fundamentals of engineering supplied-reference handbook - Ventech!
fundamentals of engineering supplied-reference handbook - Ventech!
fundamentals of engineering supplied-reference handbook - Ventech!
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OPERATIONAL AMPLIFIERS<br />
Ideal<br />
v2 vo = A(v1 – v2)<br />
where<br />
v<br />
1<br />
A is large (> 10 4 ), and<br />
v1 – v2 is small enough so as not to saturate the amplifier.<br />
For the ideal operational amplifier, assume that the input<br />
currents are zero and that the gain A is infinite so when<br />
operating linearly v2 – v1 = 0.<br />
For the two-source configuration with an ideal operational<br />
amplifier,<br />
va<br />
R 1<br />
R 2<br />
v<br />
b<br />
vo<br />
R2<br />
⎛ R ⎞<br />
vo<br />
va<br />
vb<br />
R ⎜ 2<br />
= − + 1 +<br />
R ⎟<br />
1 ⎝ 1 ⎠<br />
If va = 0, we have a non-inverting amplifier with<br />
⎛ R ⎞<br />
vo<br />
⎜ 2 = 1 + vb<br />
R ⎟<br />
⎝ 1 ⎠<br />
If vb = 0, we have an inverting amplifier with<br />
R2<br />
vo<br />
= − va<br />
R<br />
1<br />
SOLID-STATE ELECTRONICS AND DEVICES<br />
Conductivity <strong>of</strong> a semiconductor material:<br />
σ = q (nµn + pµp), where<br />
µn ≡ electron mobility,<br />
µp ≡ hole mobility,<br />
n ≡ electron concentration,<br />
p ≡ hole concentration, and<br />
−19<br />
q ≡ charge on an electron ( 1.6× 10 C ).<br />
Doped material:<br />
p-type material; pp ≈ Na<br />
n-type material; nn ≈ Nd<br />
Carrier concentrations at equilibrium<br />
(p)(n) = ni 2 , where<br />
ni ≡ intrinsic concentration.<br />
vo<br />
182<br />
ELECTRICAL AND COMPUTER ENGINEERING (continued)<br />
Built-in potential (contact potential) <strong>of</strong> a p-n junction:<br />
Thermal voltage<br />
kT N N<br />
V 0 = ln<br />
q<br />
V<br />
T<br />
a d<br />
2<br />
ni<br />
kT<br />
= ≈ 0.026V at 300 ° K<br />
q<br />
Na = acceptor concentration,<br />
Nd = donor concentration,<br />
T = temperature (K), and<br />
k = Boltzmann's Constant = 1.38 × 10 –23 J /K<br />
Capacitance <strong>of</strong> abrupt p – n junction diode<br />
( V ) Co<br />
V Vbi<br />
C = 1 − , where<br />
Co = junction capacitance at V = 0,<br />
V = potential <strong>of</strong> anode with respect to cathode, and<br />
Vbi = junction contact potential.<br />
Resistance <strong>of</strong> a diffused layer is<br />
R = Rs (L/W), where<br />
Rs = sheet resistance = ρ/d in ohms per square<br />
ρ = resistivity,<br />
d = thickness,<br />
L = length <strong>of</strong> diffusion, and<br />
W = width <strong>of</strong> diffusion.<br />
TABULATED CHARACTERISTICS FOR:<br />
Diodes<br />
Bipolar Junction Transistor (BJT)<br />
N-Channel JFET and MOSFET<br />
Enhancement MOSFETs<br />
are on the following pages.