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fundamentals of engineering supplied-reference handbook - Ventech!

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OPERATIONAL AMPLIFIERS<br />

Ideal<br />

v2 vo = A(v1 – v2)<br />

where<br />

v<br />

1<br />

A is large (> 10 4 ), and<br />

v1 – v2 is small enough so as not to saturate the amplifier.<br />

For the ideal operational amplifier, assume that the input<br />

currents are zero and that the gain A is infinite so when<br />

operating linearly v2 – v1 = 0.<br />

For the two-source configuration with an ideal operational<br />

amplifier,<br />

va<br />

R 1<br />

R 2<br />

v<br />

b<br />

vo<br />

R2<br />

⎛ R ⎞<br />

vo<br />

va<br />

vb<br />

R ⎜ 2<br />

= − + 1 +<br />

R ⎟<br />

1 ⎝ 1 ⎠<br />

If va = 0, we have a non-inverting amplifier with<br />

⎛ R ⎞<br />

vo<br />

⎜ 2 = 1 + vb<br />

R ⎟<br />

⎝ 1 ⎠<br />

If vb = 0, we have an inverting amplifier with<br />

R2<br />

vo<br />

= − va<br />

R<br />

1<br />

SOLID-STATE ELECTRONICS AND DEVICES<br />

Conductivity <strong>of</strong> a semiconductor material:<br />

σ = q (nµn + pµp), where<br />

µn ≡ electron mobility,<br />

µp ≡ hole mobility,<br />

n ≡ electron concentration,<br />

p ≡ hole concentration, and<br />

−19<br />

q ≡ charge on an electron ( 1.6× 10 C ).<br />

Doped material:<br />

p-type material; pp ≈ Na<br />

n-type material; nn ≈ Nd<br />

Carrier concentrations at equilibrium<br />

(p)(n) = ni 2 , where<br />

ni ≡ intrinsic concentration.<br />

vo<br />

182<br />

ELECTRICAL AND COMPUTER ENGINEERING (continued)<br />

Built-in potential (contact potential) <strong>of</strong> a p-n junction:<br />

Thermal voltage<br />

kT N N<br />

V 0 = ln<br />

q<br />

V<br />

T<br />

a d<br />

2<br />

ni<br />

kT<br />

= ≈ 0.026V at 300 ° K<br />

q<br />

Na = acceptor concentration,<br />

Nd = donor concentration,<br />

T = temperature (K), and<br />

k = Boltzmann's Constant = 1.38 × 10 –23 J /K<br />

Capacitance <strong>of</strong> abrupt p – n junction diode<br />

( V ) Co<br />

V Vbi<br />

C = 1 − , where<br />

Co = junction capacitance at V = 0,<br />

V = potential <strong>of</strong> anode with respect to cathode, and<br />

Vbi = junction contact potential.<br />

Resistance <strong>of</strong> a diffused layer is<br />

R = Rs (L/W), where<br />

Rs = sheet resistance = ρ/d in ohms per square<br />

ρ = resistivity,<br />

d = thickness,<br />

L = length <strong>of</strong> diffusion, and<br />

W = width <strong>of</strong> diffusion.<br />

TABULATED CHARACTERISTICS FOR:<br />

Diodes<br />

Bipolar Junction Transistor (BJT)<br />

N-Channel JFET and MOSFET<br />

Enhancement MOSFETs<br />

are on the following pages.

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