Post Deadline Discoveries and Innovations Room: Pacific Salon 1-2 - Session PD-1 Post Deadline Discoveries and Innovations Moderator: W. Kalss, OC Oerlikon Balzers AG, Liechtenstein, S. Ulrich, Karlsruhe Institute of Technology, Germany 1:30pm PD-1-1 The Multi Beam Sputtering: a new thin film deposition approach, P. Sortais (sortais@lpsc.in2p3.fr), T. Lamy, J. Médard, <strong>Lab</strong>oratoire de Physique Subatomique et Cosmologie de Grenoble (LPSC), France Thanks to the latest development of ultra compact and reliable microwave ion sources 1,2 it is now possible to build an ion beam sputterring system composed of an arbitrary large number of simple ion sources that can be individually tuned. With this new concept of Multi Beam Sputtering (MBS) device, new possibilities are conceivable for the Ion Beam Sputtering (IBS) technology 3,4 , especially for thin film deposition on large size substrates with high uniformity. With MBS, the deposition profile is not defined by the shape and the tuning of a unique large beam, but by the sum of the contributions of a great number of small, well controlled in size, sputterring spots. The uniformity is the consequence of the geometric sum of all sputterring lobes obtained by each sputtering spot. The ion sources units can be distributed along a circle or a line and each ion beam delivered by an ion source impinges its own target. An individual source of a typical size 3x3x3 cm uses a few watts of microwave power for producing a beam up to 1 mA with energy in the range of 5 to 15 keV. The first operational device, MBS- 20, uses 20 of such ion sources distributed on a circle around a 70 mm diameter multi-target holder allowing thin film deposition on 100 to 300 mm diameter substrates with deposition rates in the range of 0 to 1 µm/h. An important point, since each ion source uses an individual target, is that co-evaporation of several components can be done simultaneously. By the way, the deposition of alloys with a controlled stoechiometry is easier than with any other method and without uniformity loss. We will show preliminary results for Cu, Ta, Ta2O5, C, Si02, Ti, TiN, TiO2, TiAlN and Th on 100 or 200 mm glass substrate diameters, Mylar 0.5 µm or Si substrates. All these processes can be done with reactive atmosphere allowing oxide or nitride deposition. 1 P. Sortais, T. Lamy, J. Médard, J. Angot, L. Latrasse, and T. Thuillier, Rev. Sci. Instrum. 81 (2010) 02B31 2 P. Sortais, T. Lamy, J. Médard, J. Angot, P. Sudraud et al., Rev. Sci. Instrum. 83, 02B912 (<strong>2012</strong> 3 Patent pending N° 1150981. 4 Under Grant Grenoble Alpes Valorisation Innovation Technologies (GRAVIT) 080606, may 2009. 1:50pm PD-1-2 Molecular dynamics simulation and experimental validation of nanoindentation measurements of silicon carbide coatings., A.-P. Prskalo (alen-pilip.prskalo@imwf.uni-stuttgart.de), Universität Stuttgart, Germany, S. Ulrich, Karlsruhe Institute of Technology, Germany, S. Schmauder, J. Lichtenberg, , C. Ziebert, Kit, Iam- Awp, Germany Molecular dynamics simulation of the nanoindentation was used to investigate mechanical properties of single layer silicon carbide coatings on silicon substrates. Indenter load-penetration depth relation was determined and put into relation to the internal coating structure and the substrate behavior. In order to reach this objective, an indenter tip in the form of a Berkovich indenter was introduced, a discrete indenter motion of 0.2 Å was imposed. For the modeling of the Si-C system, well known bond-order Tersoff potential was used, while the substrate-indenter interaction was modeled by a self-developed short range repulsive pair potential. From the indenter load-penetration depth relation, mechanical values of hardness and Young modulus for the coatings could be obtained. Hardness values determined by molecular dynamics simulations were in the range between 26.4 GPa and 34.4 GPa. These results are in good agreement with experimental measurements using UMIS 2000 system delivering values between 20.1 GPa and 35 GPa in dependence of the micro structure of the coating, the deposition temperature and maximum indentation depth. 2:10pm PD-1-3 Anatase TiO2 Beads Having Ultra-fast Electron Diffusion Rates for use in Low Temperature Flexible Dye-sensitized Solar Cells, J.-M. Ting (jting@mail.ncku.edu.tw), Ke, National Cheng Kung University, Taiwan The first use of mesoporous TiO2 beads in plastic substrate flexible dyesensitized solar cell (FDSC) is demonstrated. Pure anatase TiO2 beads with various sizes (250 to 750 nm) and characteristics are obtained using a Thursday Afternoon, April 26, <strong>2012</strong> 92 modified and efficient two-step method. The concept of chemical sintering, eliminating the step of additive removal, is used to prepare bead-containing paste for room temperature fabrication of photoanode having good adhesion to the substrate. The obtained photoanodes are examined for their dye loadings and light absorbance properties. Various plastic substrate FDSCs having commercial P25- and bead-containing photoanodes are fabricated and evaluated. The resulting cells are evaluated for the J-V characteristics, electron diffusion time, electron lifetime, charge-collection efficiency, electron-injection efficiency and incident photon-to-electron conversion efficiency. The bead-only cells not only have better efficiencies, as high as ~5%, but also exhibit ultra-fast electron diffusion rates, less than 1 ms. The best efficiency and electron diffusion rates are respectively 15% higher and two-order of magnitude faster than the P25-only cell. The effects of the bead characteristics on the cell performance is presented and discussed. 