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Callister - An introduction - 8th edition

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144 • Chapter 5 / Diffusion<br />

Processing/Structure/Properties/Performance Summary<br />

Diffusion in semiconducting materials was discussed in Section 5.6. For both predeposition<br />

and drive-in treatments, diffusion is nonsteady-state—solutions to<br />

Fick’s second law were provided for both. Nonsteady-state diffusion and these<br />

treatments are two of the processing components for silicon, as noted in the<br />

following diagram:<br />

Silicon<br />

(Processing)<br />

Nonsteady-state diffusion<br />

Diffusion in semiconductors<br />

(Chapter 5) (Chapter 5)<br />

In the design of heat treatments to be used for introducing impurities into<br />

semiconductors (i.e., doping, Chapter 18), and, in addition, in the production of<br />

steel alloys (Chapter 10), an understanding of the temperature dependence of the<br />

diffusion coefficient (i.e., Equation 5.8) is essential. The following diagrams illustrate<br />

the preceding relationships for these two materials.<br />

Silicon<br />

(Processing)<br />

Temperature dependence<br />

Diffusion in semiconductors<br />

of diffusion coefficient<br />

(impurity doping)<br />

(Chapter 5) (Chapters 5 and 18)<br />

Iron–Carbon<br />

Alloys (Steels)<br />

(Processing)<br />

Temperature dependence<br />

of diffusion<br />

(Chapter 5)<br />

Isothermal transformation<br />

diagrams<br />

(Chapter 10)<br />

Tempering (tempered<br />

martensite)<br />

(Chapter 10)<br />

Important Terms and Concepts<br />

activation energy<br />

carburizing<br />

concentration gradient<br />

concentration profile<br />

diffusion<br />

diffusion coefficient<br />

diffusion flux<br />

driving force<br />

Fick’s first and second laws<br />

interdiffusion (impurity diffusion)<br />

interstitial diffusion<br />

nonsteady-state diffusion<br />

self-diffusion<br />

steady-state diffusion<br />

vacancy diffusion<br />

REFERENCES<br />

Carslaw, H. S., and J. C. Jaeger, Conduction of Heat<br />

in Solids, 2nd <strong>edition</strong>, Oxford University Press,<br />

Oxford, 1986.<br />

Crank, J., The Mathematics of Diffusion, Oxford<br />

University Press, Oxford, 1980.<br />

Gale, W. F., and T. C. Totemeier (Editors), Smithells<br />

Metals Reference Book,<strong>8th</strong> <strong>edition</strong>,Butterworth-<br />

Heinemann, Woburn, UK, 2003.<br />

Glicksman, M., Diffusion in Solids, Wiley-<br />

Interscience, New York, 2000.<br />

Shewmon, P. G., Diffusion in Solids, 2nd <strong>edition</strong>,<br />

The Minerals, Metals and Materials Society,<br />

Warrendale, PA, 1989.

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