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ICMCTF 2012! - CD-Lab Application Oriented Coating Development

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chemical bonds have also been achieved utilizing FTIR via cross calibration<br />

with other techniques. In this talk, we will demonstrate that transmission<br />

FTIR can be, in certain instances, further extended to quantitatively<br />

determine the full chemical bonding in a dieletric thin film. In turn,<br />

knowledge of the full bond concentrations allows accurate determination of<br />

the mass density and full elemental composition of the film. This capability<br />

is demonstrated for a-SiC:H thin films deposited by plasma enhanced<br />

chemical vapor deposition (PECVD). The resulting FTIR mass density and<br />

compositional analysis determined by this technique shows an excellent<br />

correlation to similar measurements by X-ray Reflectivity, X-ray<br />

Photoelectron Spectroscopy, and Scanning Ion Mass Spectroscopy<br />

Techniques.<br />

TSP-8 Ordered thin film materials with ultra-low thermal<br />

conductivity, C. Muratore (chris.muratore@wpafb.af.mil), Air Force<br />

Research <strong>Lab</strong>oratory, Thermal Sciences and Materials Branch, US, V.<br />

Varshney, UTC/Air Force Research <strong>Lab</strong>oratory, Thermal Sciences and<br />

Materials Branch, US, J.J. Gengler, Air Force Research <strong>Lab</strong>oratory,<br />

Thermal Sciences and Materials Branch, US, J.J. Hu, UDRI/Air Force<br />

Research <strong>Lab</strong>oratory, Thermal Sciences and Materials Branch, US, T.S.<br />

Smith, Air Force Research <strong>Lab</strong>oratory, Thermal Sciences and Materials<br />

Branch, US, J.E. Bultman, UDRI/Air Force Research <strong>Lab</strong>oratory, Thermal<br />

Sciences and Materials Branch, US, A. Voevodin, Air Force Research<br />

<strong>Lab</strong>oratory, Thermal Sciences and Materials Branch, US<br />

Transition metal dichalcogenide (TMD) crystals are characterized by their<br />

distinct layered atomic structures, with strong covalent bonds comprising<br />

each layer, but weak van der Waals forces holding the layers together. The<br />

relationship between chemical bonding in a material and its thermal<br />

conductivity (k) is well-known, however the thermal properties of TMD<br />

thin films with such highly anisotropic chemical bonds have only recently<br />

been investigated with remarkable results, such as ultra-low kz. Materials<br />

with very low thermal conductivity in the z-axis, but higher kx and ky have<br />

potential as next-generation thermal barrier or heat spreading materials.<br />

Molecular dynamics (MD) simulations predicted kx=ky=4kz for perfect<br />

TMD crystals (MoS2 in this case). Experiments to determine kx,y and kz<br />

were conducted by developing processes to grow crystalline TMD thin film<br />

materials with strong (002) (basal planes parallel to surface) or (100)<br />

(perpendicular basal planes) preferred orientation. Initially, no correlation<br />

between structure and thermal conductivity was apparent, as water<br />

intercalation and reactivity to ambient air resulted in a thermal “shortcircuit”<br />

across basal planes, such that the time between deposition and k<br />

measurement had a stronger impact on thermal conductivity than film<br />

orientation. Experiments to measure intrinsic thermal conductivity of MoS2<br />

revealed values approximately one order of magnitude lower than those<br />

predicted using MD simulations, however, measurement of kx=ky=4kz was<br />

consistent with simulation results. Simulations to evaluate the dependence<br />

of thermal conductivity on grain size was evaluated, which correlated well<br />

to measured values. Comparison of measured k values for strongly (002)<br />

oriented MoS2, WS2, WSe2 and other materials with analogous crystal<br />

structures are discussed in the context of the Slack Law, which accounts for<br />

intrinsic physical properties of the crystal, but not film microstructure.<br />

TSP-9 Texture change and off-axis accommodation through film<br />

thickness in fcc structured nitrides, A. Karimi, A. Shetty<br />

(akshath.shetty@epfl.ch), EPFL, Switzerland<br />

The control of texture in fcc nitride coatings by varying the film thickness<br />

was demonstrated on polycrystalline TiAlN coatings grown by pulsed DC<br />

magnetron sputtering. <strong>Development</strong> of off-axis texture with film thickness<br />

was observed. For this purpose the evolution of texture versus thickness<br />

was studied by a set of analytical x-ray diffraction (XRD) methods like θ–<br />

2θ and pole figures, while scanning electron microscopy (SEM) and<br />

transmission electron microscopy (TEM) were used to observe the<br />

microstructure and changes in texture with thickness. The stresses along the<br />

(111) and (002) orientation were obtained by sin 2 ψ method. Based on the<br />

results obtained, the texture formation mechanism is divided in three<br />

different stages of film growth. Films at low thickness lead to the<br />

development of (002) orientation due to the surface energy minimization.<br />

Meanwhile, the competitive growth promotes the growth of (111) planes<br />

parallel to film surface at higher thickness. However, contrary to the<br />

prediction of growth models, the (002) grains are not completely overlapped<br />

by (111) grains at higher thickness. Rather the (002) grains still constitute<br />

the surface, but are tilted away from the substrate normal showing<br />

substantial in-plane alignment to allow the (111) planes remain parallel to<br />

film surface. Intrinsic stress along (111) and (002) shows a strong<br />

dependence with preferred orientation. The stress level in (002) grains<br />

which was compressive at low thickness changes to tensile at higher<br />

thickness. This change in the nature of stress allows the (002) planes to tilt<br />

away in order to promote the growth of parallel to film normal and<br />

to minimize the overall energy of system due to high compressive stress<br />

stored in the (111) grains. The change in surface morphology with thickness<br />

was observed using SEM. An increase in surface roughness with film<br />

thickness was observed which indicates the development of (111) texture<br />

parallel to film surface. TEM observations support the XRD results<br />

regarding texture change. Film hardness was measured by nanoindentation<br />

and a correlation between (111) texture, stress and hardness is obtained. The<br />

results indicate that texture development is a complex interplay between<br />

thermodynamic and kinetic forces. An attempt is made to understand this<br />

phenomenon of off-axis accommodation of (002) at higher thicknesses,<br />

which is a new result not reported previously.<br />

127 Thursday Afternoon Poster Sessions

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