ICMCTF 2012! - CD-Lab Application Oriented Coating Development

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waste heat storage and utilization. The advantages of the microwave assisted B-C-N foam synthesis and surface modification for thermal storage enhancement are discussed. 10:00am F3-1-7 B4C thin films for neutron detection, C. Höglund (carina.hoglund@esss.se), European Spallation Source ESS AB/ Linköping University, Sweden, J. Birch, Linköping University, Sweden, K. Andersen, European Spallation Source ESS AB, Sweden, T. Bigault, J.-C. Buffet, J. Correa, P. van Esch, B. Guerard, Institute Laue Langevin, France, R. Hall- Wilton, European Spallation Source ESS AB, Sweden, J. Jensen, Linköping University, Sweden, A. Khaplanov, European Spallation Source ESS AB , Sweden; Institute Laue Langevin, France, F. Piscitelli, Institute Laue Langevin, France, C. Vettier, European Synchrotron Radiation Facility ESRF, France, W. Vollenberg, CERN, Switzerland, L. Hultman, Linköping University, Sweden Due to the very limited availability of 3 He, neutron detectors based on other elements are urgently needed. Here we present a method to produce thin films of 10 B4C, with a maximized detection efficiency, intended to be part of a new generation of large area detectors for neutron scattering instrumentation. A full-scale detector could be in total ~1000 m 2 of two-side coated Al-blades with ~1 mm thick 10 B4C films. B4C thin films have been deposited onto Al blade and Si wafer substrates by DC magnetron sputtering from nat B4C and boron-10 enriched 10 B4C targets in an Ar discharge, using an industrial deposition system. The films were characterized with scanning electron microscopy, elastic recoil detection analysis, X-ray reflectivity, and neutron radiography. We show that the film-substrate adhesion and film purity are improved by increased substrate temperature and deposition rate. A substrate temperature of 400 °C results in films with a density close to bulk values, good adhesion to film thickness above 3 mm, and a boron-10 content of close to 80 atomic %. Neutron absorption measurements agree with Monte Carlo simulations and show that the layer thickness, number of layers, neutron wavelength, and amount of impurities are determining factors. Initial prototype performance measurements yield an efficiency of ca. 50%, which is in general agreement with the theoretical predictions. Applications, Manufacturing, and Equipment Room: Sunrise - Session G6-1 Advances in Industrial PVD & CVD Deposition Equipment Moderator: M. Rodmar, Sandvik Tooling, Sweden, K. Bobzin, Surface Engineering Institute - RWTH Aachen University, Germany 8:00am G6-1-1 Source Technologies for Amorphous Carbon Hard Coatings, R. P. Welty (rw1@magplas.com), Magplas Technik LLC, US INVITED Hard coatings comprising amorphous carbon have become widely commercialized during the last 2 decades in products including automotive components, razor blades, window glass, data disks and heads, water faucet valves, and machining and forming tools. The coatings are deposited by numerous techniques including sputtering, PECVD, cathodic arc evaporation with various degrees of macroparticle filtering, and ion beam deposition using various types of ion sources. Coating properties vary widely according to the deposition technique and process conditions, in particular the energy of the coating flux and the amount of hydrogen incorporated into the coating. The commercial viability of different coating types and processes for a particular application depends in part on the required coating thickness and production rate. In this presentation I will discuss several source technologies for hard amorphous carbon coatings, and factors relating to their use in industrial production equipment. 8:40am G6-1-3 Broadening the application range of HiPIMS coatings in industrial cutting operations, W. Koelker (werner.koelker@cemecon.de), O. Lemmer, C. Schiffers, S. Bolz, CemeCon AG, Germany Since it's introduction in the late 1990 years by Vladimir Kouznetsov HiPIMS sputter technology has gained for many years a growing interest in many research activities worldwide. Basic research by many groups on this new and promissing high power sputter technology was very successful. It led to the understanding of many fundamental and specific aspects of the HiPIMS process and plasma conditions. Supported by this growing knowledge CemeCon as an industrial user and supplier of HiPIMS technology drove HiPIMS technology to marketability by developing a powerful and reliable HiPIMS coating machine. In 2010 CemeCon further Friday Morning, April 27, 2012 134 introduced into the cutting tool market the first HiPIMS coating, named HPN1. Today HPN1 shows promissing market growth and offers higher productivity in a variety of applications especially ranging from medium alloyed steels to spheroidal cast iron and even to challenging materials like nickel-based superalloys. The acceptance of this product in the market shows the needs for further solutions of HiPIMS coatings for cutting tools. The talk will focus on the specific advantages of HiPIMS technology and HiPIMS coatings and gives a status report on the recent application research with respect to cutting operations. It deals with the machining of high performance materials, dedicated cutting edge preperation and optimized wear volume for roughing and finishing operations. 