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Callister - An introduction - 8th edition

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single crystal, 451<br />

structure of, 451<br />

Quenching media, 430–431<br />

R<br />

Radiation effects, polymers, 709<br />

Random copolymers, 551, 552, G10<br />

Range of stress, 255<br />

Recombination, electron-hole,<br />

748–749, 851<br />

in light-emitting diodes, 856<br />

Recovery, 219, G10<br />

Recrystallization, 219–222, 423, G10<br />

effect on properties, 221<br />

kinetics for copper, 355<br />

Recrystallization temperature, 219,<br />

222, G10<br />

dependence on alloy content,<br />

219–220<br />

dependence on percent cold work,<br />

222<br />

selected metals and alloys, 222<br />

Rectification, 748–750<br />

Rectifying junctions, 748–750, G10<br />

Recycling:<br />

issues in materials science and<br />

engineering, 878–881<br />

of beverage cans, 872<br />

of composite materials, 880–881<br />

of glass, 879<br />

of metals, 878–879<br />

of plastics and rubber, 879–880<br />

Recycling codes and products, 880<br />

Reduction (electrochemical),<br />

675, G10<br />

Reduction in area, percent, 166<br />

Reflection, 848, G10<br />

Reflectivity, 844, 848<br />

Refraction, 846–847, G10<br />

index of, 846, G6<br />

Refractories (ceramics), 503,<br />

505–507, G10<br />

corrosion, 707<br />

Refractory metals, 412–414<br />

Reinforced concrete, 633–634, G10<br />

Reinforcement efficiency, table of, 644<br />

Relative permeability, 804, 805, G10<br />

Relative permittivity, see<br />

Dielectric constant<br />

Relaxation frequency, 764, G10<br />

Relaxation modulus, 575–577, G10<br />

Relaxation time, 621<br />

Remanence (remanent induction),<br />

816, G10<br />

Repeated stress cycle, 255, 256<br />

Repeat units, 536<br />

bifunctional and trifunctional, 540<br />

table of, 539–540, A36–A39<br />

Residual stresses, 423, G10. See also<br />

Thermal stresses<br />

glass, 516<br />

martensitic steels, 375<br />

Resilience, 168–169, G10<br />

Resin, polymer, 647<br />

Resistance (electrical), 721<br />

Resistivity, see Electrical<br />

resistivity<br />

Resolved shear stresses, 205, G10<br />

Retained austenite, 363<br />

Reverse bias, 748, G10<br />

Reversed stress cycle, 256<br />

Rhodium, 415<br />

Rhombohedral crystal system,<br />

52, 54<br />

Rochelle salt, 766<br />

Rock salt structure, 457, 460<br />

Rockwell hardness tests, 174–176<br />

Rolling, of metals, 418, G10<br />

Rouge, 508<br />

Rovings, 658<br />

Rubbers, 545, 552<br />

natural, see Natural rubber<br />

(polyisoprene)<br />

synthetic, 552, 599–601<br />

trade names, characteristics, and<br />

applications, 600<br />

Rubbery region, polymers, 576<br />

Ruby, see also Aluminum oxide<br />

lasers, 858–860<br />

optical characteristics, 853<br />

Rule of mixtures, G11<br />

composites, 630, 638, 641, 642,<br />

643, 652<br />

electrical resistivity, 730<br />

Rupture, 266, G11<br />

Rupture lifetime, 266<br />

extrapolation of, 268–269<br />

Rust, 673, 677<br />

Ruthenium, 415<br />

S<br />

Sacrificial anodes, 702, G11<br />

Safe stress, 183, G11<br />

Safety factors, 183, 248<br />

Samarium-cobalt magnets, 824<br />

Sand casting, 419<br />

Sandwich panels, 661–662, G11<br />

Sapphire, see also Aluminum oxide<br />

optical transmittance, 853<br />

Saturated hydrocarbons, 534, G11<br />

Saturation, extrinsic semiconductors,<br />

741<br />

Saturation magnetization, 807, 812,<br />

816, G11<br />

temperature dependence, 814<br />

SBR, see Styrene-butadiene rubber<br />

Index • I17<br />

Scaling, 703<br />

Scanning electron microscopy,<br />

111, G11<br />

Scanning probe microscopy, 12,<br />

111–112, G11<br />

Scanning tunneling microscope, 471<br />

Schmid factor, 230<br />

Schottky defect, 472, 473, 476, G11<br />

equilibrium number, 474<br />

Scission, 709, G11<br />

Scleroscope hardness, 178<br />

Screw dislocations, 99, 100, 101, 1<br />

99, 200, G11. See also<br />

Dislocations<br />

in polymers, 558, 559<br />

Seawater, as corrosion environment,<br />

701<br />

Secant modulus, 157, 158<br />

Secondary bonds, 34–36, G11<br />

Secondary creep, 266<br />

Segregation, 297<br />

Selective leaching, 697–698, G11<br />

Self-diffusion, 125, G11<br />

Self-interstitials, 93, G11<br />

SEM, see Scanning electron<br />

microscopy<br />

Semiconductor devices, 748–754<br />

Semiconductor lasers, 860–862<br />

Semiconductors:<br />

band structure, 724, 725<br />

carbon nanotubes as, 471<br />

in computers, 752–753<br />

costs, A34<br />

defined, 11, 722, G11<br />

diffusion in, 137–140<br />

extrinsic, 736–739, G4<br />

fullerenes as, 470<br />

intrinsic, 733–736, G6<br />

intrinsic carrier concentration,<br />

734, 740<br />

light absorption, 849–852<br />

n-type, 736–738, G8<br />

p-type, 738–739, G10<br />

temperature dependence:<br />

electron concentration, n-type<br />

Si, 741<br />

electron mobility, Si, 743<br />

hole mobility, Si, 743<br />

intrinsic carrier concentration of<br />

Ge, 740<br />

intrinsic carrier concentration of<br />

Si, 740<br />

Semicrystalline polymers, 554<br />

deformation mechanisms:<br />

elastic, 582, 583<br />

plastic, 582, 584<br />

Sensors, 11–12<br />

Severity of quench, 430

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