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Effect of Post Metallization Annealing for La 2 O 3 Thin Film

Effect of Post Metallization Annealing for La 2 O 3 Thin Film

Effect of Post Metallization Annealing for La 2 O 3 Thin Film

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any recovery <strong>of</strong> VFB shift, but shifted VFB toward more negative side. Hence,this assumption does not seem to be correct. Another is the reactionbetween metal upper electrodes and rare earth oxides. In the case <strong>of</strong>aluminum upper electrodes which realized a recovery <strong>of</strong> VFB shift, it isnatural to consider that aluminum oxides (Al2O3) or lanthanum aluminate(<strong>La</strong>AlO3) was <strong>for</strong>med if there were some reactions between aluminum upperelectrodes and rare earth oxides. And this assumption seems to becomemuch more reasonable that these reactions <strong>for</strong>med aluminum oxides, notlanthanum aluminate. This assumption is well substantiated by three factsobtained by this investigation. One is a decrease <strong>of</strong> capacitance value afterPMA with aluminum upper electrodes compared to one <strong>of</strong> PDA. It is wellknown that aluminum oxides have the lower dielectric constant (8~10)compared to lanthanum aluminate (20~25) and rare earth oxides (15~30).The second is the fact that PMA with gold upper electrodes increased thecapacitance value in contrast to the case <strong>of</strong> PMA with aluminum upperelectrodes. The third is an effect <strong>of</strong> a recovery <strong>of</strong> VFB shift <strong>for</strong> Gd2O3 by PMAwith aluminum as described in sub-section 3.3.4. This result also greatlysupports this assumption. There<strong>for</strong>e, it is conceivable that the <strong>for</strong>mation <strong>of</strong>aluminum oxides decreased the capacitance value. Another, and this is themost significant part, is the fact that aluminum oxides have the property <strong>of</strong>shifting VFB toward positive side. Aluminum oxide has been widelyinvestigated as the one <strong>of</strong> the most promising and realistic next generationgate insulator material and this VFB shift toward positive side has beencommonly reported. And these reactions might occurred not only in thefilms but also at the interface between lanthanum oxides and aluminum, andthat reaction could increase the own film thickness. These assumptionsexplained up to this point is illustrated in Figure 4-3.Finally, it can be suggested that the <strong>for</strong>mation <strong>of</strong> higher qualityaluminum oxides between rare earth oxides which have high dielectricconstant such as laminate structure could realize the zero flat band shiftwith preserving higher capacitance value.- 96 -

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