ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
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Hard <strong>Coating</strong>s and Vapor Deposition Technology<br />
Room: Royal Palm 4-6 - Session B2-1<br />
CVD <strong>Coating</strong>s and Technologies<br />
Moderator: F. Maury, CIRIMAT, France, S. Ruppi, Walter<br />
AG, Germany<br />
8:00am B2-1-1 AlTiN-CVD coatings - a new coating family for cast<br />
iron cutting with a high productivity, P. Immich (pimmich@lmtfette.com),<br />
U. Kretzschmann, U. Schunk, M. Rommel, LMT Fette<br />
Werkzeugtechnik, Germany, R. Pitonak, R. Weißenbacher, Böhlerit,<br />
Austria<br />
The ever increasing demand for higher productivity in manufacturing<br />
requires advanced hard coatings. The coatings can be tailored using PVD<br />
and CVD processes to exhibit for example higher hardness and / or<br />
enhanced oxidation resistance and good adhesion. Nowadays most PVD<br />
coatings based on the Ti-Al-N system with addition of silicon, chromium,<br />
boron or yttrium and are commercial available. The system Ti-Al-N offers a<br />
very good combination of a hardness and ductility. PVD coatings offering<br />
compared to CVD coatings compressive stresses without any post treatment<br />
and high deposition rates. But the development horizon on the PVD Ti-Al-<br />
N system is limited, because starting at around 66at% Aluminium content a<br />
phase change from the cubic to the wurzite structure can be seen.<br />
On the other side CVD processes offering a good adhesion and are very<br />
stable process behaviour especially at the deposition of oxide coatings. Also<br />
they offering compared to the PVD processes even using the new HIPIMS<br />
process a nearly homogenous coating distribution around the cutting edge.<br />
Depending on the insert geometry a high coating thickness on the cutting<br />
face offering high wear resistance. Since the last couple of years no new<br />
hard coatings systems were investigated and developed in the CVD sector.<br />
The development focus was often - working on the stress behaviour in the<br />
coating or the coating architecture.<br />
Today in the field of cast iron cutting PVD-TiAlSiN or even PVD-AlTiN<br />
coatings with a high hot hardness compete against well establish CVD<br />
TiN/TiCN/alpha-Al2O3 or kappa-Al2O3 coatings gaining more and more<br />
market share in the milling and also in the turning operation.<br />
The logic development way is now the combination of the good things from<br />
both worlds: the system Ti-Al-N from PVD and the good adhesion and<br />
coating distribution from CVD.<br />
By using a new developed the CVD process it is possible to deposit cubic<br />
AlTiN-CVD coatings even above 70% Aluminium with superior coating<br />
properties.<br />
In this regard this coating family was analysed using common thin film<br />
techniques revealing hardness, Young´s modulus and coating adhesion.<br />
This new develop coating is tested in milling experiments in cast iron<br />
comparing conventional state of the art hard-coatings. The developed<br />
coating shows a significant increase of tool life even at higher cutting<br />
speeds.<br />
8:20am B2-1-2 C2H6 as precursor for low pressure chemical vapour<br />
deposition of TiCNB hard coatings, C. Czettl<br />
(christoph.czettl@ceratizit.com), Ceratizit Austria GmbH, Austria, C.<br />
Mitterer, Montanuniversität Leoben, Austria, M. Penoy, C. Michotte,<br />
Ceratizit Luxembourg S.àr.l., Luxembourg, M. Kathrein, Ceratizit Austria<br />
GmbH, Austria<br />
Multilayered hard coatings grown by chemical vapor deposition (CVD) are<br />
used for wear protection of indexable cemented carbide inserts, applied in<br />
turning, milling, parting and grooving operations. A TiCN base layer<br />
deposited at low temperatures is a crucial feature for wear resistance and<br />
toughness of the tools. Beside the medium-temperature TiCN process using<br />
CH3CN as carbon feed, which is commonly used for hard coatings, C2H6<br />
can be applied to deposit TiCN with high carbon content at temperatures<br />
around 920 °C. In order to influence the structure and properties of this base<br />
layer, three different amounts of BCl3 were added to the feed gas. The<br />
deposition runs were carried out using an industrial-scale low-pressure<br />
CVD system. The coatings were grown using a TiCl4-C2H6-H2-N2-BCl3 feed<br />
gas system with a total flux of 65.6 l/min. The deposition temperature was<br />
920 °C, the deposition pressure 1.6×10 4 Pa. The thickness of the coatings<br />
was measured by light optical microscopy on polished cross-sections. Phase<br />
composition and preferred orientation of crystallites were characterized by<br />
X-ray diffraction and transmission electron microscopy. Surface topography<br />
and fracture cross-sections were investigated by scanning electron<br />
microscopy. Surface roughness was measured using a confocal<br />
profilometer. Indentation hardness and indentation modulus of the coatings<br />
were determined using nanoindentation with a Berkovich indentor. The<br />
chemical composition of the different coatings was analyzed by glow<br />
discharge optical emission spectroscopy. The increasing amount of BCl3 in<br />
the feed gas resulted in higher boron contents of the coating, which in turn<br />
yielded higher hardness and modified microstructures. The grain size<br />
decreased with increasing boron content, while the morphology changed<br />