9:00am G6-1-4 Technical challenges and solutions for scaling up of High Power Impulse Magnetron Sputtering (HIPIMS) technologies., J. Landsbergen (jlandsbergen@hauzer.nl), F. Papa, R. Tietema, M. Eerden, T. Krug, Hauzer Techno Coating, BV, Netherlands HIPIMS is a technology which has been developed for over the last ten years. Its main advantage being the ability to produce some degree of ionized metal in the plasma which is needed for depositing superior hard coatings. However, the path from laboratory investigation to full integration into large scale production equipment has not been an easy one. Due to the demands on the hardware and due to the generation of pulses into the megawatt range and the sustenance of the bias voltage during such high power pulses, hardware development and integration have taken much time. Specific challenges related to these developments for cathode sizes up to 1800 cm 2 will be discussed along with some unexpected problems which can occur during HIPIMS processes for certain target materials. 9:20am G6-1-5 S3p the HIPIMS approach of Oerlikon Balzers, S. Krassnitzer (siegfried.krassnitzer@oerlikon.com), M. Lechthaler, H. Rudigier, OC Oerlikon Balzers AG, Liechtenstein High Power Impulse Magnetron Sputtering (HIPIMS) has reached a high level of knowledge and understanding, and this technology is now ready to be industrialized. S3p - Scalable Pulsed Power Plasma - is the HIPIMS approach of Oerlikon Balzers, which offers full flexibility in terms of applied pulse power density and pulse duration. The degree of ionization can be balanced together with the deposition rate to achieve an optimum between coating properties and productivity. With S3p very smooth and dense coatings can be obtained at reasonable batch time, and new options for flexible design of coating structures and materials compositions are opened up. The present work gives an overview on the evolution of coating properties of TiAlN, by a variation of sputter power density and pulse duration. Optical Emission Spectroscopy is used to investigate the plasma properties and to estimate the degree of ionization of the sputtered material. Finally, tools coated with S3p coatings, are benchmarked against tools coated with best in class coatings deposited by arc evaporation, and show a remarkable performance. 9:40am G6-1-6 Hybrid - PVD coatings: arc evaporation combined with HIPAC, J. Vetter (joerg.vetter@sulzer.com), J. Mueller, G. Erkens, Sulzer Metaplas GmbH, Germany A new class of advanced PVD-coaters, the METAPLAS-DOMINO series , for dedicated coating applications comprise both improved vacuum arc evaporators (APA, Advanced Plasma Assisted) and high power impulse magnetron sputtering sources ( HIPAC - High Ionized Plasma Assisted Coating). The ion cleaning is based on the (AEGD, Arc Enhanced Glow Discharge) process. It ’s possible to run the processes in different modes, e.g. pure APA arc evaporation or pure HIPAC magnetron sputtering. However the combination of the two high ionized deposition processes to generate multilayer, nanomultilayers and nanocomposite layers opens new horizons in tailoring of coating. The arc evaporation itself is limited to specific cathode material properties (mostly metal alloys). HIPAC magnetron sputtering processes can be used to atomize and ionize materials which are difficult to evaporate or not evaporable by cathodic arc, e.g. Si, SiC, WC, TiB2 and others. Specific features of the PVD system equipped with APA arc evaporators and HIPAC magnetron sources will be shown. First results of hybrid coatings will be presented 10:00am G6-1-7 Towards uniform coating on complex geometries by PVD techniques, T. Takahashi (takahashi@kcs-europe.de), R. Cremer, P. Jaschinski, KCS Europe GmbH, Germany, K. Yamamoto, S. Hirota, Kobe Steel Ltd., Japan Physical Vapor Deposition (PVD) methods such as sputter and cathodic arc processes are in general characterized as a line-of-sight deposition, and hence the uniform coating on substrates having complex geometries by
PVD is a challenging task. The present work demonstrates a fast and semiquantitative method for evaluating the coating homogeneity over a large substrate area. Thin films are deposited using three different PVD techniques of cathodic arc, DC-sputtering, and High Power Pulsed Magnetron Sputtering (HPPMS), and compared in terms of the coating homogeneity and the deposition rate. While the cathodic arc provides a significantly higher deposition rate compared to the others, similar coating distributions are achieved among these deposition techniques. The method presented here contributes towards a fast and efficient optimization of process parameters for PVD coatings on complex geometries. 10:20am G6-1-8 LPPS hybrid Technologies: New Thermal Spray Processes for new emerging Energy Applications, H.-M. Hoehle (hansmichael.hoehle@sulzer.com), Sulzer Metco Europe GmbH, Germany, M. Gindrat, A. Barth, Sulzer Metco AG (Switzerland), Switzerland Recent developments in hybrid low pressure thermal spray technologies, such as Plasma Spray-Thin Film (PS-TF), PS-PVD, PS-CVD are being increasingly used to develop functional inorganic coatings and films for emerging high end energy applications. Such applications include protection layers and electrolytic films in SOFC, gas tight mixed electron and ion conducting membranes for gas separation and thin functional layers in photo-voltaic applications. This paper provides a brief overview of the status of developments of several high end emerging energy applications. Beside the applications the basics of these technologies will be described. 10:40am G6-1-9 Development of metal strip cooling equipment for demands of high-rate vacuum coating, J.