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ICMCTF 2012! - CD-Lab Application Oriented Coating Development

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Marco Cremona<br />

Pontificia Universidade Catolica do Rio de<br />

Janeiro, Brazil<br />

cremona@fis.puc-rio.br<br />

F6. <strong>Coating</strong>s for Compliant Substrates<br />

Ben Beake<br />

Micromaterials Co., UK<br />

ben@micromaterials.co.uk<br />

Roberto M. Souza<br />

Polytechnic School of the University of Sao<br />

Paulo, Brazil<br />

roberto.souza@poli.usp.br<br />

F7/C5. Polarisation Phenomena in Thin<br />

Films and Devices<br />

Shelly Moram<br />

University of Cambridge, UK<br />

mam65@cam.ac.uk<br />

David Holec<br />

Montanuniversitaet Leoben, Austria<br />

david.holec@unileoben.ac.at<br />

F8/A3. <strong>Coating</strong>s for Fuel Cells & Batteries<br />

Eileen Yu<br />

Newcastle University, UK<br />

eileen.yu@ncl.ac.uk<br />

Gayatri V Dadheech<br />

General Motors, USA<br />

gayatri.dadheech@gm.com<br />

SYMPOSIUM G<br />

<strong>Application</strong>s, Manufacturing and<br />

Equipment<br />

Daphne Pappas<br />

Army Research <strong>Lab</strong>oratory, USA<br />

daphne.pappas@arl.army.mil<br />

Kenji Yamamoto<br />

Kobe Steel, Japan<br />

yamamoto.kenji1@kobelco.com<br />

G1. Innovations in Surface <strong>Coating</strong>s and<br />

Treatments<br />

Ladislav Bardos<br />

Uppsala University, Sweden<br />

ladislav.bardos@angstrom.uu.se<br />

Rainer Cremer<br />

KCS Europe GmbH, Germany<br />

cremer@kcs-europe.de<br />

G2/E3. <strong>Development</strong>, Characterization,<br />

and Tribology of <strong>Coating</strong>s for<br />

Automotive and Aerospace <strong>Application</strong>s<br />

Helmut Rudigier<br />

OC Oerlikon Balzers AG, Liechtenstein<br />

helmut.rudigier@oerlikon.com<br />

Satish Dixit<br />

Plasma Technologies Inc. CA, USA<br />

sdixit@ptise.com<br />

Ryan Evans<br />

Timken Company, USA<br />

ryan.evans@timken.com<br />

G3. Atmospheric and Hybrid Plasma<br />

Technologies<br />

Roland Gesche<br />

Ferdinand-Braun Institut Berlin, Germany<br />

roland.gesche@fbh-berlin.de<br />

Hana Barankova<br />

Uppsala University, Sweden<br />

hana.barankova@angstrom.uu.se<br />

G4/E4. <strong>Coating</strong>s for Machining<br />

Advanced Materials and for Use in<br />

Advanced Manufacturing Methods<br />

Mirjam Arndt<br />

OC Oerlikon Balzers AG, Liechtenstein<br />

mirjam.arndt@oerlikon.com<br />

Xueyuan Nie<br />

University of Windsor, Canada<br />

xnie@uwindsor.ca<br />

G5. <strong>Coating</strong>s Pre-treatment, Post-treatment<br />

and Duplex Technology<br />

Nazlim Bagcivan<br />

RWTH Aachen, Germany<br />

bagcivan@iot.rwth-aachen.de<br />

Sudhir Brahmandam<br />

Kennametal Inc., USA<br />

sudhir.brahmandam@kennametal.com<br />

G6. Advances in Industrial PVD & CVD<br />

Deposition Equipment<br />

Markus Rodmar<br />

Sandvik Tooling, USA<br />

markus.rodmar@sandvik.com<br />

Kirsten Bobzin<br />

RWTH Aachen, Germany<br />

bobzin@iot.rwth-aachen.de<br />

SYMPOSIUM TS1<br />

Surface Engineering for Thermal<br />

Transport, Storage and Harvesting<br />

Christopher Muratore<br />

Air Force Research <strong>Lab</strong>oratory, USA<br />

chris.muratore@wpafb.af.mil<br />

Baratunde Cola<br />

Georgia Technical Institute, USA<br />

cola@gatech.edu<br />

SYMPOSIUM TS2<br />

Advanced Characterization of <strong>Coating</strong>s<br />

and Thin Films<br />

Peter Schaaf<br />

TU Ilmenau, Germany<br />

peter.schaaf@tu-ilmenau.de<br />

Finn Giuliani<br />

Imperial College London, UK<br />

f.giuliani@imperial.ac.uk<br />

Sandra Korte<br />

University of Cambridge, UK<br />

sk511@cam.ac.uk<br />

vii<br />

SYMPOSIUM TS3<br />

Energetic Materials and Micro-<br />

Structures for Nanomanufacturing<br />

Claus Rebholz<br />

University of Cyprus, Cyprus<br />

claus@ucy.ac.cy<br />

Charalabo C. Doumanidis<br />

National Science Foundation, USA<br />

cdoumani@ucy.ac.cy<br />

Teiichi Ando<br />

Northeastern University, USA<br />

tando@coe.neu.edu<br />

SYMPOSIUM TS4<br />

Graphene and 2D Nanostructures<br />

Manish Chhowalla<br />

Rutgers University, USA<br />

manish1@rci.rutgers.edu<br />

Christian Teichert<br />

Montanuniversitaet Leoben, Austria<br />

christian.teichert@unileoben.ac.at<br />

Post Deadline Session<br />

Wolfgang Kalss<br />

OC Oerlikon Balzers AG, Liechtenstein<br />

wolfgang.kalss@oerlikon.com<br />

Sven Ulrich<br />

Karlsruhe Institute of Technology, Germany<br />

sven.ulrich@kit.edu

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