2:30pm PD-1-4 MOCVD nano-structured TiO2 coatings for corrosion protection of stainless steels, H. Herrera-Hernández (hhh@correo.azc.uam.mx), M. Palomar-Pardavé, Universidad Autónoma Metropolitana- Azcapotzalco, Mexico, J.A. Galaviz-Pérez, J.R. Vargas- García, Departamento de Ingeniería, Metalúrgica, ESIQIE-IPN, Mexico TiO2 nanoparticles were deposited on 316 stainless steel substrates at three different temperatures using a horizontal hot-wall reactor in the presence of a titanium isopropoxide Ti(OC3H7)4 precursor, method known as metal organic chemical vapor deposition (MOCVD). The influence of deposition temperature (Tdep 300, 400 and 500 ºC) on the structural and protective properties of the TiO2 nanoparticles was discussed. The morphology and structure of these nanoparticles that form a continuous thin coating over the steel was investigated by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS) and scanning electron microscopy (SEM) techniques. The corrosion resistance of the TiO2 coatings was evaluated in a strong corrosive solution (0.5M H2SO4) by means of electrochemical measurements such as anodic polarization, cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). Anodic polarization results revealed that the pitting corrosion potential (Epit) shifted to a more positive when the deposition temperature increased in comparison to the bare substrate, while CV behaviour showed lower passive current density for TiO2 coatings. Through the EIS data it was found that TiO2 nanoparticles deposited at 500 ºC for 30 min did not corroded by pits during over exposure for 100 days in such aggressive electrolyte. A higher electrical coating resistance (RTiO2 = 59.52 KW-cm 2 ) and lower capacitance (CTiO2= 87.37 mF/cm 2 ) was measured for 500 ºC TiO2 coating in contrast to 300 or 400 ºC coatings. The improve pitting corrosion resistance for TiO2 nanoparticles deposited at 500 ºC is attributed to its morphology features and its uniform & compact anatase structure, which consisted of platelets agglomerates with very small quasi-spherical nano-particles (10~nm) that impedes the free transfer of electrons and mass-transport process across the coating. Therefore, stainless steels surface modification with TiO2 nanoparticles showed excellent corrosion resistance for long times exposure in sulphuric acid that makes it an attractive material for biomedical applications. 2:50pm PD-1-5 Improvement on the mechanical and corrosion properties of nanometric HfN/VN superlattices, P. Prieto, Excellence Center for Novel Materials, CENM, Cali, Colombia, C.A. Escobar, Universidad del Valle, Colombia, J.C. Caicedo, Universidad del Valle, Colombia, W. Aperador, Universidad Militar Nueva Granada, Colombia, J. Esteve, M.E. Gomez, Universitat de Barcelona, Spain The aim of this work is the improvement of the mechanical and electrochemical behavior of 4140 steel substrate using HfN/VN multilayered system as a protective coating. We have grown HfN/VN multilayered via reactive r.f. magnetron sputtering technique in which was varied systematically the bilayer period (Λ), and the bilayer number (n), maintaining constant the total thickness of the coatings (~1.2 μm). The coatings were characterized by X-ray diffraction (XRD), X-ray photo electron spectroscopy (XPS), electron microscopy assisted with selected area electron diffraction. The mechanical properties were analyzed by nanoindentation method. The electrochemical properties were studied by Electrochemical Impedance Spectroscopy and Tafel curves. XRD results showed a preferential growth in the face-centered cubic (111) crystal structure for [HfN/VN]n multilayered coatings. The best improvement of the mechanical behavior was obtained when the bilayer period (Λ) was 15 nm (n = 80), yielding the highest hardness (37 GPa) and elastic modulus (351 GPa). The values for the hardness and elastic modulus are 1.48 and 1.32 times greater than the coating with n = 1, respectively. The enhancement effects in multilayer coatings could be attributed to different mechanisms for layer formation with nanometric thickness due to the Hall- Petch effect. The maximum corrosion resistance was obtained for coating with (Λ) equal to 15 nm, corresponding to n = 80 bilayered. The polarization resistance and corrosion rate were around 112.19 kOhm cm 2 and 3.66x10 -3 mm/year, these values were 98 % and 99 % better than those
showed by the uncoated 4140 steel substrate (0.65 kOhm and 31.13 mm/year), respectively. With this idea, HfN/VN multilayered have been designed and deposited on Si(100) and AISI 4140 steel substrates with bilayer periods (Λ) in a broad range, from nanometers to hundreds of nanometers, in order to study the microstructural evolution with decreasing bilayer thickness and their related mechanical and electrochemical properties in with aim to find novel industrial applications. Keywords: Multilayer coatings, Magnetron sputtering, Mechanical properties. PACS: 61.05.c, 62.20.Qp 3:10pm PD-1-6 Characterization of High Temperature Instrumented Indentation System and Initial Results, D. Jardret (vincent.jardret@michalex.com), Michalex, USA, M. Fajfrowski, Michalex, France Abstract: High temperature instrumented indentation tests results are presented on a silicate glass sample at three temperatures; Room Temperature, 400oC and 600oC using the HTIIS 1000. This data is used to analyzed the thermal stability of the instrument, characterize key parameters such as load frame stiffness and indenter geometry, and finally determine the elastic and plastic properties of the sample at each temperature. The thermal management concept used in the instrument is described in details. A new method is proposed to identify the indenter shape using the shape of the curve √P versus h during the loading segment, and the ratio of √(P_max )⁄S_unload . The results show that the thermal management of the instrument provides very good stability during the tests. Tests with two different maximum loads enable a complete characterization of the instrument and the sample at high temperatures. This work will be pursued with the study of other materials and use of different indenter geometries and materials. 93 Thursday Afternoon, April 26, <strong>2012</strong>
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I C M C T F 2 0 1 2 INTERNATIONAL C