from equiaxed grains to a fine lamellar structure. Transmission electron<br />
microscopy analyses showed that the incorporation of boron led to a<br />
homogenous distribution of voids within the TiCN grains and to an<br />
increasing density of defects with increasing boron content. In milling and<br />
turning tests, an increased lifetime for coatings with low amounts of boron<br />
compared to the TiCN coatings without boron was obtained.<br />
8:40am B2-1-3 The Effects of Microstructure and Thermal Stresses on<br />
the Hardness of CVD Deposited α‐Al2O3 and TiCxN(1‐x) <strong>Coating</strong>s, H.<br />
Chien, Carnegie Mellon University, US, Z. Ban, P. Prichard, Y. Liu,<br />
Kennametal Incorporated, US, S. Rohrer (rohrer@cmu.edu), Carnegie<br />
Mellon University, US INVITED<br />
The microstructures of four different CVD Deposited α‐Al2O3 and TiCxN(1‐<br />
x) coatings were determined by cross sectional electron backscatter<br />
diffraction mapping. The harnesses of the layers were also measured by<br />
nanoindentation. Using the microstructural data as input, two‐dimensional<br />
finite element analysis was used to calculate the residual thermal stresses in<br />
these materials. The thermal stresses and stored elastic energy in the α‐<br />
Al2O3 layer are larger than those in the TiCxN(1‐x) layer. Furthermore, the<br />
mean value and distribution of stored elastic energy are influenced by the<br />
texture in the alumina layer. <strong>Coating</strong>s with weaker texture have a broader<br />
distribution of thermal stresses. <strong>Coating</strong>s with alumina oriented so that the<br />
[0001] direction is parallel to the film growth direction have less stored<br />
elastic energy. This is because the thermal expansion perpendicular to<br />
[0001] is less than the thermal expansion parallel to [0001] and, therefore,<br />
the thermal expansion mismatch between the alumina coating and the<br />
substrate is minimized when grains are oriented with [0001] perpendicular<br />
to the substrate. The thermal stresses in hypothetical coatings with synthetic<br />
microstructures were also computed. These calculations tested the effects of<br />
coating thickness, channel crack spacing, composition of the TiCxN(1‐x)<br />
layer, grain aspect ratio, and cobalt enrichment of the substrate on the<br />
thermal stresses. Based on the thermal stresses, it is concluded that the three<br />
most significant factors influencing coating hardness, ordered from most<br />
significant to least significant, are the composition of the TiCxN(1‐x) layer,<br />
the channel crack spacing, and the cobalt enrichment of the substrate.<br />
9:20am B2-1-5 3D EBSD analysis of CVD ceramics coatings, M.<br />
Igarashi, A. Osada (aosada@mmc.co.jp), Mitsubishi Materials<br />
Corporation, Japan, C. Schuh, Massachusetts Institute of Technology, US<br />
Al2O3 and TiCN coatings have been widely used in cutting tools. TiCN has<br />
high hardness. Al2O3 maintains high hardness and excellent oxidation<br />
resistance under such a severe cutting condition. Moreover, it is well known<br />
that the orientations of these coatings effect their performance. For instance,<br />
specific oriented Al2O3 represents higher performance than the other<br />
orientations. These coatings are deformed during cutting, and wear out at<br />
last. Therefore it is necessary to investigate the deformation mechanism of<br />
such ceramics coatings.<br />
In this study, (422) and (220) oriented TiCN coatings and (006) oriented<br />
Al2O3 coatings with low and high CSL boundaries are prepared. These<br />
samples are indented with Micro Vickers . Deformed areas are observed in<br />
3 dimension s with FIB and EBSD system. The effects of orientations and<br />
grain boundaries on deformation are discussed in details.<br />
9:40am B2-1-6 TiSiN and TiSiCN hard coatings by CVD, I. Endler<br />
(Ingolf.Endler@ikts.fraunhofer.de), M. Höhn, J. Schmidt, S. Scholz, M.<br />
Herrmann, Fraunhofer IKTS, Germany, M. Knaut, TU Dresden, Germany<br />
TiN and TiCxNy are commercial CVD coatings widely used for cutting tool<br />
applications. A promising route for improving hardness and oxidation<br />
resistance is the addition of silicon. Thermal CVD method was employed<br />
using gas mixtures containing TiCl4 and the silicon chlorides SiCl4 or<br />
Si2Cl6. This work is focussed on the investigation of structure, composition<br />
and properties of the TiSiN and TiSiCN coatings deposited on hardmetal<br />
inserts.<br />
TiSiN layers with a nanocomposite structure were obtained with SiCl4 as<br />
well as Si2Cl6 in a temperature range between 800°C and 900°C. In both<br />
cases ammonia was used as nitrogen precursor. The crystalline phases TiN,<br />
and at 900°C Ti5Si3 as well, were analysed by XRD. From the TEM<br />
investigation of a layer deposited at 850°C it is evident that the<br />
nanocrystalline TiN is embedded in an amorphous phase. The amorphous<br />
phase is silicon nitride. The hardness correlates well with the silicon content<br />
and the grain size. A maximum hardness about 37 GPa was observed at a<br />
silicon content between 6 and 8 at.% if SiCl4 was applied as silicon<br />
precursor. In this silicon concentration range a TiN grain size of 14.5 nm<br />
was determined. If Si2Cl6 was used the hardness maximum of 38 GPa was<br />
already achieved at a lower silicon content of 3.5 at.%. The corresponding<br />
TiN grain size is 16.4 nm. The investigation of the oxidation behavior<br />
73 Thursday Morning, April 26, <strong>2012</strong>