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ICMCTF 2012! - CD-Lab Application Oriented Coating Development

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were evaluated under the dry sliding conditions show a higher coefficient of<br />

friction but a lower wear rate than the uncoated Mg alloy. It was also found<br />

that the coatings formed using the hybrid current mode showed different<br />

wear behavior of both the coating and counterpart pins due to their modified<br />

coating microstructure and surface morphology. The microstructures of the<br />

coatings and their relationships to the tribological performance are<br />

discussed in detail.<br />

3:30pm G3-1-6 Insight into Plasma Discharge in PEO: In-situ<br />

Impedance Spectroscopy Study, A. Yerokhin<br />

(A.Yerokhin@sheffield.ac.uk), C.-J. Liang, University of Sheffield, UK, E.<br />

Parfenov, Ufa State Aviation Technical University, Russian Federation, A.<br />

Matthews, University of Sheffield, UK<br />

Plasma electrolytic oxidation (PEO) is an advanced anodising technology<br />

which operates at voltages that trigger plasma discharge at the metalelectrolyte<br />

interface. Due to transient nature and unusual environment such<br />

plasma is difficult to investigate by conventional means. Here we report on<br />

the results of in-situ impedance spectroscopy studies that provide insights<br />

into the structure of plasma discharge in PEO. The impedance<br />

characteristics of the PEO process on Al were obtained and effects of<br />

polarisation voltage and processing time discussed. In the impedance<br />

spectra, four time constants ranging from 10 -5 to 10 -2 s were resolved,<br />

indicating processes taking place at different scales. Discharge appears to be<br />

dominated by typical of plasmas inductive response, with negative<br />

resistance likely to be associated with sheath behaviour also being<br />

prominent. These processes are coupled with a relatively fast capacitive and<br />

a rather slow inductive response that may be due to charge transfer through<br />

the metal-oxide interface and plasma thermal relaxation respectively.<br />

3:50pm G3-1-7 Control of ion distribution functions in capacitive<br />

sputter sources, D. Eremin, S. Gallian, D. Szeremley, R.P. Brinkmann, T.<br />

Mussenbrock (mussenbrock@gmail.com), Ruhr Universität Bochum,<br />

Germany<br />

The ion energy distribution function (IEDF) plays a major role in plasma<br />

based surface modification. The control of IEDFs is therefore strongly<br />

desirable, particularly in the context of sputter deposition. Due to their<br />

unique properties capacitive multi-frequency discharges are promising<br />

candidates not only for sputtering dielectric (non-conductive) materials but<br />

also for allowing for tailoring IEDFs.<br />

The paper discusses a technique which enables the tailoring of IEDFs. The<br />

technique exploits the electrical asymmetry effect (EAE) in geometrically<br />

symmetric and asymmetric capacitive discharges which leads to the<br />

generation of a DC self-bias voltage. The DC self-bias voltage as the key<br />

parameter for IEDFs can be controlled using the phase shift between the<br />

two consecutive harmonics of the driving radio-frequency. By means of<br />

self-consistent kinetic plasma simulations performed on Graphics<br />

Processing Units (GPUs) it is shown that the energy of ions impinging on<br />

both the target and the substrate can be controlled almost independently<br />

from the ion flux.<br />

4:10pm G3-1-8 Tandem of DBD and ICP RF Atmospheric Plasma<br />

Systems for Yttrium Oxide Nanocoating of Consumable Semiconductor<br />

Parts, Y. Glukhoy (glukhoy1@aol.com), A. Ryaboy, T. Kerzhner,<br />

Nanocoating Plasma Systems Inc., US<br />

An ICP atmospheric plasma torch is proven to be an excellent tool for<br />

yttrium oxide plasma corrosion protective nanocoating of consumable parts<br />

for plasma etching processes. It provides a residence time of nanoparticles<br />

in a high temperature area that is enough for a total melting and<br />

evaporation. A gaseous focusing of such torch allows the size reduction of<br />

the spot in order to deliver Y2O3 vapor into the gas distribution holes of the<br />

showerheads. Unfortunately, susceptibility of the precursor to<br />

agglomeration deteriorates these advantages. RF power is not enough for<br />

the thermal decomposition of aggregates on the fly. Contaminated by the<br />

clusters, this coating has risk of flaking. We found that an atmospheric<br />

dielectric barrier discharge (DBD) can provide decomposition of clusters<br />

with a much lower energy. Both, single nanoparticles and nanoparticles in<br />

aggregation are charged negatively when they are passing through the<br />

plasma bulk. The repulsive electrostatic forces break down of the multicharged<br />

clusters into small pieces suitable for the following evaporation in<br />

the ICP torch.<br />

Our linear reactor consists of the12 mm quartz tube with array of tungsten<br />

needles, welded alongside and connected to the 13.56 MHz RF generator.<br />

Length is enough to provides the passage of nanoparticles with residence<br />

time for separation. The DBD discharge is generated at the 100W RF power<br />

and the gas flow of 40 clm. Therefore, tandem of the DBD and the ICP<br />

atmospheric plasma systems can replace a DC plasma spray low adhesion<br />

coating can be a solution for the development of the size unlimited<br />

chamber-less coating for transition to 450 mm wafers. The first results show<br />