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TABLE OF CONTENTS Welcoming Remarks
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2012 ICMCTF SCHEDULE OF EVENTS DAY
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SYMPOSIUM A Coatings for Use at Hig
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Marco Cremona Pontificia Universida
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Exhibitor Keynote Lecture Tuesday,
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2011/12, discuss ideas and prioriti
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At the focus topic, from the experi
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2012 R.F. Bunshah Annual Award & IC
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ICMCTF 2012 Graduate Student Awards
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ICMCTF 2012 thanks Plansee for thei
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ICMCTF 2012 thanks AJA Internationa
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ICMCTF 2012 thanks CemeCon for thei
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ICMCTF 2012 Short Courses April 22
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ICMCTF 2012 Planning Grid We provid
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Key to Session/Paper Numbers A Coat
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Monday Morning, April 23, 2012 Fund
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New Horizons in Coatings and Thin F
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Fundamentals and Technology of Mult
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Advanced Characterization of Coatin
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Hard Coatings and Vapor Deposition
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Tribology & Mechanical Behavior of
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Hard Coatings and Vapor Deposition
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Coatings for Use at High Temperatur
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Applications, Manufacturing, and Eq
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Wednesday Afternoon, April 25, 2012
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Coatings for Use at High Temperatur
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Tribology & Mechanical Behavior of
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Coatings for Use at High Temperatur
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Tribology & Mechanical Behavior of
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Thursday Afternoon Poster Sessions
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Thursday Afternoon Poster Sessions
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Thursday Afternoon Poster Sessions
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Thursday Afternoon Poster Sessions
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Thursday Afternoon Poster Sessions
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Tribology & Mechanical Behavior of
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Free Caricatures & Massages!! E-1 V
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ICMCTF 2012 EXHIBIT HALL Internatio
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I C M C T F 2012 S P O N S O R S Bo
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All in Good Measure A 24 µm scan o
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Call For Abstracts Deadline: MAY 2,
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CC800 ® /9 HIPIMS true integration
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Exhibit Hall Reception - Atlas Ball
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Kaufman & Robinson announces their
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Miba Coating Group is the specialis
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PLANSEE SE, 6600 Reutte, Austria, T
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Plenary Talk Room: Golden Ballroom
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content. Analyses of the oxidised c
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μ = 0.4 to μ = 0.9). On the other
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Hard Coatings and Vapor Deposition
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application tests the ta-C coated d
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4:10pm C2-2/F4-2-10 Investigation o
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process with surfactant on WO3/ITO
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is already reported. To further com
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conditions. The details of the comp
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esidual stress and to the Poisson
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Coatings for Use at High Temperatur
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eactive gases with the target mater
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Hard Coatings and Vapor Deposition
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emerging fields. State-of-the-art t
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transparent conducting layers. Howe
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methods provide similar carrier den
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of AISI 52100 steels by developing
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deposition based on high power puls
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Coatings for Use at High Temperatur
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Szeremley, D.: G3-1-7, 68 Szesz, E.
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Description of Research Highlights:
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their presentations in order to eva
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NOTES 151
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