ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
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fluidized bed of tin, zinc and aluminium powders at ambient temperature.<br />
<strong>Coating</strong> process was achieved by first depositing a solventborne organic<br />
bond layer on the substrate surface. After drying, the pre-coated substrates<br />
were dipped in the fluidized metal powders, which were retained on the<br />
surface of the adhesive bond layer. Following this, the powder coated<br />
substrates were baked in a convection oven to melt the metal powders, until<br />
a continuous film was formed. The interaction between metal powders and<br />
the substrates pre-coated with the organic bong layer was studied,<br />
identifying the effect of the main process parameters, such as dipping time,<br />
fluidization velocity and metal powder mesh size. The role of the baking<br />
temperature and time was investigated, as well. The thickness and surface<br />
morphology of the resulting coatings was evaluated as a function of the<br />
process parameters by Field Emission Gun – Scanning Electron Microscopy<br />
(FEG-SEM) and contact gauge prof ilometry. Their hardness and scratch<br />
resistance were evaluated by instrumented scratch and indentation testing.<br />
Wear performance of the coated substrates were tested by dry sliding linear<br />
reciprocating with stainless steel counterpart. <strong>CD</strong> – FBC allowed the<br />
deposition of high performance coatings, whose morphological, mechanical<br />
and tribological response could be directly related to the coating thickness<br />
and baking conditions.<br />
Key words: Fluidized Bed; Metal Powders; Cold Dipping; Morphology;<br />
Hardness; Scratch; Wear.<br />
Graphene and 2D Nanostructures<br />
Room: Sunset - Session TS4-1<br />
Graphene and 2D Nanostructures<br />
Moderator: M. Chhowalla, Rutgers University, US, C.<br />
Teichert, Montanuniversität Leoben, Austria<br />
8:00am TS4-1-1 Intercalation compounds and cluster superlattices:<br />
graphene based 2D composites, T. Michely (michely@ph2.uni-koeln.de),<br />
University of Cologne, Germany INVITED<br />
Carefully optimizing the growth of graphene on Ir(111) by scanning<br />
tunneling microscopy and low energy electron microscopy yields a virtually<br />
defect free, weakly bound epitaxial monolayer of macroscopic extension.<br />
Graphene on Ir(111) can be used as a laboratory to construct new types of<br />
graphene based compound materials. Specifically, patterned adsorption of<br />
atoms and molecules takes place resulting in cluster superlattices with<br />
exciting magnetic and catalytic properties. Intercalation underneath the<br />
graphene allows one to manipulate the properties of graphene itself, e.g. its<br />
ability to adsorb atoms and molecules as well as its magnetism.<br />
8:40am TS4-1-3 Growth Kinetics of Monolayer and Multilayer<br />
Graphene on Pd(111), H.S. Mok, Y. Murata, University of California, Los<br />
Angeles, US, S. Nie, N. Bartelt, K. McCarty, Sandia National <strong>Lab</strong>oratories,<br />
US, S. Kodambaka (kodambaka@ucla.edu), University of California, Los<br />
Angeles, US<br />
Graphene, a two dimensional crystalline sheet of carbon, has attracted<br />
significant attention due to its electronic properties, including a tunable<br />
band gap and high electron mobility for use in semiconducting devices and<br />
sufficiently high transparency and low sheet resistance for use as a<br />
transparent conductor. For any of these applications, it is desirable to obtain<br />
single-crystalline graphene layers with uniform thickness. This is an<br />
extremely challenging task that requires a fundamental understanding of the<br />
mechanisms controlling the nucleation and growth of graphene. Here, using<br />
in situ low-energy microscopy (LEEM), we investigated the growth of<br />
graphene via surface segregation of carbon dissolved in the bulk of the<br />
substrate. In this process, surface concentration of carbon depends on the<br />
substrate temperature T: at T > 920 o C the Pd surface is free of carbon; upon<br />
cooling to 880 o C, we observer monolayer graphene formation on the<br />
surface; and, at T = 710 o C, we obtain multi-layer graphene. In order the<br />
follow the kinetics of graphene growth, we acquired LEEM images as a<br />
function of incident electron energy while cooling the sample from 920 o C<br />
to 880 o C. From the LEEM images, electron reflectivity (electron energy<br />
dependent variations in image intensities) values, a measure of local surface<br />
work function, are extracted. This data is used to follow the changes in<br />
surface carbon adatom concentration during nucleation and growth of<br />
graphene. For monolayer growth, we find that the electron reflectivity<br />
decreases non-linearly with annealing time. This behavior is qualitatively<br />
similar to that observed during the growth of graphene on Ru(0001) [1],<br />
where the graphene layers grow from carbon adatoms present on the<br />
surface. In case of multilayer graphene growth induced by cooling the<br />
sample to lower temperatures (< 710 o C), we observed spontaneous<br />
formation of graphene mounds consisting of multiple layers. Low-energy<br />
electron diffraction patterns acquired from the layers reveal that both in-<br />
plane and out-of-plane stacking in the graphene layers is random with<br />
respect to the substrate. Moreover, we find that the spot intensities are<br />
weaker in the subsequent layers compared to the first layer, suggestive of<br />
growth of subsequent layers from below the surface at the graphenesubstrate<br />
interface.<br />
1. K. McCarty, P. Feibelman, E. Loginova, N.C. Bartelt, Kinetics and<br />
Thermodynamics of Carbon Segregation and Graphene Growth on Ru<br />
(0001). Carbon 2009, 47(7):1806-1813.<br />
9:00am TS4-1-4 Self-assembled monolayer nanodielectrics for lowpower<br />
graphene electronics, T. Anthopoulos<br />
(thomas.anthopoulos@imperial.ac.uk), F. Colleaux, C. Mattevi, Imperial<br />
College London - South Kensington Campus, UK, M. Chhowalla, Rutgers<br />
University, US INVITED<br />
Succesfull development of graphene based nano- and macro-elenctronics<br />
would require not only high quality graphene but also the design of low<br />
power devices and integrated systems. Energy consumption has become<br />
among the three top challenges of current, as well as future technologies, as<br />
stated in the International Technology Roadmap for Seminconductors. To<br />
this end, the introduction of high-capacitance gate dielectrics in field-effect<br />
transistors has been considered a vaiable route to decrease the operating<br />
voltages and thus the overall power dissipation. In this presentation I will<br />
discuss the development of low operating voltage (