figure 3.<br />
figure 3: non-saturating behaviour of channel current due to the contribution of the injection at<br />
S/D electrodes as shown by Koehler-Biaggio in [1].<br />
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