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Scientific and Technical Aerospace Reports Volume 38 July 28, 2000

Scientific and Technical Aerospace Reports Volume 38 July 28, 2000

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Added Analysis (Risk Reduction); 6) Value Added Analysis (Cost); 7) Impact of COTS ++ Screening; <strong>and</strong> 8) Summary. This paper<br />

is presented in viewgraph form.<br />

CASI<br />

Hardware; NASA Programs; Electronic Equipment<br />

<strong>2000</strong>0063534 Jet Propulsion Lab., California Inst. of Tech., Pasadena, CA USA<br />

Outline: Recent work at JPL Under MSREP<br />

[<strong>2000</strong>]; 14p; In English; No Copyright; Avail: CASI; A03, Hardcopy; A01, Microfiche<br />

MSREP is a multi-faceted program with radiation effects in new technologies, development of testing <strong>and</strong> hardness assurance<br />

methods, continual evaluation of space <strong>and</strong> laboratory test data <strong>and</strong> support to NASA Projects. Other work in progress includes:<br />

1) Device Scaling <strong>and</strong> New Phenomena; 2) Radiation Effects in Microprocessors; 3) Latchup Testing <strong>and</strong> Latchup Mitigation;<br />

<strong>and</strong> 4) Revised Radiation Design Approaches. This paper is in viewgraph form.<br />

CASI<br />

NASA Programs; Microelectronics; Electronic Equipment Tests<br />

<strong>2000</strong>0064072 Jet Propulsion Lab., California Inst. of Tech., Pasadena, CA USA<br />

On-Wafer Testing of Circuits Through 220 GHz<br />

Gaier, Todd, Jet Propulsion Lab., California Inst. of Tech., USA; Samoska, Lorene, Jet Propulsion Lab., California Inst. of Tech.,<br />

USA; Oleson, Charles, Oleson Microwave Labs.; Boll, Greg, GGB Industries; [1999]; 16p; In English; No Copyright; Avail:<br />

CASI; A03, Hardcopy; A01, Microfiche<br />

We have jointly developed the capability to perform on-wafer s-parameter <strong>and</strong> noise figure measurements through 220 GHz.<br />

S-parameter test sets have been developed covering full waveguide b<strong>and</strong>s of 90-140 GHz (WR-08) <strong>and</strong> 140-220 GHz (WR-05).<br />

The test sets have been integrated with coplanar probes to allow accurate measurements on-wafer. We present the design <strong>and</strong> performance<br />

of the test sets <strong>and</strong> wafer probes. We also present calibration data as well as measurements of active circuits at frequencies<br />

as high as 215 GHz.<br />

Author<br />

Wafers; Evaluation; Circuits<br />

<strong>2000</strong>0064073 Jet Propulsion Lab., California Inst. of Tech., Pasadena, CA USA<br />

160-190 GHz Monolithic Low Noise Amplifiers<br />

Kok, Y. L., TRW Space <strong>and</strong> Electronics Group, USA; Wang, H., TRW Space <strong>and</strong> Electronics Group, USA; Huang, T. W., TRW<br />

Space <strong>and</strong> Electronics Group, USA; Lai, R., TRW Space <strong>and</strong> Electronics Group, USA; Chen, Y. C., TRW Space <strong>and</strong> Electronics<br />

Group, USA; Sholley, M., TRW Space <strong>and</strong> Electronics Group, USA; Block, T., TRW Space <strong>and</strong> Electronics Group, USA; Streit,<br />

D. C., TRW Space <strong>and</strong> Electronics Group, USA; Liu, P. H., TRW Space <strong>and</strong> Electronics Group, USA; Allen, B. R., TRW Space<br />

<strong>and</strong> Electronics Group, USA; Samoska, L., Jet Propulsion Lab., California Inst. of Tech., USA; Gaier, T., Jet Propulsion Lab.,<br />

California Inst. of Tech., USA; Barsky, Mike, TRW Space <strong>and</strong> Electronics Group, USA; [1998]; 7p; In English; No Copyright;<br />

Avail: CASI; A02, Hardcopy; A01, Microfiche<br />

This paper presents the results of two 160-190 GHz monolithic low noise amplifiers (LNAs) fabricated with 0.07-microns<br />

pseudomorphic (PM) InAlAs/InGaAs/InP HEMT technology using a reactive ion etch (RIE) via hole process. A peak small signal<br />

gain of 9 dB was measured at 188 GHz for the first LNA with a 3-dB b<strong>and</strong>width from 164 to 192 GHz while the second LNA<br />

has achieved over 6-dB gain from 142 to 180 GHz. The same design (second LNA) was also fabricated with 0.08-micron gate<br />

<strong>and</strong> a wet etch process, showing a small signal gain of 6 dB with noise figure 6 dB. All the measurement results were obtained<br />

via on-wafer probing. The LNA noise measurement at 170 GHz is also the first attempt at this frequency.<br />

Author<br />

Low Noise; Preamplifiers; Noise Measurement; Microwave Amplifiers; Transferred Electron Devices<br />

<strong>2000</strong>0064092 NASA Lewis Research Center, Clevel<strong>and</strong>, OH USA<br />

The Development of Si <strong>and</strong> SiGe Technologies for Microwave <strong>and</strong> Millimeter-Wave Integrated Circuits<br />

Ponchak, George E., NASA Lewis Research Center, USA; Alterovitz, Samuel A., NASA Lewis Research Center, USA; Katehi,<br />

Linda P. B., Michigan Univ., USA; Bhattacharya, Pallab K., Michigan Univ., USA; Directions for the Next Generation of MMIC<br />

Devices <strong>and</strong> Systems; 1997, pp. 223-230; In English<br />

Contract(s)/Grant(s): RTOP 632-6E-51; Copyright; Avail: Issuing Activity<br />

Historically, microwave technology was developed by military <strong>and</strong> space agencies from around the world to satisfy their<br />

unique radar, communication, <strong>and</strong> science applications. Throughout this development phase, the sole goal was to improve the<br />

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