ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
10:40am B4-2-10 Understanding the deformation kinetics of Ti1-xAlxN<br />
ceramics at moderately elevated temperatures, C. Ciurea<br />
(ccc109@imperial.ac.uk), V. Bhakhri, N. Ni, Imperial College London -<br />
South Kensington Campus, UK, P.H. Mayrhofer, Montanuniversität<br />
Leoben, Austria, F. Giuliani, Imperial College London - South Kensington<br />
Campus, UK<br />
This work presents a comparative study of the influence of temperature on<br />
the mechanical behaviour of bulk single crystal (001) TiN (SC-TiN),<br />
magnetron sputtered single crystal TiN and magnetron sputtered Ti1-xAlxN<br />
films (x=0.34,0.52) deposited on (001) MgO substrates. High temperature<br />
nanoindentation (room temperature to 350 o C) was used to extract<br />
fundamental deformation rate-controlling parameters such as activation<br />
volume, activation energy and Peierls stress, demonstrating the usefulness<br />
of the indentation as an effective experimental technique for investigating<br />
kinetics of plastic deformation in ceramics at moderately elevated<br />
temperatures.<br />
This analysis showed that the hardness of bulk single crystal TiN dropped<br />
from 21±0.5 GPa at 22°C to 10.7±0.45 GPa at 350°C. Interestingly, the<br />
hardness of sputtered single crystal TiN and Ti1-xAlxN with low aluminium<br />
concentration (x= 0.34) also dropped by a similar magnitude although from<br />
a higher starting values. However, the x=0.52 film exhibited a remarkable<br />
hardness stability with the temperature, showing a slight drop in values<br />
from 30±1.3 GPa at 22°C to 26±2.6 GPa at 300°C. This suggests that<br />
increase in Al addition improved not only the room temperature hardness<br />
but also lead to an increase in the activation energy for slip from 0.75 eV<br />
for SC-TiN to 1.26 eV for x=0.52 film. A heat treatment of this film at<br />
600°C for 24 hours resulted in a slightly lower hardness and a reduction of<br />
the activation energy of slip to similar values seen in pure TiN.<br />
It is proposed that this hardening increase is linked to the local distribution<br />
of Al within the TiN matrix and this will be supported by high resolution<br />
TEM.<br />
11:00am B4-2-11 The Influence of Bias Voltage on Residual Stresses<br />
and Tribological Behavior of Ti/TiAlN and Cr/CrAlN Multilayer<br />
Systems, W. Tillmann (wolfgang.tillmann@tu-dortmund.de), T. Sprute, F.<br />
Hoffmann, Technische Universität Dortmund, Germany<br />
The increase of the life span and thus a more efficient use of tools are<br />
important goals related to industrial applications. Owing to this purpose,<br />
friction as well as wear should be reduced significantly. PVD (Physical<br />
Vapour Deposition) coatings such as Ti / TiAlN or Cr / CrAlN meet these<br />
requirements and possess a high wear resistance. Due to the high heat<br />
resistance of titanium aluminum nitride, these coatings have a great<br />
potential for the use in forming tools employed at elevated temperatures .<br />
However, the different thermoelastic properties of the multilayer system<br />
and substrate can lead to delamination and spallation of the layers after the<br />
deposition process due to critical residual stress states. Therefore, the<br />
influences of the bias voltage on the residual stresses, as well as the<br />
tribological properties, were investigated within the scope of this work in<br />
order to understand the operational behavior of multilayer systems. The<br />
production parameter should be varied to favorably adjust the residual stress<br />
states selectively and to produce a sound coating system. By means of a<br />
magnetron sputtering device both multilayer systems were deposited on hot<br />
work steel substrates AISI H11. In addition to the metallurgical phase<br />
analysis, residual stress measurements were performed using X - ray<br />
diffractometry . The structure and the morphology investigations of the<br />
coatings were determined by scanning electron microscopy and energy<br />
dispersive X-ray spectroscopy. Furthermore, a nanoindenter and a ball-ondisk<br />
device were employed in order to characterize the mechanical and<br />
tribological properties and to clarify the effect of the process parameter on<br />
the service behavior of the PVD coating.<br />
11:20am B4-2-12 The effect of Yttrium addition on TiAlN coating, L.<br />
Zhu (lhzhu@mail.shu.edu.cn), M. Hu, Shanghai University, China, W. Ni,<br />
Y. Liu, Kennametal Incorporated, US<br />
TiAlYN coating was deposited by cathodic arc evaporation method. The<br />
effect of yttrium addition on the microstructure and properties of TiAlN<br />
coating was studied. Lattice parameter of TiAlN increases with addition of<br />
yttrium. Also, it helps to improve the columnar structure and decrease the<br />
grain size. TiAlYN coating exhibits higher hardness and higher residual<br />
compress stress than TiAlN coating. The oxidation resistance of TiAlYN<br />
