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Navy Electricity and Electronics Training Series - Historic Naval ...

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A15. Combination of monolithic ICs <strong>and</strong> film components.A16. 1,000 to 2,000.A17. Circuit design, component placement, suitable substrate, <strong>and</strong> depositing proper materials onsubstrate.A18. Complex.A19. Control patterns of materials on substrates.A20. Glass or ceramic.A21. Crystal is sliced into wafers. Then ground <strong>and</strong> polished to remove any surface defect.A22. Diffusion; epitaxial growth.A23. Diffusion penetrates substrate; epitaxial does not.A24. Electrical separation of elements.A25. Evaporation <strong>and</strong> cathode sputtering.A26. Screening.A27. Combination of monolithic <strong>and</strong> film elements.A28. Circuit flexibility.A29. Protect the IC from damage; make h<strong>and</strong>ling easier.A30. TO, flat pack, DIP.A31. Flip-chip, beam lead.A32. Left.A33. Counterclockwise.A34. Reference mark.A35. Clockwise.A36. Identify the type of IC.A37. Communication.A38. Integrated circuits.A39. Miniature.A40. Level 0.A41. Level I.A42. Level II.1-55

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