-P. Heinß (jenspeter.heinss@fep.fraunhofer.de), P. Lang, Fraunhofer FEP, Germany Metal strip coating is developing continuously and opens steadily new application fields. Solar heat and thin film photovoltaic are actual examples. From economical reasons the electron beam evaporation is predestined to fit the mass throughput and in the near past a lot of successful developments became known. Fraunhofer FEP is engaged in developments of vacuum coating as well as in additional and ambient processes. High-rate vacuum depositions demand in few cases an effective cooling concept for scooping out their potential. Otherwise substrate or layer temperature exhibits the limiting factor. The technical challenge consists in realizing an effective heat transfer process under high vacuum conditions and was unsolved up to now. Therefore new cooling equipment for vacuum metal strip coating was developed. A description of adapted principles and developed design will be presented. The heat transfer coefficient was extended outgoing from common cooling drum with 50 up to 200 W/m 2 K for the new designed cooling equipment. We demonstrate several dependencies for the heat transfer coefficient and also first results of adaption of cooling equipment during electron beam deposition of steel strip. The increased cooling efficiency opens new technical capabilities: utilization of very high deposition rates, deposition of thin metal strips and foils, increase of layer thickness, defining of strip temperature during deposition up to keeping it constant during high-rate deposition. We discuss these different performances also in connection with economical consequences. 11:00am G6-1-10 Multiple frequency coupled plasmas for enhanced control of PVD processes, S. Bienholz (bienholz@aept.rub.de), E. Semmler, P. Awakowicz, Ruhr-Universität Bochum, Germany Capacitively coupled plasmas are widely used in PVD processes over several years. Classical single radio frequency capacitively coupled plasmas for PVD processes are nowadays replaced by high rate DC-Magnetron sputter coaters. Nevertheless, both techniques do not allow a separate control of ion flux and its energy distribution at the target, which limits the control range of sputter processes. A possibility to overcome this constriction consists of exciting the plasma at two or even more different radio frequencies simultaneously. Whereas high electron densities and therefore a high ion flux can be achieved by using a very high frequency (VHF) excitation, a lower frequency (HF) excitation gives a certain control over the ion bombarding energy at the target. In this contribution we discuss the possibility of tuning electrical discharge quantities by using multiple excitation frequencies. Especially, the influence of the relative phase between one frequency and its second harmonic on the target voltage waveform and the self bias voltage is investigated, as well as the effect on relevant plasma quantities. Langmuir probe measurements and optical emission spectroscopy are performed to fully characterize the plasma. It is shown, that multiple frequencies capacitively coupled plasmas give an independent control over ion flux and the ion bombarding energy at the target over a wide range. The experiments show, that capacitively coupled multiple frequency plasmas are a promising complement to existing PVD processes. The authors would like to acknowledge the funding provided by the ''Deutsche Forschungsgemeinschaft'' within the frame of the SFB-TR 87 and the ''Ruhr University Bochum Research School''. 135 Friday Morning, April 27, 2012
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I C M C T F 2 0 1 2 INTERNATIONAL C
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TABLE OF CONTENTS Welcoming Remarks
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2012 ICMCTF SCHEDULE OF EVENTS DAY
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SYMPOSIUM A Coatings for Use at Hig
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Marco Cremona Pontificia Universida
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Exhibitor Keynote Lecture Tuesday,
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2011/12, discuss ideas and prioriti
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At the focus topic, from the experi
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2012 R.F. Bunshah Annual Award & IC
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ICMCTF 2012 Graduate Student Awards
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ICMCTF 2012 thanks Plansee for thei
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ICMCTF 2012 thanks AJA Internationa
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ICMCTF 2012 thanks CemeCon for thei
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ICMCTF 2012 Short Courses April 22
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ICMCTF 2012 Planning Grid We provid
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Key to Session/Paper Numbers A Coat
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Monday Morning, April 23, 2012 Fund
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New Horizons in Coatings and Thin F
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Fundamentals and Technology of Mult
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Advanced Characterization of Coatin
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Hard Coatings and Vapor Deposition
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Tribology & Mechanical Behavior of
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Coatings for Use at High Temperatur
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Applications, Manufacturing, and Eq
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Wednesday Afternoon, April 25, 2012
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Thursday Afternoon Poster Sessions
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Free Caricatures & Massages!! E-1 V
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ICMCTF 2012 EXHIBIT HALL Internatio
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I C M C T F 2012 S P O N S O R S Bo