the reduction of cluster contamination verified by SEM and ATF.<br />

Wednesday Afternoon, April 25, <strong>2012</strong> 68<br />

Surface Engineering for Thermal Transport, Storage<br />

and Harvesting<br />

Room: Sunset - Session TS1-1<br />

Surface Engineering for Thermal Transport, Storage<br />

and Harvesting<br />

Moderator: B. Cola, Georgia Technical Institute, US, C.<br />

Muratore, Air Force Research <strong>Lab</strong>oratory, Thermal Sciences<br />

and Materials Branch, US<br />

1:50pm TS1-1-1 Textured CrN Thin <strong>Coating</strong>s Enhancing Heat<br />

Transfer in Nucleate Boiling Processes, E.M. Slomski (slomski@mpaifw.tu-darmstadt.de),<br />

M. Oechsner, S. Fischer, P. Stephan, H. Scheerer, T.<br />

Troßmann, Technische Universitat Darmstadt, Germany<br />

Subsequent research work aims to investigate the potential of PVD thin<br />

coatings for new fields of application. The present study is based on<br />

measurements of electrical conductivity, light absorption and<br />

thermodynamic nucleate boiling tests of specific textured Cr/CrN-coatings<br />

with predominant (1 1 1), (3 1 1) or (2 0 0), (2 2 0) crystal lattice<br />

orientations. Those tests reveal promising results concerning thin film<br />

applications in the field of heat transfer enhancement during nucleate<br />

boiling. High Power Impulse Magnetron Sputtering (HiPIMS) in<br />

combination with Direct Current Magnetron Sputtering (DCMS) was<br />

applied to deposit CrN coatings of 3-4 µm thickness on different substrate<br />

materials. An ultrathin coating of pure Cr was used as adhesive interlayer<br />

between substrate and CrN coating. The crystallographic phases and<br />

orientations of the coatings were determined by X-ray analyses (XRD)<br />

using glancing-incidence and θ /2 θ mode and texture coefficients were<br />

calculated. High resolution scanning electron microscope (SEM) analyses<br />

visualize the different shapes, sizes and orientations of the grains. Finally<br />

selected Cr/CrN coatings were deposited on heater samples and boiling<br />

curves were measured in nucleate boiling experiments in order to determine<br />

heat transfer coefficients and critical heatflux (CHF) at dryout of the heater<br />

surface. Results show an up to 2.2 times higher CHF of the coated heater,<br />

compared to an uncoated pure copper heater.<br />

2:10pm TS1-1-2 Effects of strain on thermal conductivity in<br />

amorphous thin films, M.T. Alam, M.P. Manoharan, Penn State<br />

Unviersity, Mechanical & Nuclear Engineering Department, S.V. Shenogin,<br />

UES/Air Force Research <strong>Lab</strong>oratory, Materials and Manufacturing<br />

Directorate, Thermal Sciences and Materials Branch, US, A. Voevodin, A.K.<br />

Roy, C. Muratore (chris.muratore@wpafb.af.mil), Air Force Research<br />

<strong>Lab</strong>oratory, Materials and Manufacturing Directorate, Thermal Sciences<br />

and Materials Branch, US, M.D. Haque, Penn State University, Mechanical<br />

& Nuclear Engineering Department, US<br />

To investigate mechanisms of thermal conductivity in amorphous materials,<br />

we developed a technique for microfabricating freestanding ultrathin films<br />

with built-in strain actuation and instrumentation for thermal conductivity<br />

measurement. Using a combination of infrared thermal micrography, 3omega<br />

analysis, and multi-physics simulations, we measured the thermal<br />

conductivity of amorphous silicon nitride and silicon oxide films under a<br />

range of tensile strains. The thermal conductivity of the silicon nitride film<br />

showed a remarkable decrease with tensile strain, dropping down by an<br />

order of magnitude at approximately 2% strain when compared to the<br />

unstrained film. Silicon oxide showed no change in thermal conductivity up<br />

to 1% tensile strain. The theoretical analysis was performed using classical<br />

molecular dynamics and lattice dynamics simulations, showing that<br />

amorphous silicon nitride has unusual vibrational properties resembling<br />

those of amorphous silicon and other chemically uniform glasses. The<br />

unusual relationship between strain and thermal conductivity in amorphous<br />

silicon nitride suggests that an additional mechanism such as long-range<br />

unharmonic coupling between oscillators plays an important role in heat<br />

conduction, as the conductivity agrees with harmonic theory predictions at<br />

large values of tensile strain (>2%). This work is supported by AFOSR Low<br />

Density Materials Program,Task #2306CR7P.

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