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Superconducting Technology Assessment - nitrd

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All IC chips on completed wafers undergo room temperature testing prior to dicing. Process control monitor (PCM)<br />

chips are mounted on superconductive multi-chip modules (MCMs) tested at 4 K. These Nb-based MCMs are produced<br />

in the main fabrication facility, while MCMs for product IC chips are produced separately. (MCM fabrication and<br />

testing is discussed in Chapter 6.)<br />

The fabrication group:<br />

■<br />

■<br />

■<br />

■<br />

Maintains a database of PCM data and is responsible for its analysis, which provides<br />

the basis for the process design rules.<br />

Maintains the gate library, which is developed in collaboration with the circuit design<br />

group(s); is responsible for incorporating circuit designs into mask layouts and for<br />

procuring photolithographic masks.<br />

Produces IC chips for verification of CAD, gates, designs, IC chip architectures, and all<br />

IC chips required for the demonstrations associated with this program.<br />

Potentially can provide foundry services for other digital SCE programs (government,<br />

academic, or commercial).<br />

4.2 DIGITAL SUPERCONDUCTIVE IC CHIP FABRICATION – STATUS<br />

Fabrication of superconductive ICs is based on semiconductor wafer processing, using tools developed for CMOS<br />

processing or customized versions of these tools. However, the process flow is much simplified from that of CMOS,<br />

with only metalization or insulator deposition steps, followed by patterning of these layers by etching. Figure 4-2<br />

shows a simplified flow, along with a photo of a superconducting foundry (one tunnel).<br />

SIMPLE 3-STEP SCE FAB PROCESS<br />

Layer by Layer<br />

Circuit Designs<br />

Photographic Plates<br />

Typical 200 mm<br />

SCE Wafer<br />

Deposit thin<br />

oxide or<br />

metal film<br />

Photographically<br />

transfer pattern<br />

to wafer<br />

Etch pattern<br />

into film<br />

Repeat for each plate<br />

a) Simple process flow for fabrication of RSFQ circuits b) RSFQ fabrication facility<br />

Figure 4-2. Fabrication of RSFQ ICs is accomplished using semiconductor equipment and processes.<br />

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