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All in Good Measure A 24 µm scan o
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Call For Abstracts Deadline: MAY 2,
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CC800 ® /9 HIPIMS true integration
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Exhibit Hall Reception - Atlas Ball
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Kaufman & Robinson announces their
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Miba Coating Group is the specialis
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PLANSEE SE, 6600 Reutte, Austria, T
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� ��
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Plenary Talk Room: Golden Ballroom
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content. Analyses of the oxidised c
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- The control on the gradient in re
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μ = 0.4 to μ = 0.9). On the other
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application tests the ta-C coated d
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4:10pm C2-2/F4-2-10 Investigation o
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process with surfactant on WO3/ITO
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is already reported. To further com
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conditions. The details of the comp
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esidual stress and to the Poisson
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eactive gases with the target mater
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emerging fields. State-of-the-art t
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transparent conducting layers. Howe
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methods provide similar carrier den
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of AISI 52100 steels by developing
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deposition based on high power puls
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coatings removed from the aluminum
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spectroscopy varies from 25 at% to
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This article describes how to use s
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een demonstrated both theoretically
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Furthermore, the silane coupling ag
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10:40am A1-1-9 High temperature oxi
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10:40am B4-2-10 Understanding the d
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11:00am B5-1-10 Hard nanocrystallin
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* Sandia National Laboratories is a
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fluidized bed of tin, zinc and alum
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mechanical and chemical properties.
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duration for super-low friction see
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stainless steel DIN X42Cr13 surface
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2:30pm TS1-1-3 Surface engineering
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X-ray diffraction patterns of the Z
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11:20am B6-1-11 Direct current magn
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loading situations could help to ob
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Energetic Materials and Micro-Struc
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Page 185 and 186: silica-based hydrophilic coatings i
Page 187 and 188: extent depending on the actual grow
Page 189 and 190: [1] F. Tasnádi, B. Alling, C. Hög
Page 191 and 192: eproducibility of the preparation o
Page 193 and 194: showed by the uncoated 4140 steel s
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Page 197 and 198: thin films in which a multiscale mo
Page 199 and 200: centers, ascribed to conduction ele
Page 201 and 202: BP-26 Characterization of laser abl
Page 203 and 204: BP-38 Stress signature of an amorph
Page 205 and 206: simultaneously optimize materials p
Page 207 and 208: CP-17 Effects of UV Light Treatment
Page 209 and 210: amorphous structure with a smooth s
Page 211 and 212: addition, it was observed that the
Page 213 and 214: EP-5 The effective Indenter concept
Page 215 and 216: the substrates directly or after ra
Page 217 and 218: as-grown films using textured Si as
Page 219 and 220: proposed memory device exhibits exc
Page 221 and 222: FP-24 Effect of hydrogen addition o
Page 223 and 224: oxide obtained was correlated to th
Page 225 and 226: Post Deadline Discoveries and Innov
Page 227 and 228: chemical bonds have also been achie
Page 229 and 230: 9:40am B3-1-6 Compressive stress ge
Page 231 and 232: 10:20am D2-1-8 Corrosion Resistance
Page 233: property combination is attractive
Page 237 and 238: Chang, G.W.: C2-3/F4-3-3, 29; GP-3,
Page 239 and 240: Huang, K.H.: BP-33, 102 Huang, P.H.
Page 241 and 242: Moody, N.R.: F6-1-1, 7 Moon, S.: D1
Page 243 and 244: Szeremley, D.: G3-1-7, 68 Szesz, E.
Page 245 and 246: NOTES 145
Page 247 and 248: Description of Research Highlights:
Page 249 and 250: their presentations in order to eva
Page 251 and 252: NOTES 151
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Page 255 and 256: MARK YOUR CALENDAR FOR ICMCTF 2013!
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ICMCTF 2012! - CD-Lab Application Oriented Coating Development

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