coating at 900 � is superior to TiAlN coating. The anti-oxidation<br />
mechanism of TiAlYN coating is also discussed in this paper.<br />
Hard <strong>Coating</strong>s and Vapor Deposition Technology<br />
Room: Royal Palm 1-3 - Session B5-1<br />
Hard and Multifunctional Nano-Structured <strong>Coating</strong>s<br />
Moderator: J. Paulitsch, Christian Doppler <strong>Lab</strong>oratory for<br />
<strong>Application</strong> <strong>Oriented</strong> <strong>Coating</strong> <strong>Development</strong> at the<br />
Department of Physical Metallurgy and Materials Testing,<br />
Montanuniversitӓt Leoben, Austria, R. Sanjines, Ecole<br />
Polytechnique Fédérale de Lausanne, Switzerland, P.<br />
Zeman, University of West Bohemia, Czech Republic<br />
8:00am B5-1-1 A study of microstructures and mechanical properties<br />
of cathodic arc deposited CrCN/ZrCN multilayer coatings, C.Y. Tong,<br />
J.W. Lee (jefflee@mail.mcut.edu.tw), Ming Chi University of Technology,<br />
Taiwan, S.H. Huang, National Chiao Tung University, Taiwan, Y.B. Lin,<br />
C.C. Kuo, Ming Chi University of Technology, Taiwan, T.E. Hsieh,<br />
Gigastorage Corporation, Taiwan, Y.C. Chan, H.W. Chen, J.G. Duh,<br />
National Tsing Hua University, Taiwan<br />
The nanostructured CrCN/ZrCN multilayer coatings were deposited<br />
periodically by the cathodic arc deposition system. The bilayer period of<br />
CrCN/ZrCN multilayer coating was kept at 16 nm. The C2H2 gas flow rate<br />
was adjusted to fabricate the CrCN/ZrCN multilayer coatings with different<br />
carbon contents. The crystalline structure of multilayer coatings was<br />
determined by a glancing angle X-ray diffractometer. Microstructures of<br />
thin films were examined by a scanning electron microscopy (SEM) and<br />
transmission electron microscopy (TEM), respectively. A nanoindenter,<br />
scratch tester and pin-on-disk wear tests were used to evaluate the hardness,<br />
adhesion and tribological properties of thin films, respectively. It was found<br />
that the hardness and tribological properties were strongly influenced by the<br />
carbon contents of the CrCN/ZrCN multilayer coatings. Optimal carbon<br />
content was proposed in this work.<br />
8:20am B5-1-2 Effect of Zr content on structural, mechanical and<br />
phase transformation properties of magnetron sputtered TiNiZr shape<br />
memory alloy thin films, D. Kaur (dkaurfph@iitr.ernet.in), N. Kaur,<br />
Indian Institute of Technology Roorkee, India<br />
The present study explored the in-situ deposition of TiNiZr shape memory<br />
thin films on Si substrate using co-sputtering of NiTi and Zr targets. The<br />
influence of Zr concentration on phase formation, microstructure,<br />
mechanical and phase transformation behavior of TiNiZr was<br />
systematically investigated. The crystalline structure, orientation, average<br />
crystallite size and phases present in NiTiZr films were determined by Xray<br />
diffractormeter. The microstructure of the films was determined by field<br />
emission scanning electron microstructure (FESEM) and atomic force<br />
microscopy (AFM). The film thickness was determined by using surface<br />
profilometer and cross-sectional FESEM. Nanoindentation tests were<br />
conducted at room temperature. TiNiZr thin films were found to exhibit<br />
high hardness, increased reduced modulus and better wear resistance by<br />
increasing the Zr content. Electrical properties were studied by using four<br />
probe method demonstrate a very interesting phase transformation behavior<br />
leading to two way shape memory effect and transformation temperature<br />
was increased by increasing Zr content leading to enhanced response speed<br />
of TiNiZr shape memory alloys due to large thermal gradient with<br />
environment. The enhanced properties of NiTiZr shape memory alloy films<br />
makes them technologically important material for variety of high<br />
temperature MEMS applications including micro grippers, Microvalves,<br />
Micropumps and micro mirrors.<br />
Keywords: NiTiZr; Magnetron Sputtering; Shape memory; Nanoindentation<br />
8:40am B5-1-3 Self-Organized nano-<strong>Lab</strong>yrinth Structure in<br />
Magnetron Sputtered Zr0.6Al0.4N(001) Thin Films on MgO(001 ), N.<br />
Ghafoor (naugh@ifm.liu.se), L. Johnson, Linköping University, Sweden,<br />
D. Klenov, FEI Company, B. Alling, Linköping University, Sweden, I.<br />
Petrov, J.E. Greene, University of Illinois at Urbana-Champaign, US, L.<br />
Hultman, M. Odén, Linköping University, Sweden<br />
Self-Organized nano-<strong>Lab</strong>yrinth Structure in Magnetron Sputtered<br />
Zr0.6Al0.4N(001) Thin Films on MgO(001)<br />
N. Ghafoor 1 , L. J. S. Johnson 1 , D. O. Klenov 2 , B. Alling 1 , I. Petrov 1, 3 , J. E.<br />
Greene 1, 3 ,<br />
L. Hultman 1 , M. Odén 1<br />
1<br />
Department of Physics, Chemistry, and Biology (IFM), Linköping<br />
University, SE-581 83 Linköping, Sweden<br />
2<br />
FEI Company, Building AAE, Achtseweg Noord 5, Eindhoven, The<br />
Netherlands<br />
53 Wednesday Morning, April 25, <strong>2012</strong>