ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
ICMCTF 2012! - CD-Lab Application Oriented Coating Development
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Marco Cremona<br />
Pontificia Universidade Catolica do Rio de<br />
Janeiro, Brazil<br />
cremona@fis.puc-rio.br<br />
F6. <strong>Coating</strong>s for Compliant Substrates<br />
Ben Beake<br />
Micromaterials Co., UK<br />
ben@micromaterials.co.uk<br />
Roberto M. Souza<br />
Polytechnic School of the University of Sao<br />
Paulo, Brazil<br />
roberto.souza@poli.usp.br<br />
F7/C5. Polarisation Phenomena in Thin<br />
Films and Devices<br />
Shelly Moram<br />
University of Cambridge, UK<br />
mam65@cam.ac.uk<br />
David Holec<br />
Montanuniversitaet Leoben, Austria<br />
david.holec@unileoben.ac.at<br />
F8/A3. <strong>Coating</strong>s for Fuel Cells & Batteries<br />
Eileen Yu<br />
Newcastle University, UK<br />
eileen.yu@ncl.ac.uk<br />
Gayatri V Dadheech<br />
General Motors, USA<br />
gayatri.dadheech@gm.com<br />
SYMPOSIUM G<br />
<strong>Application</strong>s, Manufacturing and<br />
Equipment<br />
Daphne Pappas<br />
Army Research <strong>Lab</strong>oratory, USA<br />
daphne.pappas@arl.army.mil<br />
Kenji Yamamoto<br />
Kobe Steel, Japan<br />
yamamoto.kenji1@kobelco.com<br />
G1. Innovations in Surface <strong>Coating</strong>s and<br />
Treatments<br />
Ladislav Bardos<br />
Uppsala University, Sweden<br />
ladislav.bardos@angstrom.uu.se<br />
Rainer Cremer<br />
KCS Europe GmbH, Germany<br />
cremer@kcs-europe.de<br />
G2/E3. <strong>Development</strong>, Characterization,<br />
and Tribology of <strong>Coating</strong>s for<br />
Automotive and Aerospace <strong>Application</strong>s<br />
Helmut Rudigier<br />
OC Oerlikon Balzers AG, Liechtenstein<br />
helmut.rudigier@oerlikon.com<br />
Satish Dixit<br />
Plasma Technologies Inc. CA, USA<br />
sdixit@ptise.com<br />
Ryan Evans<br />
Timken Company, USA<br />
ryan.evans@timken.com<br />
G3. Atmospheric and Hybrid Plasma<br />
Technologies<br />
Roland Gesche<br />
Ferdinand-Braun Institut Berlin, Germany<br />
roland.gesche@fbh-berlin.de<br />
Hana Barankova<br />
Uppsala University, Sweden<br />
hana.barankova@angstrom.uu.se<br />
G4/E4. <strong>Coating</strong>s for Machining<br />
Advanced Materials and for Use in<br />
Advanced Manufacturing Methods<br />
Mirjam Arndt<br />
OC Oerlikon Balzers AG, Liechtenstein<br />
mirjam.arndt@oerlikon.com<br />
Xueyuan Nie<br />
University of Windsor, Canada<br />
xnie@uwindsor.ca<br />
G5. <strong>Coating</strong>s Pre-treatment, Post-treatment<br />
and Duplex Technology<br />
Nazlim Bagcivan<br />
RWTH Aachen, Germany<br />
bagcivan@iot.rwth-aachen.de<br />
Sudhir Brahmandam<br />
Kennametal Inc., USA<br />
sudhir.brahmandam@kennametal.com<br />
G6. Advances in Industrial PVD & CVD<br />
Deposition Equipment<br />
Markus Rodmar<br />
Sandvik Tooling, USA<br />
markus.rodmar@sandvik.com<br />
Kirsten Bobzin<br />
RWTH Aachen, Germany<br />
bobzin@iot.rwth-aachen.de<br />
SYMPOSIUM TS1<br />
Surface Engineering for Thermal<br />
Transport, Storage and Harvesting<br />
Christopher Muratore<br />
Air Force Research <strong>Lab</strong>oratory, USA<br />
chris.muratore@wpafb.af.mil<br />
Baratunde Cola<br />
Georgia Technical Institute, USA<br />
cola@gatech.edu<br />
SYMPOSIUM TS2<br />
Advanced Characterization of <strong>Coating</strong>s<br />
and Thin Films<br />
Peter Schaaf<br />
TU Ilmenau, Germany<br />
peter.schaaf@tu-ilmenau.de<br />
Finn Giuliani<br />
Imperial College London, UK<br />
f.giuliani@imperial.ac.uk<br />
Sandra Korte<br />
University of Cambridge, UK<br />
sk511@cam.ac.uk<br />
vii<br />
SYMPOSIUM TS3<br />
Energetic Materials and Micro-<br />
Structures for Nanomanufacturing<br />
Claus Rebholz<br />
University of Cyprus, Cyprus<br />
claus@ucy.ac.cy<br />
Charalabo C. Doumanidis<br />
National Science Foundation, USA<br />
cdoumani@ucy.ac.cy<br />
Teiichi Ando<br />
Northeastern University, USA<br />
tando@coe.neu.edu<br />
SYMPOSIUM TS4<br />
Graphene and 2D Nanostructures<br />
Manish Chhowalla<br />
Rutgers University, USA<br />
manish1@rci.rutgers.edu<br />
Christian Teichert<br />
Montanuniversitaet Leoben, Austria<br />
christian.teichert@unileoben.ac.at<br />
Post Deadline Session<br />
Wolfgang Kalss<br />
OC Oerlikon Balzers AG, Liechtenstein<br />
wolfgang.kalss@oerlikon.com<br />
Sven Ulrich<br />
Karlsruhe Institute of Technology, Germany<br />
sven.ulrich@kit.edu